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121. 发明申请

US20090040491A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20090040491A1
公开(公告)日：2009-02-12
申请号：US11882853
申请日：2007-08-06
申请人： Vladimir Vitalevich Ivanov , Vadim Yevgenyevich Banine , Konstantin Nikolaevich Koshelev , Vladimir Mihailovitch Krivtsun
发明人： Vladimir Vitalevich Ivanov , Vadim Yevgenyevich Banine , Konstantin Nikolaevich Koshelev , Vladimir Mihailovitch Krivtsun
IPC分类号： G03B27/54 , H05G2/00
CPC分类号： H05H1/24 , B82Y10/00 , G03F7/70033 , H05G2/003
摘要： A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.
摘要翻译：光刻系统包括被配置为产生辐射的源，所述源包括阴极和阳极，所述阴极和阳极被配置为在位于放电空间中的燃料中产生放电以产生等离子体，所述放电空间包括在使用中，配置成调整等离子体的辐射发射以控制由等离子体限定的体积的物质; 配置为保持图案形成装置的图案支撑件，所述图案形成装置被配置为对所述辐射进行图案化以形成图案化的辐射束; 衬底支撑件，其构造成支撑衬底; 以及投影系统，被配置为将所述图案化的辐射束投射到所述基板上。

122. 发明申请

US20090038636A1 Cleaning method 审中-公开
标题翻译：清洗方法
公开(公告)号：US20090038636A1
公开(公告)日：2009-02-12
申请号：US11889213
申请日：2007-08-09
申请人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Van Herpen
发明人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Van Herpen
IPC分类号： B08B5/00 , B08B3/00
CPC分类号： B08B7/00 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A method of cleaning an imprint template is disclosed. The method includes exposing the imprint template to a reductive fluid.
摘要翻译：公开了一种清洁压印模板的方法。该方法包括将印模模板暴露于还原液中。

123. 发明申请

US20080259291A1 Pellicle, lithographic apparatus and device manufacturing method 有权
标题翻译：薄膜，光刻设备和器件制造方法
公开(公告)号：US20080259291A1
公开(公告)日：2008-10-23
申请号：US11785744
申请日：2007-04-19
申请人： Vadim Yevgenyevich Banine , Arno Jan Bleeker
发明人： Vadim Yevgenyevich Banine , Arno Jan Bleeker
IPC分类号： G03B27/42
CPC分类号： G03F7/70958 , G03F1/62 , G03F7/70191 , G03F7/70916 , G03F7/70983
摘要： A pellicle for integrated circuit equipment operating in an EUV range includes a multi-layered structure of alternating layers. The pellicle is constructed and arranged to reflect or absorb undesired radiation and to intercept debris to enhance the spectral purity of a radiation beam.
摘要翻译：用于在EUV范围内工作的集成电路设备的防护薄膜组件包括交替层的多层结构。防护薄膜组件被构造和布置成反射或吸收不想要的辐射并拦截碎片以增强辐射束的光谱纯度。

124. 发明申请

US20080148978A1 Assembly for blocking a beam of radiation and method of blocking a beam of radiation 有权
标题翻译：用于阻挡辐射束的组件和阻挡辐射束的方法
公开(公告)号：US20080148978A1
公开(公告)日：2008-06-26
申请号：US11643954
申请日：2006-12-22
申请人： Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Konstantin Nikolaevich Koshelev , Vladimir Mihailovitch Krivtsun
发明人： Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Konstantin Nikolaevich Koshelev , Vladimir Mihailovitch Krivtsun
IPC分类号： G03B27/52 , B41M5/00
CPC分类号： G03F7/70291 , G03F7/70041 , G03F7/7055 , G03F7/70558
摘要： An assembly is provided for blocking a beam of radiation. The assembly has a pipe arranged to transmit at least part of the beam of radiation. The pipe has an inner surface provided with an ablation material and encloses a volume. The assembly further has an ablation generation device. The ablation generation device is arranged to ablate at least a portion of the ablation material upon reception of a blocking signal. The assembly has a control unit, which is arranged to control the ablation generation device.
摘要翻译：提供用于阻挡辐射束的组件。组件具有布置成透射辐射束的至少一部分的管。管道具有设置有消融材料并包围体积的内表面。组件还具有消融产生装置。消融产生装置被布置成在接收到阻塞信号时烧蚀消融材料的至少一部分。组件具有控制单元，其被布置成控制消融产生装置。

