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101. 发明授权

US6068000A Substrate treatment method 失效
标题翻译：底物处理方法
公开(公告)号：US6068000A
公开(公告)日：2000-05-30
申请号：US891137
申请日：1997-07-10
申请人： Masahito Tanabe , Kazumasa Wakiya , Masakazu Kobayashi , Toshimasa Nakayama
发明人： Masahito Tanabe , Kazumasa Wakiya , Masakazu Kobayashi , Toshimasa Nakayama
IPC分类号： G03F7/32 , G03F7/42 , H01L21/02 , H01L21/027 , H01L21/304 , H01L21/3213 , B08B6/00 , H01L21/302
CPC分类号： H01L21/02071 , G03F7/42 , G03F7/423 , G03F7/425
摘要： The present invention provides a substrate treatment method to be performed after the steps of forming a desired resist pattern on a substrate and etching thereof, wherein said method comprises steps of: (I) removing the resist pattern on the substrate using a remover solution principally containing a salt derived from hydrofluoric acid and a metal-free base; (II) rinsing said substrate with a lithographic rinsing solution containing a water-soluble organic solvent and water; and (III) washing said substrate with water. According to the present invention, metallic films on the substrate are not corroded in the substrate treatment method, and the method can be performed at a low cost and with a reduced volume of labor for disposal of waste solution used for washing the substrate.
摘要翻译：本发明提供了一种在基板上形成期望的抗蚀剂图案和蚀刻步骤之后执行的基板处理方法，其中所述方法包括以下步骤：（I）使用主要包含衍生自氢氟酸和无金属碱的盐; （II）用含有水溶性有机溶剂和水的平版印刷冲洗溶液冲洗所述基材; 和（III）用水洗涤所述基材。根据本发明，在基板处理方法中，基板上的金属膜不会被腐蚀，并且可以以低成本执行该方法，并且减少了用于清洗基板的废溶液处理的劳动量。

102. 发明授权

US6028263A Thermoelectric power generating apparatus and method for driving same 失效
标题翻译：热电发电装置及其驱动方法
公开(公告)号：US6028263A
公开(公告)日：2000-02-22
申请号：US69981
申请日：1998-04-30
申请人： Masakazu Kobayashi , Kazuhiko Shinohara , Keiko Kushibiki , Kenji Furuya
发明人： Masakazu Kobayashi , Kazuhiko Shinohara , Keiko Kushibiki , Kenji Furuya
IPC分类号： H01L35/00 , H01L35/28 , H01L35/32 , H02N11/00 , H01L35/34
CPC分类号： H01L35/28 , H01L35/00
摘要： An apparatus for generating a thermoelectric power and method for driving the same. The disclosed apparatus comprises: a plurality of power generation units, each power generator unit including at least one thermocouple and being capable of mutually generating an equal output voltage; a connection form switch for switching an electrical connection form of each one of the power generator units between a serial connection of the corresponding one of the power generator units to another of the remaining power generator units and a parallel connection thereof to another of the remaining power generator units; a parallel voltage detector for measuring a parallel voltage when the plurality of power generator units are connected in parallel to each other; a connection form detector for determining the connection form of all of the power generator units in one of three forms consisting of a serial connection, a parallel connection, and a combination of the serial and parallel connections, so as to generate a thermoelectric power according to a load connected to the thermoelectric power generating apparatus on the basis of a value of the parallel voltage measured by the parallel voltage measuring block; and a broken wire detector for detecting whether a wire breakage in each of the power generator units occurs.
摘要翻译：一种用于产生热电功率的装置及其驱动方法。所公开的装置包括：多个发电单元，每个发电机单元包括至少一个热电偶并且能够相互产生相等的输出电压; 连接形式开关，用于在发电机单元中的相应一个发电机单元的串联连接到另一个剩余的发电机单元之间切换每个发电机单元的电连接形式，以及将其并联连接到剩余电力中的另一个发电机组; 并联电压检测器，用于当多个发电机单元彼此并联连接时测量并联电压; 连接形式检测器，用于以由串联连接，并联连接和串联和并联连接的组合构成的三种形式中的一种形式确定所有发电机单元的连接形式，以便产生根据基于由并联电压测量块测量的并联电压的值连接到所述热电发电装置的负载; 以及用于检测每个发电机单元中的断线是否发生的断线检测器。

