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101. 发明授权

US5808302A Fine positioning apparatus with atomic resolution 失效
标题翻译：具有原子分辨率的精细定位装置
公开(公告)号：US5808302A
公开(公告)日：1998-09-15
申请号：US793481
申请日：1997-02-26
申请人： Gerd K. Binnig , Walter Haeberle , Heinrich Rohrer , Douglas P. E. Smith
发明人： Gerd K. Binnig , Walter Haeberle , Heinrich Rohrer , Douglas P. E. Smith
IPC分类号： G01B7/34 , G01B21/30 , G01Q10/04 , G05D3/00 , G11B5/55 , G11B9/00 , G11B21/02 , H02K33/18 , H02K41/035 , H01J37/00
CPC分类号： G01Q10/04 , B82Y35/00 , H02K41/035 , H02K41/0356 , B82Y10/00 , G11B21/02 , G11B5/5521 , G11B9/1418 , H02K2201/18 , Y10S977/872
摘要： A fine-positioning apparatus for a scanning probe microscope includes magnetic solenoid actuators for each of the x, y and z scanning axes of the microscope. The sample is mounted on the coil of one of the actuators for movement of the sample in the z direction while the tunnelling probe is attached to two other solenoid actuators for movement of the probe in the x and y directions.
摘要翻译： PCT No.PCT / EP94 / 02844 Sec。 371日期1997年2月26日 102（e）日期1997年2月26日PCT 1994年8月27日PCT PCT。出版物WO96 / 07074 日期1996年3月7日用于扫描探针显微镜的精细定位装置包括用于显微镜的x，y和z扫描轴中的每一个的磁性螺线管致动器。样品安装在一个致动器的线圈上，用于在z方向上移动样品，同时隧道探针连接到另外两个螺线管致动器，用于沿x和y方向移动探针。

102. 发明授权

US5777327A Pattern shape inspection apparatus for forming specimen image on display apparatus 失效
标题翻译：用于在显示装置上形成标本图像的图案形状检查装置
公开(公告)号：US5777327A
公开(公告)日：1998-07-07
申请号：US771748
申请日：1996-12-20
申请人： Fumio Mizuno
发明人： Fumio Mizuno
IPC分类号： G01B15/04 , G03F1/00 , G03F7/20 , G06T7/00 , H01J37/22 , H01J37/28 , H01L21/027 , H01L21/66 , H01J37/00
CPC分类号： G03F7/70616 , G03F1/84 , H01J37/28 , H01J2237/2817
摘要： A pattern shape inspection apparatus for displaying a specimen image on a display apparatus, and inspecting a pattern shape of the specimen image includes a memory for memorizing a reference image corresponding to an observation region and a display for simultaneously displaying the reference image and the specimen image. At least one of the image parameters of the specimen image and the reference image is corrected to aid in the comparison.
摘要翻译：用于在显示装置上显示标本图像并检查样本图像的图案形状的图案形状检查装置包括用于存储与观察区域相对应的参考图像的存储器和用于同时显示参考图像和标本图像的显示。对样本图像和参考图像的图像参数中的至少一个进行校正以帮助进行比较。

103. 发明授权

US5650630A Mercury vapor high-pressure discharge lamp and irradiation method, particularly for mask pattern exposure of semiconductor wafers 失效
标题翻译：汞蒸气高压放电灯和照射方法，特别适用于半导体晶片的掩模图案曝光
公开(公告)号：US5650630A
公开(公告)日：1997-07-22
申请号：US410724
申请日：1995-03-27
申请人： Joern Dierks , Juergen Maier
发明人： Joern Dierks , Juergen Maier
IPC分类号： G03F7/20 , H01J61/20 , H01J61/30 , H01J61/40 , H01J61/82 , H01J17/16 , H01J37/00
CPC分类号： G03F7/70016 , H01J61/20 , H01J61/302 , H01J61/40 , H01J61/822
摘要： To eliminate radiation from the mercury high-pressure discharge lamp of wlengths below 365 nm, the lamp includes a discharge vessel of quartz glass which is doped with vanadium in a quantity of up to about only 250 ppm, by weight, with respect to 1 mm of wall thickness of the quartz glass. This absorbed radiation also heats the quartz glass, so that the outside wall temperature of the vessel can be maintained between about 400.degree. and 950.degree. C. The effect can be enhanced by adding, additionally, titanium and/or tin to provide metal ions to the doping substance, in an overall quantity of up to 500 ppm, by weight. Alternatively, the quartz glass can be coated with TiO.sub.2 or SnO.sub.2. Suitable wall thicknesses for the discharge vessel are between 1 and 5 mm, and the fill therein is preferably mercury in a quantity of between 0.5 and 15 mg/cm.sup.3 and xenon with a cold fill pressure of 0.1 to 2.5 bar. Electrode spacing of the lamp is preferably between 2 and 5 mm. The vanadium portion preferably is less than 200 ppm and may, most desirably, be between 20 and 150 ppm, with respect to 1 mm wall thickness of the quartz glass of the discharge vessel.
摘要翻译：为了消除波长低于365nm的汞高压放电灯的辐射，该灯包括石英玻璃的放电容器，该放电容器掺杂有至少约250ppm重量的钒，相对于1mm 的石英玻璃的壁厚。这种吸收的辐射也加热了石英玻璃，使得容器的外壁温度可以保持在约400℃和950℃之间。通过添加钛和/或锡以提供金属离子可以提高效果该掺杂物质的总量高达500ppm重量。或者，石英玻璃可以涂覆有TiO 2或SnO 2。放电容器的合适的壁厚在1至5mm之间，并且其中的填充物优选为0.5至15mg / cm 3的水银，氙气的冷填充压力为0.1至2.5巴。灯的电极间距优选为2〜5mm。相对于放电容器的石英玻璃的1mm厚度，钒部分优选小于200ppm，并且最优选地在20和150ppm之间。