125. 发明申请

US20080137050A1 Plasma radiation source for a lithographic apparatus 失效
标题翻译：用于光刻设备的等离子体辐射源
公开(公告)号：US20080137050A1
公开(公告)日：2008-06-12
申请号：US11634386
申请日：2006-12-06
申请人： Vladimir Vitalevitch Ivanov , Vadim Yevgenyevich Banine , Konstantin Nikolaevitch Koshelev , Vladimir Mihailovitch Krivtsun
发明人： Vladimir Vitalevitch Ivanov , Vadim Yevgenyevich Banine , Konstantin Nikolaevitch Koshelev , Vladimir Mihailovitch Krivtsun
IPC分类号： G03B27/42 , G21K5/00
CPC分类号： H05G2/003 , H05G2/005
摘要： A radiation source is disclosed that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a discharge space between the anode and the cathode and to form a plasma so as to generate electromagnetic radiation, the anode and the cathode being rotatably mounted around an axis of rotation, the cathode being arranged to hold a liquid metal. The radiation source further includes an activation source arranged to direct an energy beam onto the liquid metal so as to vaporize part of the liquid metal and a liquid metal provider arranged to supply additional liquid metal so as to compensate for the vaporized part of the liquid metal.
摘要翻译：公开了一种辐射源，其包括阳极和阴极，其构造和布置成在阳极和阴极之间的放电空间中的物质中产生放电并形成等离子体以产生电磁辐射，阳极和阴极围绕旋转轴线可旋转地安装，阴极被布置成保持液态金属。辐射源还包括激活源，其被布置成将能量束引导到液态金属上，以便使部分液态金属蒸发，并且液态金属提供器被布置成提供附加的液态金属，以便补偿液态金属的汽化部分。

126. 发明授权

US07307263B2 Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap 有权
标题翻译：平版印刷设备，辐射系统，污染物捕集阱，装置制造方法以及在污染物捕集器中捕获污染物的方法
公开(公告)号：US07307263B2
公开(公告)日：2007-12-11
申请号：US10890404
申请日：2004-07-14
申请人： Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Cornelis Petrus Andreas Maria Luijkx , Frank Jeroen Pieter Schuurmans
发明人： Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Cornelis Petrus Andreas Maria Luijkx , Frank Jeroen Pieter Schuurmans
IPC分类号： G03F7/20
CPC分类号： G03F7/70908 , G03F7/70916 , G03F7/70933
摘要： A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.
摘要翻译：光刻设备包括辐射系统，其包括用于产生辐射束的源，布置在辐射束的路径中的污染物阱，以及被配置为调节由源产生的辐射束的照明系统，以及用于支撑图案形成装置。图案形成装置用于使经调节的辐射束在其横截面上具有图案。该装置还包括用于保持基板的基板台和用于将图案化的辐射束投影到基板的目标部分上的投影系统。污染物捕集器包括限定基本上平行于辐射束的传播方向布置的通道的多个箔片。陷阱设置有气体供应系统，其被布置成将气体注入到阱的至少一个通道中。

127. 发明申请

US20060289811A1 Lithographic apparatus and cleaning method therefor 失效
公开(公告)号：US20060289811A1
公开(公告)日：2006-12-28
申请号：US11451601
申请日：2006-06-13
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Klunder , Johannes Hubertus Moors
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Klunder , Johannes Hubertus Moors
IPC分类号： G01J3/10
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70166 , G03F7/70916
摘要： A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.

