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91. 发明授权

US5420433A Charged particle beam exposure apparatus 失效
标题翻译：带电粒子束曝光装置
公开(公告)号：US5420433A
公开(公告)日：1995-05-30
申请号：US214415
申请日：1994-03-18
申请人： Yoshihisa Oae , Yasushi Takahashi , Hiroshi Yasuda
发明人： Yoshihisa Oae , Yasushi Takahashi , Hiroshi Yasuda
IPC分类号： H01L21/027 , G03F7/20 , H01J37/30 , H01J37/317
CPC分类号： H01J37/3002 , H01J2237/022 , H01J2237/3175
摘要： A barrier electrode is formed above an article to be exposed so as to be opposite the surface of the article to be exposed. A voltage is applied to the barrier electrode so as to form a barrier electric field surrounding the optical axis of a charged particle beam and surrounding the article to be exposed.
摘要翻译：阻挡电极形成在要暴露的物品的上方，以与要暴露的物品的表面相对。向阻挡电极施加电压，以形成围绕带电粒子束的光轴并围绕待曝光的物品的阻挡电场。

92. 发明授权

US5404018A Method of and an apparatus for charged particle beam exposure 失效
标题翻译：带电粒子束曝光的方法和装置
公开(公告)号：US5404018A
公开(公告)日：1995-04-04
申请号：US843172
申请日：1992-02-28
申请人： Hiroshi Yasuda , Yoshihisa Oae , Akio Yamada , Nobuyuki Yasutake , Hisayasu Nishino
发明人： Hiroshi Yasuda , Yoshihisa Oae , Akio Yamada , Nobuyuki Yasutake , Hisayasu Nishino
IPC分类号： G03F7/20 , H01J37/317 , H01L21/027 , H01L21/30 , H01J3/26
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/30483 , H01J2237/31764
摘要： A charged particle beam exposure apparatus employs a main deflector made of electromagnetic coils and a subdeflector made of electrostatic deflection electrodes. An exposure method used for this apparatus is capable of shortening a wait time of the main deflector. The main deflector deflects a charged particle beam in a direction X, while the subdeflector deflects the beam around the deflecting position of the main deflector to expose an object to the beam. An area to be exposed on the object is divided into thin subfields such that the width, in an X-axis direction of each subfield, is approximately 1/3 the length in a Y-axis direction of the same.
摘要翻译：带电粒子束曝光装置采用由电磁线圈制成的主偏转器和由静电偏转电极制成的子偏转器。用于该装置的曝光方法能够缩短主导流板的等待时间。主偏转器使方向X上的带电粒子束偏转，而子偏转器将光束偏转在主偏转器的偏转位置附近，以将物体暴露于光束。要曝光在物体上的区域被划分为薄的子场，使得每个子场的X轴方向上的宽度大约为其Y轴方向上的长度的1/3。

93. 发明授权

US5401278A Method of making battery plates for lead acid storage batteries 失效
标题翻译：铅酸蓄电池电池板的制作方法
公开(公告)号：US5401278A
公开(公告)日：1995-03-28
申请号：US42513
申请日：1993-04-05
申请人： Hiroshi Yasuda , Kazuyoshi Yonezu , Hiroshi Okamoto , Katsuhiro Takahashi
发明人： Hiroshi Yasuda , Kazuyoshi Yonezu , Hiroshi Okamoto , Katsuhiro Takahashi
IPC分类号： H01M4/20 , H01M4/68 , H01M4/74 , H01M4/82
CPC分类号： H01M4/745 , H01M4/20 , Y02P70/54 , Y10T29/10
摘要： A battery plate for lead acid storage batteries using a grid prepared by expanding a lead-calcium-tin (Pb--Ca--Sn) alloy sheet, is made by expanding a Pb--Ca--Sn alloy sheet having a tensile strength of 6.0 kg/mm.sup.2 or lower and an Sn content of 0.6-1.8% by weight to make a grid,filling this grid with an active material paste, and then aging the grid to increase the tensile strength of the expanded grid to 7.0 kg/mm.sup.2 or higher. The workability in expanding of the Pb--Ca--Sn alloy sheet can be improved and furthermore, concentration of stress strain on the nodes of the grid can be inhibited and thus, corrosion of the nodes can be inhibited. The aging can provide a battery pate having a high tensile strength and a lead acid storage battery having an excellent charge-discharge cycle life characteristics.
摘要翻译：使用通过膨胀铅 - 钙 - 锡（Pb-Ca-Sn）合金板制备的网格的铅酸蓄电池的电池板是通过将拉伸强度为6.0kg / cm 2的Pb-Ca-Sn合金板， mm2以下，Sn含量为0.6〜1.8重量％，制成格栅，用活性材料浆料填充该格栅，然后使网格老化，将扩展网格的拉伸强度提高至7.0kg / mm2以上。可以提高Pb-Ca-Sn合金板的膨胀的可加工性，并且可以抑制电网节点上的应力应变集中，从而可以抑制节点的腐蚀。老化可以提供具有高拉伸强度的电池头和具有优异的充放电循环寿命特性的铅酸蓄电池。