104. 发明授权

US5596195A Method and apparatus for measuring the distribution of elements contained in sample 失效
标题翻译：用于测量样品中所含元素分布的方法和装置
公开(公告)号：US5596195A
公开(公告)日：1997-01-21
申请号：US529288
申请日：1995-09-15
申请人： Kenichi Obori , Atsushi Bando , Toshikazu Yurugi
发明人： Kenichi Obori , Atsushi Bando , Toshikazu Yurugi
IPC分类号： G01N23/225 , H01J37/256 , H01J37/00
CPC分类号： H01J37/256
摘要： An apparatus and method of identifying substances contained in a sample to both identify the elements in the sample and to measure a distribution of the elements are provided. The sample is scanned with electron beams to form X-ray images of two or elements. These X-ray images can be used to form a scattering diagram, and the composition of known materials can be plotted on the scattering diagram. The substances contained in the samples can be identified, and the distribution of the substances can be obtained by comparing the data on the scattering diagram with the plot.
摘要翻译：提供了一种识别样品中所含物质的装置和方法，以便识别样品中的元素并测量元件的分布。用电子束扫描样品以形成两个或多个元素的X射线图像。这些X射线图像可用于形成散射图，并且已知材料的组成可以绘制在散射图上。可以确定样品中含有的物质，并通过比较散射图上的数据和图来获得物质的分布。

105. 发明授权

US5528033A Automatic surface profiling for submicron device 失效
标题翻译：亚微米器件的自动表面轮廓
公开(公告)号：US5528033A
公开(公告)日：1996-06-18
申请号：US413070
申请日：1995-03-29
申请人： Jiann-Chang Lo , Timothy J. O'Leary
发明人： Jiann-Chang Lo , Timothy J. O'Leary
IPC分类号： G01B11/02 , G01B7/34 , G01B11/26 , G01B21/30 , G01Q30/04 , G01Q30/06 , G01Q60/38 , H01J37/00 , H01J37/26
CPC分类号： G01Q60/38 , B82Y35/00 , G01B7/34 , G01Q30/04 , G01Q30/06 , Y10S977/839 , Y10S977/85 , Y10S977/852 , Y10S977/863
摘要： A method for automatically providing a surface profile analysis of a submicron device using a microscope system typically used to measure critical dimensions of the submicron device is disclosed. The method generates a data point array that is linearly interpolated along a particular scan line measured. The system then calculates an angle for performing a rotational correlation then rotates the measurement profile from the scan line to an absolute horizontal position based on this rotational correlation angle. Next, the system separates the scan line into independent subset features having line and trench features. The number of these line and trench features are then determined in the scan line and using the data point array, the system then calculates the height, width, and angle for each subset feature in that scan line.
摘要翻译：公开了一种用于使用通常用于测量亚微米器件的临界尺寸的显微镜系统自动提供亚微米器件的表面轮廓分析的方法。该方法产生沿所测量的特定扫描线线性内插的数据点阵列。然后，该系统计算用于执行旋转相关的角度，然后基于该旋转相关角度将测量轮廓从扫描线旋转到绝对水平位置。接下来，系统将扫描线分成具有线和沟槽特征的独立子集特征。然后在扫描线中确定这些线和沟槽特征的数量，并使用数据点阵列，系统然后计算该扫描线中每个子集特征的高度，宽度和角度。