128. 发明授权

US07135692B2 Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation 有权
标题翻译：光刻设备，照明系统和提供EUV辐射投影光束的方法
公开(公告)号：US07135692B2
公开(公告)日：2006-11-14
申请号：US10727035
申请日：2003-12-04
申请人： Vladimir Vitalevitch Ivanov , Vadim Yevgenyevich Banine , Konstantin Nikolaevitch Koshelev
发明人： Vladimir Vitalevitch Ivanov , Vadim Yevgenyevich Banine , Konstantin Nikolaevitch Koshelev
IPC分类号： A61N5/00
CPC分类号： G03F7/70858 , G03F7/70916
摘要： A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The illumination system includes a radiation-production system that produces extreme ultra-violet radiation, and a radiation-collection system that collects extreme ultra-violet radiation. Particles that are produced as a by-product of extreme ultra-violet radiation production move substantially in a particle-movement direction. The radiation-collection system is arranged to collect extreme ultra-violet radiation which radiates in a collection-direction, which is substantially different from the particle-movement direction.
摘要翻译：公开了一种光刻设备。光刻设备包括提供辐射束的照明系统和支撑图形结构的支撑结构。图案形成结构被配置为在其横截面中赋予辐射束图案。该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。照明系统包括产生极紫外辐射的辐射生产系统和收集极紫外辐射的辐射收集系统。作为极紫外线辐射产物的副产物产生的颗粒基本上沿颗粒移动方向移动。辐射采集系统被布置成收集与收集方向辐射的极微紫外辐射，其与颗粒运动方向基本上不同。

129. 发明申请

US20050083504A1 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050083504A1
公开(公告)日：2005-04-21
申请号：US10942102
申请日：2004-09-16
申请人： Johannes Moors , Vadim Yevgenyevich Banine
发明人： Johannes Moors , Vadim Yevgenyevich Banine
IPC分类号： G03F7/207 , G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/70916
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the projection beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an infrared radiation source for providing infrared radiation into a measurement zone within the lithographic apparatus, and a detector for receiving the infrared radiation from the infrared radiation source after having passed through the measurement zone, and for outputting a signal indicative of the presence of a gas present within the measurement zone.
摘要翻译：公开了一种光刻设备。该装置包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。图案形成装置用于使投影光束在其横截面上具有图案。该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统，用于将红外辐射提供到光刻设备内的测量区域的红外辐射源，以及用于接收来自红外线辐射源的红外辐射在经过测量区域之后，并且用于输出指示存在于测量区域内的气体的信号。

130. 发明授权

US06864958B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US06864958B2
公开(公告)日：2005-03-08
申请号：US10613218
申请日：2003-07-07
申请人： Arno Jan Bleeker , Vadim Yevgenyevich Banine
发明人： Arno Jan Bleeker , Vadim Yevgenyevich Banine
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42 , G03B27/54 , G03B27/72
CPC分类号： G03F7/70283 , G03F7/70291 , G21K1/062
摘要： A programmable patterning structure for use with a lithographic projection apparatus according to one embodiment of the invention includes a plurality of reflective elements A, B, C, each reflective element having two distributed Bragg reflectors 51, 52. A separation D1 between the two distributed Bragg reflectors is adjustable between a first relation, at which destructive interference between reflections from the first and second distributed Bragg reflectors 51, 52 results in substantially zero reflectivity, and a second relation, in which constructive interference between reflections from the first and second distributed Bragg reflectors 51, 52 results in high reflectivity.
摘要翻译：与根据本发明的一个实施例的光刻投影设备一起使用的可编程图案化结构包括多个反射元件A，B，C，每个反射元件具有两个分布布拉格反射器51,52。两个分布布拉格反射器可以在第一关系之间调节，在第一关系处，来自第一和第二分布布拉格反射器51,52的反射之间的相消干涉导致基本上为零的反射率，以及第二关系，其中来自第一和第二分布式布拉格反射器的反射之间的相长干涉 51,52导致高反射率。

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