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    • 99. 发明授权
    • Semiconductor laser including ridge structure extending between window
regions
    • 半导体激光器包括在窗口区域之间延伸的脊结构
    • US5737351A
    • 1998-04-07
    • US660179
    • 1996-06-03
    • Kenichi Ono
    • Kenichi Ono
    • H01L21/308H01L21/306H01S5/00H01S5/16H01S5/20H01S5/223H01S5/323H01S5/343H01S3/19
    • B82Y20/00H01L21/30612H01S5/162H01S5/209H01S5/2231H01S5/32325H01S5/34326
    • A method of fabricating a semiconductor laser includes successively growing a lower cladding layer of a first conductivity type, an active layer having a superlattice structure, a first upper cladding layer of a second conductivity type, an etch stopping layer of the second conductivity type, and a second upper cladding layer of the second conductivity type on a semiconductor substrate of the first conductivity type; diffusing a dopant impurity into parallel stripe-shaped regions of the active layer to disorder the superlattice structure of the active layer in these regions; etching the second upper cladding layer to expose the etch stopping layer without exposing the etch stopping layer on the disordered regions, thereby producing a stripe-shaped ridge structure extending perpendicular to the disordered regions; and growing a current blocking layer on the etch stopping layer and on the disordered regions, contacting both sides of the ridge structure. Since an etchant used for patterning does not contact the etch stopping layer on the disordered regions of the active layer, unwanted penetration of the etch stopping layer is avoided.
    • 制造半导体激光器的方法包括连续生长第一导电类型的下包层,具有超晶格结构的有源层,第二导电类型的第一上覆层,第二导电类型的蚀刻停止层,以及 在第一导电类型的半导体衬底上的第二导电类型的第二上包层; 将掺杂剂杂质扩散到活性层的平行条形区域,以扰乱这些区域中的有源层的超晶格结构; 蚀刻第二上包层以暴露蚀刻停止层,而不在无序区域上暴露蚀刻停止层,从而产生垂直于无序区域延伸的条状脊结构; 并且在蚀刻停止层和无序区域上生长电流阻挡层,接触脊结构的两侧。 由于用于图案化的蚀刻剂不与有源层的无序区域上的蚀刻停止层接触,所以避免了蚀刻停止层的不期望的穿透。