103. 发明授权

US5905063A Remover solution composition for resist and method for removing resist using the same 失效
标题翻译：去除抗蚀剂的溶液组合物及使用其去除抗蚀剂的方法
公开(公告)号：US5905063A
公开(公告)日：1999-05-18
申请号：US89661
申请日：1998-06-03
申请人： Masahito Tanabe , Kazumasa Wakiya , Masakazu Kobayashi , Toshimasa Nakayama
发明人： Masahito Tanabe , Kazumasa Wakiya , Masakazu Kobayashi , Toshimasa Nakayama
IPC分类号： C11D7/10 , C11D7/26 , C11D7/32 , C11D7/50 , C11D17/08 , G03F7/42 , H01L21/027 , C11D7/08 , C11D7/22
CPC分类号： G03F7/423 , G03F7/425
摘要： A remover solution composition for resist which comprises (a) a salt of hydrofluoric acid with a metal-free base, (b) a water-soluble organic solvent, and (c) water and optionally (d) an anticorrosive, and has a pH or 5 to 8. A method for removing resist which comprises the steps of (I) forming a resist layer on a substrate having a metal film, (II) light-exposing the resist layer through a mask pattern and subsequently developing the resist layer to form a resist pattern, and (III) dry-etching the substrate using the resist pattern as a mask and then removing the unnecessary resist and modified resist film with the remover solution composition.
摘要翻译：一种抗蚀剂去除剂溶液组合物，其包含（a）氢氟酸与无金属碱的盐，（b）水溶性有机溶剂和（c）水和任选的（d）防腐蚀剂，并具有pH 或5〜8。一种除去抗蚀剂的方法，其包括以下步骤：（I）在具有金属膜的基材上形成抗蚀剂层，（II）通过掩模图案曝光抗蚀剂层，随后将抗蚀剂层显影形成抗蚀剂图案，（III）使用抗蚀剂图案作为掩模对基板进行干蚀刻，然后用去除剂溶液组合物除去不需要的抗蚀剂和改性的抗蚀剂膜。

104. 发明授权

US5822210A Manufacturing management system having SMT line 失效
标题翻译：具有SMT生产线的生产管理系统
公开(公告)号：US5822210A
公开(公告)日：1998-10-13
申请号：US815635
申请日：1997-03-13
申请人： Masakazu Kobayashi , Shozo Suzuki , Yoshikuni Kurita
发明人： Masakazu Kobayashi , Shozo Suzuki , Yoshikuni Kurita
IPC分类号： B23P21/00 , B23Q41/08 , B65G61/00 , G05B19/418 , G06Q50/00 , G06Q50/04 , H01L21/66 , H05K13/04 , G06F19/00
CPC分类号： H01L22/20 , H05K13/08 , H01L2924/014 , Y02P90/04 , Y02P90/20
摘要： Disclosed is a manufacturing management system for controlling an SMT line to manufacture printed circuit boards the manufacture of which has been designated. A source data management file created by CAD data for a printed circuit board, an inventory parts management file, a cartridge management file and an SMT line information file which includes manufacturing conditions of the SMT manufacturing equipment and equipment arrangement are registered in a database. An SMT set-up support unit creates a set-up instruction manual, which specifies set-up for manufacturing printed circuit boards on the SMT line, by referring to the various files that have been stored in the database. Further, a mounting data creating unit creates mounting data, which are for allowing the mounting machine to mount parts on printed circuit boards, using part setting position addresses of the mounting machine contained in set-up information and part mounting position coordinates contained in the source data management file.
摘要翻译：公开了一种用于控制SMT线以制造其制造已被指定的印刷电路板的制造管理系统。在数据库中登记由印刷电路板的CAD数据创建的源数据管理文件，库存部件管理文件，盒管理文件和包括SMT制造设备和设备布置的制造条件的SMT线信息文件。 SMT设置支持单元通过参考存储在数据库中的各种文件创建一个设置说明手册，该手册指定了在SMT生产线上制造印刷电路板的设置。此外，安装数据创建单元使用包含在设置信息中的安装机的部件设置位置地址和源中包含的部件安装位置坐标来创建用于允许安装机将部件安装在印刷电路板上的安装数据数据管理文件。

