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91. 发明授权

US09469526B2 Method for the production of conical nanostructures on substrate surfaces 有权
标题翻译：在衬底表面上生产锥形纳米结构的方法
公开(公告)号：US09469526B2
公开(公告)日：2016-10-18
申请号：US13518594
申请日：2010-12-17
申请人： Christoph Morhard , Claudia Pacholski , Joachim P. Spatz
发明人： Christoph Morhard , Claudia Pacholski , Joachim P. Spatz
IPC分类号： B44C1/22 , G02B1/10 , B81C1/00
CPC分类号： B81C1/00031 , B81B2203/0361 , B81B2207/056 , Y10T428/24479
摘要： The invention relates to conical structures on substrate surfaces, in particular optical elements, to methods for the production thereof and to the use thereof, in particular in optical devices, solar cells and sensors. The conical nanostructures according to the invention are suitable in particular for providing substrate surfaces having very low light reflection. The method according to the invention for producing conical nanostructures on substrate surfaces comprises at least the steps of: a) providing a substrate surface covered with nanoparticles; b) etching the substrate surface covered with nanoparticles to a depth of at least 100 nm, wherein the nanoparticles act as an etching mask and the etching parameters are set in such a way that hyperboloid structures are produced underneath the nanoparticles; c) breaking the hyperboloid structures in the region of the smallest diameter by exerting mechanical forces, wherein the structures remaining on the substrate surface have a conical shape which corresponds substantially to half a single-shell hyperboloid.
摘要翻译：本发明涉及衬底表面，特别是光学元件上的锥形结构，用于生产它的方法及其用途，特别是在光学器件，太阳能电池和传感器中的应用。根据本发明的锥形纳米结构特别适用于提供具有非常低的光反射的基底表面。根据本发明的用于在衬底表面上生产锥形纳米结构的方法包括至少以下步骤：a）提供覆盖有纳米颗粒的衬底表面; b）将覆盖有纳米颗粒的衬底表面蚀刻至少至少100nm的深度，其中所述纳米颗粒用作蚀刻掩模，并且蚀刻参数被设置为在纳米颗粒下方产生双曲面结构; c）通过施加机械力来破坏最小直径区域中的双曲面结构，其中残留在基底表面上的结构具有基本上对应于单壳双曲面的一半的圆锥形状。

92. 发明授权

US09458020B2 Process and device for forming a graphene layer 有权
标题翻译：用于形成石墨烯层的工艺和装置
公开(公告)号：US09458020B2
公开(公告)日：2016-10-04
申请号：US13887424
申请日：2013-05-06
申请人： CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE
发明人： Vincent Bouchiat , Johann Coraux , Zheng Han
IPC分类号： B44C1/22 , C01B31/04
CPC分类号： C23C16/52 , B82Y25/00 , B82Y40/00 , C01B32/186 , C01B2204/02 , C01B2204/04 , C01B2204/22 , C23C16/26 , C23C16/4586 , C23C16/56 , Y10S977/734 , Y10S977/843
摘要： The invention concerns a method of forming a graphene layer involving: heating a support layer in a reaction chamber; and forming the graphene layer on a surface of the support layer by: a) during a first time period, introducing into the reaction chamber an organic compound gas to cause a formation of carbon atoms on the surface; b) during a second time period after the first time period, reducing a rate of introduction of the organic compound gas into the reaction chamber and introducing into the reaction chamber a further gas, wherein the further gas is a carbon etching gas; and repeating a) and b) one or more times.
摘要翻译：本发明涉及一种形成石墨烯层的方法，包括：加热反应室中的支撑层; 以及通过以下步骤在所述支撑层的表面上形成所述石墨烯层：a）在第一时间段内，向所述反应室中引入有机化合物气体以在所述表面上形成碳原子; b）在第一时间段之后的第二时间段内，降低有机化合物气体进入反应室的速度，并向反应室中引入另外的气体，其中气体为碳蚀刻气体; 并重复a）和b）一次或多次。

