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    • 117. 发明申请
    • Deposition Method and Method for Manufacturing Light Emitting Device
    • 制造发光装置的沉积方法和方法
    • US20090104721A1
    • 2009-04-23
    • US12254060
    • 2008-10-20
    • Yoshiharu HirakataShunpei Yamazaki
    • Yoshiharu HirakataShunpei Yamazaki
    • H01L21/00B05D5/12
    • H05B33/10C23C14/042C23C14/048C23C14/28H01L27/3211H01L51/0013H01L51/56
    • An object is to provide a deposition method by which a film having a desired shape can be formed with high productivity. Further, a method for manufacturing a light emitting device by which a light emitting device having high definition can be manufactured with high productivity is provided. Specifically, even in the case of using a large-sized substrate, a method for manufacturing a light emitting device having high definition is provided. By using a deposition target substrate and a shadow mask having a smaller area than the deposition target substrate, the deposition target substrate and the shadow mask are aligned with each other, and an evaporation material is deposited on at least part of the deposition target substrate through a plurality of deposition steps. As an evaporation source, a light absorption layer and a supporting substrate having the evaporation material is preferably used.
    • 本发明的目的是提供一种可以以高生产率形成具有所需形状的膜的沉积方法。 此外,提供一种制造发光器件的方法,通过该方法可以以高生产率制造具有高清晰度的发光器件。 具体地,即使在使用大尺寸基板的情况下,也提供了具有高清晰度的发光装置的制造方法。 通过使用具有比沉积对象基板小的面积的沉积靶基板和荫罩,沉积靶基板和荫罩彼此对准,并且蒸发材料沉积在沉积靶基板的至少一部分上,通过 多个沉积步骤。 作为蒸发源,优选使用具有蒸发材料的光吸收层和支撑基板。