105. 发明授权

US5801671A Liquid crystal driving device 失效
标题翻译：液晶驱动装置
公开(公告)号：US5801671A
公开(公告)日：1998-09-01
申请号：US630991
申请日：1996-04-12
申请人： Masakazu Kobayashi , Tatsuya Nakai , Hiroyuki Hirashima , Masahiko Monomohshi , Yoshiki Sano
发明人： Masakazu Kobayashi , Tatsuya Nakai , Hiroyuki Hirashima , Masahiko Monomohshi , Yoshiki Sano
IPC分类号： G02F1/133 , G09G3/20 , G09G3/36
CPC分类号： G09G3/3622 , G09G3/3692 , G09G2320/0223 , G09G3/2011 , G09G3/2014 , G09G3/2018 , G09G3/3681
摘要： A liquid crystal display panel 51 of N rows.times.M columns is driven by a segment driver 52 with two different voltages VS1, VS2, and by a common driver 53 with three voltages VC1, VC2, VC3. An output voltage waveform of the segment driver 52 is modulated for gradation display. The two different voltages VS1, VS2 are selected to be low voltages so as not to require high withstand voltage process in the segment driver 52, which makes it easier to integrated to a large scale in the case of realizing the segment driver 52 as a semiconductor integrated circuit.
摘要翻译： N行x列的液晶显示面板51由具有两个不同电压VS1，VS2的段驱动器52和具有三个电压VC1，VC2，VC3的公共驱动器53驱动。段驱动器52的输出电压波形被调制用于灰度显示。两个不同的电压VS1，VS2被选择为低电压，从而不需要段驱动器52中的高耐压工艺，这使得在实现作为半导体的段驱动器52的情况下更容易集成大规模集成电路。

106. 发明授权

US5368783A Negative-working radiation-sensitive resist composition 失效
标题翻译：负性辐射敏感抗蚀剂组合物
公开(公告)号：US5368783A
公开(公告)日：1994-11-29
申请号：US52484
申请日：1993-04-23
申请人： Masakazu Kobayashi , Hatsuyuki Tanaka , Toshimasa Nakayama
发明人： Masakazu Kobayashi , Hatsuyuki Tanaka , Toshimasa Nakayama
IPC分类号： G03F7/004 , G03F7/029 , G03F7/038 , H01L21/027 , H01L21/30 , G03C1/00 , G03C5/00
CPC分类号： G03F7/038 , G03F7/0045
摘要： Disclosed is a novel negative-working radiation-sensitive resist composition useful in the photolithographic patterning works of resist layers on substrate surfaces in the manufacture of semiconductor devices and capable of giving a finely patterned resist layer with high resolution and having an excellently orthogonal cross sectional profile of the line-wise patterned resist layer with an outstandingly high sensitivity to various actinic rays. The composition comprises, as the essential ingredients, (a) an alkali-soluble resin such as a cresol novolac resin, (b) a specific alkoxymethylated amino resin, e.g., methoxymethylated melamine resin, and (c) a specific triazine compound in a limited weight proportion.
摘要翻译：公开了一种新颖的负性辐射敏感抗蚀剂组合物，其可用于半导体器件制造中的衬底表面上的抗蚀剂层的光刻图案化工作，并且能够以高分辨率给出精细图案化的抗蚀剂层并且具有非常正交的横截面轮廓的线形图案化抗蚀剂层，对各种光化射线具有极高的灵敏度。组合物包含（a）碱溶性树脂如甲酚酚醛清漆树脂，（b）特定烷氧基甲基化氨基树脂，例如甲氧基甲基化三聚氰胺树脂和（c）有限制的三嗪化合物作为必要成分重量比例。

107. 发明授权

US5051688A Crossed coil meter driving device having a plurality of input parameters 失效
标题翻译：具有多个输入参数的交叉线圈表驱动装置
公开(公告)号：US5051688A
公开(公告)日：1991-09-24
申请号：US625927
申请日：1990-12-11
申请人： Hiroshi Murase , Keizi Ishizuka , Masakazu Kobayashi , Masanori Narita
发明人： Hiroshi Murase , Keizi Ishizuka , Masakazu Kobayashi , Masanori Narita
IPC分类号： G01R7/06
CPC分类号： G01R7/06
摘要： A meter driving device for indicating angular positions corresponding to input values. The device includes a memory for storing previously given input values, angular directions corresponding to the input values, and coefficients representative of the grades of change in angular direction depending on the change between adjacent two input values, as parameters. Based on these parameters and the frequency of input pulse signal giving the input values, the angular direction corresponding thereto is calculated. The angular direction signal receives PWM process and then supplies to a pair of crossed exciting coils via a driver. During a predetermined time period from the turning ON and OFF of the power source, the transference of the angular direction signals to the driver is shut out by logic gates, thereby inhibiting malfunctional meter indication.