106. 发明授权

US5477054A Denture curing apparatus and method 失效
标题翻译：牙固定装置及方法
公开(公告)号：US5477054A
公开(公告)日：1995-12-19
申请号：US217571
申请日：1994-03-25
申请人： Louis H. Tateosian , Duane E. Barber
发明人： Louis H. Tateosian , Duane E. Barber
IPC分类号： A61C13/14 , A61C13/15 , H01J37/00
CPC分类号： A61C19/003
摘要： An apparatus and method for curing light curable material using unfiltered light. A vented housing encloses a single lamp filament light source which emits visible light. The light source is positioned above and to the side of the light curable material which is supported on a rotating table during light curing. Light incident to the surface of the light curable material is at least about 50 milliwatts per square centimeter. The light curable material has a surface temperature of at least 150.degree. F. (65.6.degree. C.) after 2 minutes.
摘要翻译：一种使用未过滤光固化光固化材料的装置和方法。通风的外壳包围发出可见光的单灯灯丝光源。在光固化期间，光源位于支撑在旋转台上的可光固化材料的上方和侧面。入射到可光固化材料表面的光是至少约50毫瓦每平方厘米。光固化材料在2分钟后具有至少150°F（65.6℃）的表面温度。

107. 发明授权

US5469734A Scanning apparatus linearization and calibration system 失效
标题翻译：扫描仪线性化和校准系统
公开(公告)号：US5469734A
公开(公告)日：1995-11-28
申请号：US357133
申请日：1994-12-15
申请人： Marc R. Schuman
发明人： Marc R. Schuman
IPC分类号： G01B7/34 , G01Q40/00 , H01J37/00 , H01J37/20
CPC分类号： G01Q40/00 , B82Y35/00 , Y10S977/851
摘要： The scanning apparatus linearization and calibration system includes an electromechanical scanner having a sample stage portion, and a deflecting member, mounted between the scanning means and a fixed mounting member, that undergoes deflection in response to displacement of the scanner sample stage portion in at least one dimension of displacement. Strain gauges are mounted to the deflecting member for measuring the deflection of the deflecting member and for generating a deflection output signal indicative of an amount of deflection of the deflecting member, to provide a highly sensitive indication of actual displacement of the sample stage of the scanning apparatus. Control circuitry also provides for open loop displacement correction and for closed loop feedback correction of the position of the scanner sample stage.
摘要翻译：扫描装置线性化和校准系统包括具有样品台部分的机电扫描器和安装在扫描装置和固定安装构件之间的偏转构件，其响应于扫描仪样品台部分在至少一个中的位移而经历偏转位移尺寸应变计被安装到偏转构件，用于测量偏转构件的偏转并产生指示偏转构件的偏转量的偏转输出信号，以提供扫描样本台的实际位移的高度敏感指示仪器。控制电路还提供开环位移校正和用于扫描仪样品台位置的闭环反馈校正。

108. 发明授权

US5463459A Method and apparatus for analyzing the state of generation of foreign particles in semiconductor fabrication process 失效
标题翻译：用于分析半导体制造工艺中的外来颗粒的产生状态的方法和装置
公开(公告)号：US5463459A
公开(公告)日：1995-10-31
申请号：US46720
申请日：1993-04-16
申请人： Hiroshi Morioka , Minori Noguchi , Yoshimasa Ohshima , Yukio Kembo , Hidetoshi Nishiyama , Kazuhiko Matsuoka , Yoshiharu Shigyo
发明人： Hiroshi Morioka , Minori Noguchi , Yoshimasa Ohshima , Yukio Kembo , Hidetoshi Nishiyama , Kazuhiko Matsuoka , Yoshiharu Shigyo
IPC分类号： G01N21/00 , G01N21/94 , G01N21/95 , G01N21/956 , G01R31/308 , H01J37/00 , H01L21/00 , H01L21/66 , H01L21/68 , G01N21/89 , G02B27/46 , G06F15/46
CPC分类号： H01L21/681 , B82Y15/00 , G01N21/94 , G01N21/9501 , G01N21/95623 , G01R31/308 , H01J37/00 , H01L21/67253 , H01L21/67288 , G01N2021/8822 , H01J2237/022 , H01J2237/0225 , H01L22/12
摘要： A defect detecting apparatus including an illumination system for radiating a light of a plane wave linearly to a substrate having repetitive patterns of different pitches; a focusing optical system for focusing a light image reflected from the substrate thus illuminated by the illumination system; a spatial filter disposed intermediate the focusing optical system so as to shield a diffraction light from repetitive patterns of a small pitch on the substrate; a detector for detecting the light image formed by the focusing optical system; an erasing means for comparing and erasing signals which are generated on the basis of repetitive patterns of a large pitch and obtained through the spatial filter, out of signals detected by the detector; and a defect detecting means for detecting defects on the substrate in accordance with a signal detected by the detector, as well as a method applied to the said apparatus.
摘要翻译：一种缺陷检测装置，包括用于将平面波的光线线性地发射到具有不同间距的重复图案的基板的照明系统; 聚焦光学系统，用于聚焦由照明系统照射的从基板反射的光图像; 设置在聚焦光学系统之间的空间滤光器，以便屏蔽来自基板上的小间距的重复图案的衍射光; 用于检测由聚焦光学系统形成的光图像的检测器; 擦除装置，用于根据由检测器检测到的信号，比较和擦除基于大间距的重复图案并通过空间滤波器获得的信号; 以及缺陷检测装置，用于根据由检测器检测的信号检测基板上的缺陷，以及应用于所述装置的方法。