93. 发明授权

US09437287B2 Methods, devices and processes for multi-state phase change devices 有权
标题翻译：用于多状态相变装置的方法，装置和过程
公开(公告)号：US09437287B2
公开(公告)日：2016-09-06
申请号：US14975410
申请日：2015-12-18
申请人： MICRON TECHNOLOGY, INC.
发明人： Davide Colombo , Davide Erbetta
IPC分类号： G11C11/00 , G11C11/56 , B32B7/02 , B44C1/22 , G11C13/00
CPC分类号： G11C11/5678 , B32B7/02 , B44C1/22 , G11C13/0004 , G11C13/0069 , G11C13/0097 , G11C2013/0078 , H01L45/06 , H01L45/1233 , H01L45/144 , H01L45/1666 , Y10T428/24942
摘要： Devices include multiple phase change materials connected in parallel between electrodes. Memory cells with multiple parallel phase change materials can be programmed to transition among more than two states representing multiple bits of information. Methods for manufacture and use are also disclosed.
摘要翻译：器件包括在电极之间并联连接的多个相变材料。具有多个并联相变材料的存储单元可以被编程为在多于两个表示多个位信息的状态之间转换。还公开了制造和使用的方法。

94. 发明授权

US09435038B2 Ion implant assisted metal etching 有权
标题翻译：离子注入辅助金属蚀刻
公开(公告)号：US09435038B2
公开(公告)日：2016-09-06
申请号：US14473424
申请日：2014-08-29
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Thomas Omstead , William Davis Lee , Tristan Ma
IPC分类号： B44C1/22 , C23F17/00 , C23F1/08 , C23F1/00 , H01J37/317
CPC分类号： C23F17/00 , C23F1/00 , C23F1/08 , C23G1/02 , C23G5/00 , H01J37/3171 , H01L21/32134 , H01L21/32136
摘要： An improved method of etching a metal substrate is described. After a mask layer is applied to the metal substrate, an ion implantation process is performed which implants ions, such as oxygen ions, into the exposed regions of the metal substrate. This implantation creates regions of metal oxide, which may be more susceptible to etching. Afterwards, the exposed regions of metal oxide are subjected to an etching process. This process may be through vaporization or may be a wet etch process. In some embodiments, the etchant is selected so that the metal oxide binds with the etchant to form a volatile compound, which stays in the vapor or gaseous state. This may reduce the unwanted deposition of the metal to other surfaces. These ion implantation and etching processes may be repeated a plurality of times to create a recessed feature of the desired depth.
摘要翻译：描述了一种蚀刻金属基底的改进方法。在对金属基板施加掩模层之后，进行离子注入工艺，其将诸如氧离子的离子注入到金属基底的暴露区域中。这种植入产生金属氧化物的区域，其可能更易于蚀刻。之后，对金属氧化物的曝光区域进行蚀刻处理。该方法可以通过蒸发或者可以是湿蚀刻工艺。在一些实施方案中，选择蚀刻剂使得金属氧化物与蚀刻剂结合以形成保持在蒸汽或气态的挥发性化合物。这可能减少金属不希望的沉积到其他表面。这些离子注入和蚀刻工艺可以重复多次以产生所需深度的凹陷特征。

95. 发明授权

US09416296B2 Resist underlayer composition and method for forming pattern using same 有权
标题翻译：抗蚀剂底层组合物和使用其形成图案的方法
公开(公告)号：US09416296B2
公开(公告)日：2016-08-16
申请号：US14779769
申请日：2014-03-24
申请人： DONGJIN SEMICHEM CO., LTD.
发明人： Jung-Youl Lee , Young Bae Lim , Jong-Won Kim , Jae Woo Lee , Jae Hyun Kim
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00 , C09D165/02 , G03F7/09 , G03F7/40
CPC分类号： C09D165/02 , C08G2261/124 , C08G2261/1422 , C08G2261/314 , C08G2261/3142 , C08G2261/3424 , C08G2261/45 , G03F7/094 , G03F7/40 , C08L61/06
摘要： An under-layer composition of resist having superior thermal stability, etching resistance, gap-filling property and void-preventing property, and a method for forming pattern using the same are disclosed. The under-layer composition of resist comprises: an aromatic ring containing polymer having the repeating unit of the following Formula 1; a compound of the following Formula 4; and an organic solvent. in Formula 1, R1 is a monocyclic or polycyclic aromatic hydrocarbon group having 5 to 20 carbon atoms, R2 and R3 is independently a monocyclic or polycyclic aromatic hydrocarbon group having 4 to 14 carbon atoms, a is an integer of 1 to 3, and b is an integer of 0 to 2. in Formula 4, n is an integer of 1 to 250.
摘要翻译：公开了具有优异的热稳定性，耐蚀刻性，间隙填充性和防空气性的抗蚀剂的底层组合物，以及使用其形成图案的方法。抗蚀剂的底层组合物包含：含有下式1的重复单元的含芳环的聚合物; 下式4的化合物; 和有机溶剂。在式1中，R 1为碳原子数为5〜20的单环或多环芳香族烃基，R 2和R 3独立地为碳原子数4〜14的单环或多环芳香族烃基，a为1〜3的整数，b为1〜是0〜2的整数。在式4中，n为1〜250的整数。