108. 发明授权

US4844832A Containing an arylsulfonic acid, a phenol and a naphalenic solvent 失效
标题翻译：含有芳基磺酸，苯酚和萘酸溶剂
公开(公告)号：US4844832A
公开(公告)日：1989-07-04
申请号：US149971
申请日：1988-02-03
申请人： Masakazu Kobayashi , Shingo Asaumi , Akira Yokota , Hisashi Nakane
发明人： Masakazu Kobayashi , Shingo Asaumi , Akira Yokota , Hisashi Nakane
IPC分类号： G03C11/00 , C09D9/00 , G03F7/42 , H01L21/027 , H01L21/30
CPC分类号： G03F7/426 , C09D9/005
摘要： The remover solution for photoresist layers comprises: (a) from 30 to 70% by weight of an aromatic hydrocarbon compound or a combination of aromatic hydrocarbon compounds having a flash point of 70.degree. C. or higher containing at least a half amount of a naphthalenic compound selected from the group consisting of naphthalene, methyl naphthalenes and dimethyl naphthalenes; (b) from 5 to 40% by weight of a phenolic compound; and (c) from 10 to 50% by weight of an arylsulfonic acid. The remover solution is effective for a variety of photoresist compositions with less problems in respect to the workers' health and danger of fire and explosion than conventional remover solutions.
摘要翻译：光致抗蚀剂层的去除剂溶液包括：（a）30至70重量％的芳族烃化合物或闪点为70℃或更高的含至少一半的萘的芳族烃化合物的组合选自萘，甲基萘和二甲基萘的化合物; （b）5〜40重量％的酚类化合物; 和（c）10至50重量％的芳基磺酸。去除剂溶液对于各种光刻胶组合物是有效的，与常规去除剂溶液相比，相对于工人的健康和火灾和爆炸危险的问题较少。

109. 发明授权

US4703046A Cephem compounds and processes for preparation thereof 失效
标题翻译：头孢烯化合物及其制备方法
公开(公告)号：US4703046A
公开(公告)日：1987-10-27
申请号：US72990
申请日：1979-09-06
申请人： Ikuo Ueda , Masakazu Kobayashi , Tadashi Kitaguchi
发明人： Ikuo Ueda , Masakazu Kobayashi , Tadashi Kitaguchi
IPC分类号： A61K31/545 , A61K31/546 , A61P31/04 , C07D277/20 , C07D501/04 , C07D501/20 , C07D501/22 , C07D501/34 , C07D501/36
CPC分类号： C07D277/587
摘要： This invention concerns antibiotic cephalosporins of the formula ##STR1## wherein R.sup.1 is amino or protected amino; R.sup.2 is halogen; R.sup.3 is alkyl; and R.sup.6 is carboxy or protected carboxy.
摘要翻译：本发明涉及式IMA的抗生素头孢菌素，其中R1是氨基或被保护的氨基; R2是卤素; R3是烷基; 并且R 6是羧基或被保护的羧基。

110. 发明授权

US4399278A 3,7-Disubstituted-2 or 3-cephem-4-carboxylic acid compounds 失效
标题翻译： 3,7-二取代-2或3-头孢烯-4-羧酸化合物
公开(公告)号：US4399278A
公开(公告)日：1983-08-16
申请号：US353000
申请日：1982-02-26
申请人： Ikuo Ueda , Masakazu Kobayashi , Hisashi Yamada , Hiroki Ono
发明人： Ikuo Ueda , Masakazu Kobayashi , Hisashi Yamada , Hiroki Ono
IPC分类号： A61K31/545 , A61K31/546 , A61P31/04 , C07D501/14 , C07D501/18 , C07D501/20 , C07D501/26 , C07D501/28 , C07D501/30 , C07D501/34 , C07D501/38 , C07D501/60
CPC分类号： C07D501/14
摘要： 7-Amino-2 or 3-cephem-4-carboxylic acid compounds of the formula: ##STR1## wherein R.sup.1 is amino; R.sup.2 is carboxy or carboxy protected by a pharmaceutically acceptable group; ##STR2## is di(lower)alkylamino(lower)alkylamino, an unsaturated or saturated 3 to 8 membered heteromonocyclic(lower)alkylamino group containing 1 to 4 nitrogen atoms, an unsaturated or saturated 3 to 8 membered heteromonocyclic(lower)alkylamino group containing 1 to 4 nitrogen atoms substituted by lower alkyl orhydroxy(lower)alkyl, an unsaturated or saturated 5 to 6 membered heteromonocyclic group containing 2 to 4 nitrogen atoms, an unsaturated or saturated 5 to 6 membered heteromonocyclic group containing 2 to 4 nitrogen atoms substituted by lower alkyl or hydroxy(lower)alkyl or hydroxypiperidino, and X is --S or ##STR3## and pharmaceutically acceptable salts thereof.

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