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    • 101. 发明授权
    • Recording medium, recording-medium management method, and recording-medium management system
    • 记录介质,记录介质管理方法和记录介质管理系统
    • US07203969B2
    • 2007-04-10
    • US10606788
    • 2003-06-27
    • Masatoshi SakuraiYoshiyuki KamataKatsuyuki Naito
    • Masatoshi SakuraiYoshiyuki KamataKatsuyuki Naito
    • G06F11/00
    • G11B20/0021G11B20/00086G11B20/00108G11B20/00173G11B20/00326G11B23/288G11B2020/10898
    • A recording-medium management system comprising: a reproduction part; a recording part; and a control part. The control part performs a first through fourth control. The first control is to obtain a first data line from an authentication region of a recording medium by making the reproduction part read the authentication region, the authentication region including a first data pattern of a RAM bit and a ROM bit, the first data line being corresponding to the first data pattern, the RAM bit being over-writable of data at least once by a first writing condition, and the ROM bit being not over-writable of data by the first writing condition. The second control is to make the recording part overwrite predetermined data to the RAM bit. The third control is to obtain a second data line from the recording-medium, the second data line being corresponding to a second data pattern of the over-written RAM bit and the ROM bit. The fourth control is to perform an authentication with regard to the recording medium in reference to the first and second data lines.
    • 一种记录介质管理系统,包括:再现部分; 录音部分; 和控制部分。 控制部执行第一至第四控制。 第一控制是通过使再现部分读取认证区域从认证区域获得第一数据行,认证区域包括RAM位和ROM位的第一数据模式,第一数据行是 对应于第一数据模式,RAM位由于第一写入条件至少一次被数据重写,并且ROM位不被第一写入条件的数据过度写入。 第二控制是使记录部分将预定数据重写到RAM位。 第三控制是从记录介质获得第二数据线,第二数据线对应于被重写的RAM位和ROM位的第二数据模式。 第四控制是参考第一和第二数据线执行关于记录介质的认证。
    • 105. 发明授权
    • Stamper and method of manufacturing the same
    • 压模及其制造方法
    • US08778162B2
    • 2014-07-15
    • US13077537
    • 2011-03-31
    • Masatoshi SakuraiTakuya ShimadaShinobu SugimuraSatoshi Shirotori
    • Masatoshi SakuraiTakuya ShimadaShinobu SugimuraSatoshi Shirotori
    • C25D1/00C25D1/20
    • G11B5/82B82Y10/00G11B5/743G11B5/855G11B5/858
    • According to one embodiment, a stamper manufacturing method comprises electroless plating by using a master includes a substrate, a conductive underlayer formed on the substrate and having catalytic activity, projecting patterns having no catalytic activity and partially formed on a surface of the conductive underlayer having catalytic activity, and regions in which the conductive underlayer having catalytic activity is exposed between the projecting patterns to deposit selectively an amorphous conductive layer between the projecting patterns and in the regions in which the conductive underlayer is exposed, and forming stamper projections, electroplating on the stamper projections includes the projecting patterns and the amorphous conductive layer by using the amorphous conductive layer and the conductive underlayer as electrodes to form a stamper main body made of a crystalline metal, and releasing a stamper includes the stamper projections and the stamper main body from the master.
    • 根据一个实施例,压模制造方法包括使用主体的无电镀,其包括基板,形成在基板上的具有催化活性的导电底层,具有催化活性的突出图案,并部分地形成在具有催化作用的导电底层的表面上 活性以及其中具有催化活性的导电底层在突出图案之间暴露的区域,以选择性地沉积在突出图案之间的非晶导体层和导电底层暴露的区域中,并且形成压模突起,在压模上电镀 突起包括通过使用非晶导体层和导电底层作为电极形成由结晶金属制成的压模主体的突出图案和非晶导体层,并且释放压模包括压模主体和压模主体 。
    • 107. 发明申请
    • LIGHT DEFLECTING ELEMENT
    • 光偏转元件
    • US20130258452A1
    • 2013-10-03
    • US13730321
    • 2012-12-28
    • Yuuzo KAMIGUCHIMasahiro KanamaruKatsuya SugawaraKeiichiro YusuMasatoshi Sakurai
    • Yuuzo KAMIGUCHIMasahiro KanamaruKatsuya SugawaraKeiichiro YusuMasatoshi Sakurai
    • G02F1/29
    • G02F1/29G02F1/2955
    • According to an embodiment, a light deflecting element includes a dielectric body, a first electrode, a second electrode, and a third electrode. Each of the second electrode and third electrode is configured to sandwich the dielectric body with the first electrode. The second electrode includes an electrode having a side that lies substantially orthogonal to an incident direction of a light beam, a side that is substantially parallel to the incident direction, and a side that intersects with the incident direction. The third electrode includes an electrode having a side that is aligned with the second electrode, a side that is substantially parallel to an incident direction of the light beam, and a side that intersects with the light beam, and that slopes in an opposite to that of the side of the second electrode that intersects with the light beam.
    • 根据实施例,光偏转元件包括电介质体,第一电极,第二电极和第三电极。 第二电极和第三电极中的每一个被配置为将电介质体与第一电极夹在中间。 第二电极包括具有基本上垂直于光束的入射方向的一侧的电极,基本上平行于入射方向的一侧以及与入射方向相交的一侧。 第三电极包括具有与第二电极对准的一侧的电极,基本上平行于光束的入射方向的一侧和与光束相交的一侧,并且与该光束相反的一侧倾斜。 与第二电极的与光束相交的一侧。