96. 发明授权

US09416281B1 Making imprinted multi-layer biocidal particle structure 有权
标题翻译：制作多层杀菌颗粒结构印迹
公开(公告)号：US09416281B1
公开(公告)日：2016-08-16
申请号：US14607104
申请日：2015-01-28
申请人： Eastman Kodak Company
发明人： Ronald Steven Cok , Mitchell Stewart Burberry
IPC分类号： B29C59/00 , B44C1/22 , C09D5/14 , B29C59/02 , B29K105/24 , B29K105/00
CPC分类号： C09D5/14 , A01N25/26 , A01N25/34 , B05D3/12 , B05D5/00 , B05D5/02 , B05D7/542 , B29C59/026 , B29C59/14 , B29C2035/0822 , B29C2035/0827 , B29C2059/023 , B29K2105/0011 , B29K2105/24 , B29K2995/0093
摘要： A method of making a multi-layer biocidal structure includes providing a support and locating a first curable layer on the support, the first curable layer including dispersed multiple biocidal particles. A second curable layer is located on the first curable layer; the multiple biocidal particles are dispersed within only the first curable layer. The first curable layer and the second curable layer are imprinted in a single step with an imprinting stamp having a structure with a depth greater than the thickness of the second curable layer. The first curable layer and the second curable layer are cured in a single step to form a first cured layer and a second cured layer. The imprinting stamp is removed.
摘要翻译：制造多层杀生物结构的方法包括提供载体并将第一可固化层定位在载体上，第一可固化层包括分散的多个杀生物颗粒。第二可固化层位于第一可固化层上; 多个杀生物颗粒仅分散在第一可固化层中。第一可固化层和第二可固化层用一个具有深度大于第二可固化层的厚度的结构的压印印模在一个步骤中印刷。第一可固化层和第二可固化层在一个步骤中固化以形成第一固化层和第二固化层。印记邮票被删除。

97. 发明授权

US09406331B1 Method for making ultra-narrow read sensor and read transducer device resulting therefrom 有权
标题翻译：制造超窄读取传感器和读取传感器装置的方法
公开(公告)号：US09406331B1
公开(公告)日：2016-08-02
申请号：US13929633
申请日：2013-06-27
申请人： Western Digital (Fremont), LLC
发明人： Miao Wang , Wei Gao , Xiaoyu Yang , Anup G. Roy , Wei Zhang , Wencheng Su , Zhihong Zhang , James Yuan , Guanxiong Li , Ming Mao , Hai Sun , Lingyun Miao
IPC分类号： B44C1/22 , G11B5/84 , G11B5/127
CPC分类号： G11B5/313 , G11B5/3163 , G11B5/3166 , G11B5/3169 , G11B5/855
摘要： Disclosed are methods for making ultra-narrow track width (TW) read sensors, and read transducers incorporating such sensors. The methods utilize side-wall line patterning techniques to prepare ultra-narrow mill masks that can be used to prepare the ultra-narrow read sensors.
摘要翻译：公开了用于制造超窄轨道宽度（TW）读取传感器的方法和包含这种传感器的读取传感器的方法。该方法利用侧壁线图案化技术来制备可用于制备超窄读取传感器的超窄磨机掩模。

