会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 118. 发明授权
    • Semiconductor memory devices including recess-type control gate electrodes and methods of fabricating the semiconductor memory devices
    • 包括凹型控制栅电极的半导体存储器件和制造半导体存储器件的方法
    • US08148767B2
    • 2012-04-03
    • US11709860
    • 2007-02-23
    • Yoon-dong ParkJune-mo KooKyoung-lae Cho
    • Yoon-dong ParkJune-mo KooKyoung-lae Cho
    • H01L29/788
    • H01L21/28273B82Y10/00H01L21/28282H01L27/115H01L27/11521H01L27/11568H01L29/66825H01L29/66833H01L29/7881H01L29/792H01L29/7923
    • A semiconductor memory device includes a semiconductor substrate, a control gate electrode recessed in the semiconductor substrate, a storage node layer interposed between a sidewall of the control gate electrode and the semiconductor substrate, a tunneling insulation layer interposed between the storage node layer and the semiconductor substrate, a blocking insulation layer interposed between the storage node layer and the control gate electrode, and first and second channel regions formed around a surface of the semiconductor substrate to at least partially surround the control gate electrode. The semiconductor memory device may include a plurality of control gate electrodes, storage node layers, tunneling insulation layers, blocking insulation layers, and continuous first and second channel regions. A method of fabricating the semiconductor memory device includes etching the semiconductor substrate to form a plurality of holes, forming the tunneling insulation layers, storage node layers, blocking insulation layers, and control gate electrodes.
    • 半导体存储器件包括半导体衬底,凹入半导体衬底中的控制栅极电极,插在控制栅电极的侧壁和半导体衬底之间的存储节点层,介于存储节点层和半导体衬底之间的隧道绝缘层 衬底,介于存储节点层和控制栅电极之间的阻挡绝缘层,以及形成在半导体衬底的表面周围以至少部分地围绕控制栅电极的第一和第二沟道区。 半导体存储器件可以包括多个控制栅电极,存储节点层,隧道绝缘层,阻挡绝缘层以及连续的第一和第二沟道区。 制造半导体存储器件的方法包括蚀刻半导体衬底以形成多个孔,形成隧道绝缘层,存储节点层,阻挡绝缘层和控制栅电极。