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    • 91. 发明申请
    • Avalanche Photo Diode
    • 雪崩照片二极管
    • US20080191240A1
    • 2008-08-14
    • US11914871
    • 2005-05-18
    • Eiji YagyuEitaro IshimuraMasaharu Nakaji
    • Eiji YagyuEitaro IshimuraMasaharu Nakaji
    • H01L31/0336
    • H01L31/1075H01L31/0352H01L31/184Y02E10/544Y02P70/521
    • An avalanche photodiode including a first electrode; and a substrate including a first semiconductor layer of a first conduction type electrically connected to the first electrode, in which at least an avalanche multiplication layer, a light absorption layer, and a second semiconductor layer of a second conduction type with a larger band gap than the light absorption layer are deposited on the substrate. The second semiconductor layer is separated into inner and outer regions by a groove formed therein, the inner region electrically connected to a second. With the configuration, the avalanche photodiode has a low dark current and high long-term reliability. In addition, the outer region includes an outer trench, and at least the light absorption layer is removed by the outer trench to form a side face of the light absorption layer. With the configuration, the dark current can be further reduced.
    • 一种雪崩光电二极管,包括第一电极; 以及基板,包括电连接到所述第一电极的第一导电类型的第一半导体层,其中至少具有比所述第一电极具有更大带隙的第二导电类型的雪崩倍增层,光吸收层和第二半导体层 光吸收层沉积在基底上。 第二半导体层通过其中形成的沟槽分成内部和外部区域,内部区域电连接到第二半导体层。 通过该配置,雪崩光电二极管具有低暗电流和高长期可靠性。 此外,外部区域包括外部沟槽,并且至少光吸收层被外部沟槽去除以形成光吸收层的侧面。 通过该结构,可以进一步减小暗电流。
    • 94. 发明申请
    • GROUP III-NITRIDE GROWTH ON SILICON OR SILICON GERMANIUM SUBSTRATES AND METHOD AND DEVICES THEREFOR
    • 硅或硅锗基体上的III族氮化物生长及其方法和装置
    • US20080128745A1
    • 2008-06-05
    • US11566288
    • 2006-12-04
    • Michael A. MastroCharles R. EddyShahzad Akbar
    • Michael A. MastroCharles R. EddyShahzad Akbar
    • H01L31/0336H01L31/0232H01L31/18
    • H01L31/078H01L31/1812H01L31/184Y02E10/544
    • A structure including a Si1-xGex substrate and a distributed Bragg reflector layer disposed directly onto the substrate. The distributed Bragg reflector layer includes a repeating pattern that includes at least one aluminum nitride layer and a second layer having the general formula AlyGa1-yN. Another aspect of the present invention is various devices including this structure. Another aspect of the present invention is directed to a method of forming such a structure comprising providing a Si1-xGex substrate and depositing a distributed Bragg reflector layer directly onto the substrate. Another aspect of the present invention is directed to a photodetector or photovoltaic cell device, including a Si1-xGex substrate device, a group III-nitride device and contacts to provide a conductive path for a current generated across at least one of the Si1-xGex substrate device and the group III-nitride device upon incident light.
    • 包括Si 1-x N x N x N基底的结构和直接设置在基底上的分布式布拉格反射层。 分布式布拉格反射器层包括重复图案,其包括至少一个氮化铝层和具有通式Al x Ga 1-y N的第二层。 本发明的另一方面是包括该结构的各种装置。 本发明的另一方面涉及一种形成这种结构的方法,其包括提供Si 1-x N x N x N基底并将分布式布拉格反射层直接沉积到 基质。 本发明的另一方面涉及一种光电检测器或光伏电池器件,其包括Si 1-x N x N x N x衬底器件,III族氮化物器件和与 为入射光中的Si 1-x N x N x衬底器件和III族氮化物器件中的至少一个产生的电流提供导电路径。