98. 发明授权

US09405201B2 Lithography process using directed self assembly 有权
标题翻译：使用定向自组装的平版印刷工艺
公开(公告)号：US09405201B2
公开(公告)日：2016-08-02
申请号：US14550207
申请日：2014-11-21
申请人： Taiwan Semiconductor Manufacturing Company, Ltd.
发明人： Yu-Sheng Chang
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00 , G03F7/40 , H01L21/027 , H01L21/033 , G03F7/00
CPC分类号： G03F7/40 , G03F7/0002 , H01L21/0271 , H01L21/0337
摘要： A method includes forming a patterned hard mask layer, with a trench formed in the patterned hard mask layer, dispensing a Bulk Co-Polymer (BCP) coating in the trench, wherein the BCP coating comprises a mix of a first material and a second material different from the first material. The method further includes treating the BCP coating with a chemical to form a first plurality of strips of the first material and a second plurality of strips of the second material, with the first plurality of strips and the second plurality of strips allocated in an alternating layout. The second plurality of strips is selectively etched, and the first plurality of strips is left in the trench.
摘要翻译：一种方法包括形成图案化的硬掩模层，其中形成在图案化的硬掩模层中的沟槽，在沟槽中分配块状共聚合物（BCP）涂层，其中BCP涂层包括第一材料和第二材料的混合物不同于第一种材料。该方法还包括用化学品处理BCP涂层以形成第一材料的第一多个条带和第二材料的第二多个条带，其中第一多个条带和第二多个条带以交替布局分配。选择性地蚀刻第二多个条带，并且第一多个条带留在沟槽中。

99. 发明授权

US09373499B2 Batch-type remote plasma processing apparatus 有权
公开(公告)号：US09373499B2
公开(公告)日：2016-06-21
申请号：US14690936
申请日：2015-04-20
申请人： Hitachi Kokusai Electric Inc.
发明人： Kazuyuki Toyoda , Yasuhiro Inokuchi , Motonari Takebayashi , Tadashi Kontani , Nobuo Ishimaru
IPC分类号： B44C1/22 , C03C25/68 , C03C15/00 , C23F1/00 , H01L21/02 , C23C16/452 , C23C16/455 , C23C16/458 , C23C16/54 , H01J37/32 , H01L21/67 , H01L21/205 , H01L21/77 , H01L21/316
CPC分类号： H01L21/02274 , C23C16/452 , C23C16/45525 , C23C16/45542 , C23C16/45546 , C23C16/45578 , C23C16/4583 , C23C16/4584 , C23C16/54 , H01J37/32357 , H01J37/3244 , H01J37/32513 , H01J37/32541 , H01J37/32834 , H01J2237/332 , H01L21/02183 , H01L21/02205 , H01L21/02211 , H01L21/205 , H01L21/31604 , H01L21/67109 , H01L21/77
摘要： A plasma processing apparatus comprises a processing chamber in which a plurality of substrates are stacked and accommodated; a pair of electrodes extending in the stacking direction of the plurality of substrates, which are disposed at one side of the plurality of substrates in said processing chamber, and to which high frequency electricity is applied; and a gas supply member which supplies processing gas into a space between the pair of electrodes.

100. 发明授权

US09358577B2 Making colored biocidal multi-layer structure 有权
标题翻译：制作有色杀虫多层结构
公开(公告)号：US09358577B2
公开(公告)日：2016-06-07
申请号：US14519451
申请日：2014-10-21
申请人： John Joseph Scheible , Tomas Gerard Patrick McHugh , Alan Richard Priebe , Ronald Steven Cok
发明人： John Joseph Scheible , Tomas Gerard Patrick McHugh , Alan Richard Priebe , Ronald Steven Cok
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00 , B05D5/06 , B05D3/10 , B32B37/14 , B05D3/12 , B05D3/14
CPC分类号： B05D5/06 , B05D3/108 , B05D3/12 , B05D3/148 , B05D5/00 , B05D7/52 , B32B3/30 , B32B7/02 , B32B7/06 , B32B7/12 , B32B27/08 , B32B27/10 , B32B27/16 , B32B27/18 , B32B27/30 , B32B27/304 , B32B27/32 , B32B37/144 , B32B38/145 , B32B2255/10 , B32B2264/10 , B32B2264/102 , B32B2264/104 , B32B2264/105 , B32B2307/402 , B32B2307/404 , B32B2307/412 , B32B2307/546 , B32B2307/70 , B32B2307/7145 , B32B2307/73 , B32B2307/736 , B32B2307/748 , B32B2307/75 , B32B2419/00 , B32B2439/70 , B32B2471/00 , B32B2535/00 , B32B2607/02
摘要： A method of making a colored biocidal multi-layer structure includes providing a first layer of a first color and locating a biocidal second layer on or over the first layer. The biocidal second layer has a second color different from the first color.
摘要翻译：制备着色的杀生物多层结构的方法包括提供第一颜色的第一层和将杀生物的第二层定位在第一层之上或之上。杀生物第二层具有与第一种颜色不同的第二种颜色。

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