109. 发明授权

US5438205A Ion source gaseous discharge initiation impulse valve 失效
标题翻译：离子源气体放电启动脉冲阀
公开(公告)号：US5438205A
公开(公告)日：1995-08-01
申请号：US225952
申请日：1994-04-08
申请人： James B. Schroeder
发明人： James B. Schroeder
IPC分类号： H01J27/02 , H01J37/00
CPC分类号： H01J27/022
摘要： An impulse valve for an ion source is positioned between an ion source chamber and a gas metering valve. The impulse valve is a two-position solenoid-controlled valve which is closed in its off position. In the off-position, the valve forms a reservoir between the valve stem of the impulse valve and the metering orifice of the metering valve. In the off condition, the gas reservoir fills with gas that over time equilibrates to the pressure of the gas supplied to the metering valve. The volume of the gas reservoir and the pressure of the gas which is supplied to the metering valve are chosen so that when the two-position valve is open, the gas contained in the reservoir is sufficient to pressurize the ion source chamber to a pressure of approximately 0.1 Torr. Thus, when the impulse valve opens, a pulse of gas flows into the ion source chamber, where a plasma discharge is initiated. As ions and gas flow through the ion discharge port, the pressure in the ion chamber drops until it reaches an equilibrium pressure with the supply of gas through the metering valve. This pressure is typically one-tenth of the initiation pressure, or 0.01 Torr. The impulse valve also serves to provide a fail-safe shut-down mechanism, so that when power is lost, the valve returns to its closed condition.
摘要翻译：用于离子源的脉冲阀位于离子源室和气体计量阀之间。脉冲阀是两位电磁阀，在其关闭位置处关闭。在关闭位置，阀在冲击阀的阀杆和计量阀的计量孔之间形成储存器。在关闭状态下，气体储存器充满随着时间平衡的供应给计量阀的气体压力的气体。选择供给到计量阀的气体的容积和气体的压力，使得当两位置阀打开时，储存器中所含的气体足以将离子源室加压至约0.1乇。因此，当脉冲阀打开时，气体脉冲流入离子源室，其中发射等离子体放电。当离子和气体流过离子排放口时，离子室中的压力下降，直到通过计量阀供给气体达到平衡压力。该压力通常是起始压力的十分之一，或0.01托。脉冲阀还用于提供故障安全关闭机构，以便在断电时，阀返回到其关闭状态。

110. 发明授权

US5436528A Plasma source employing spiral RF coil and method for using same 失效
标题翻译：采用螺旋RF线圈的等离子体源及其使用方法
公开(公告)号：US5436528A
公开(公告)日：1995-07-25
申请号：US97498
申请日：1993-07-26
申请人： Ajit P. Paranjpe
发明人： Ajit P. Paranjpe
IPC分类号： H01J37/08 , H01J37/32 , H05H1/46 , H01J1/00 , H01J37/00
CPC分类号： H01J37/321 , H05H1/46
摘要： A plasma source for generating a plasma in a chamber in conjunction with a radio frequency generator is described. The plasma source comprises a coil spiral, at least one insulator and at least one capacitor. The coil spiral conducts the radio frequency wave from the radio frequency generator and induces a plasma in the chamber. It comprises at least two segments. Each insulator and capacitor couple two adjacent segments of the coil spiral together.
摘要翻译：描述了一种用于在与射频发生器结合的室中产生等离子体的等离子体源。等离子体源包括线圈螺旋，至少一个绝缘体和至少一个电容器。线圈螺旋传导来自射频发生器的射频，并在腔室中引入等离子体。它包括至少两个段。每个绝缘体和电容器将线圈的两个相邻段耦合在一起。

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