94. 发明授权

US5386588A Transmission power control of mobile radiotelephone station in response to base station control signal where base station data is collected by the mobile radiotelephone station 失效
标题翻译：移动无线电话台响应基站控制信号的发射功率控制，基站数据由移动无线电话台收集
公开(公告)号：US5386588A
公开(公告)日：1995-01-31
申请号：US716002
申请日：1991-06-17
申请人： Hiroshi Yasuda
发明人： Hiroshi Yasuda
IPC分类号： H04B7/26 , H04B7/005 , H04W52/00 , H04W52/02 , H04W52/24 , H04W72/08 , H04Q7/00
CPC分类号： H04W52/0245 , H04W52/24 , H04W72/08
摘要： A radiotelephone communication system is provided, in which radio communication channels including control channels and a plurality of communication channels are set between a plurality of base stations and a plurality of mobile stations provided within radio zones of the base stations, an outgoing call and an incoming call are controlled and the communication channels are designated via the control channels, a telephone conversation is made via the communication channels, channels of different frequencies are allocated to adjacent radio zones of the radio zones, each base station includes a circuit for detecting receiving electric field intensity of mobile station and the channel, the base station and operation of radio transmitter and receiver of the mobile station are set such that, when the mobile station is moved between the radio zones, the mobile station is constantly connected to the base station whose communication state is satisfactory. In this radiotelephone communication system, the mobile station is comprised of a circuit for detecting receiving electric field intensities of transmission signals of the plurality of base stations, a memory for storing data associated with detected receiving electric field intensity, and a circuit for transmitting an information associated with the data to the base stations via a up-channel, wherein the base station analyzes the information associated with the data transmitted from the mobile station and sets a transmission power of a mobile station which transmits the data or receiving and transmitting conditions between the radio zones in response to the analyzed result.
摘要翻译：提供了一种无线电话通信系统，其中包括控制信道和多个通信信道的无线电通信信道被设置在多个基站和设置在基站的无线电区域内的多个移动台之间，输出呼叫和传入呼叫被控制，并且通过控制信道指定通信信道，经由通信信道进行电话通话，将不同频率的信道分配给无线电区域的相邻无线电区域，每个基站包括用于检测接收电场的电路移动站和信道的强度，基站和移动台的无线电发射机和接收机的操作被设置为使得当移动台在无线电区域之间移动时，移动台始终连接到基站，其通信状态令人满意。在该无线电话通信系统中，移动台由用于检测多个基站的发送信号的接收电场强度的电路，存储与检测到的接收电场强度相关的数据的存储器，以及用于发送信息的电路通过上行信道与基站相关联的数据，其中，基站分析与从移动台发送的数据相关联的信息，并且设置发送数据的移动台的发送功率，或者在无线电区域响应分析结果。

95. 发明授权

US5347592A Pattern judging method and mask producing method using the pattern judging method 失效
标题翻译：模式判断方法和使用模式判断方法的掩模制作方法
公开(公告)号：US5347592A
公开(公告)日：1994-09-13
申请号：US917260
申请日：1992-07-23
申请人： Hiroshi Yasuda , Satoru Yamazaki , Kiichi Sakamoto
发明人： Hiroshi Yasuda , Satoru Yamazaki , Kiichi Sakamoto
IPC分类号： H01L21/027 , G03F1/20 , G06F17/50 , H01J37/302 , G06K9/00
CPC分类号： G03F1/20 , G06F17/5081 , H01J37/3026
摘要： A pattern judging method which is to be implemented on a computer automatically determines whether or not a pattern should be prohibited from being formed in a mask. The pattern judging method includes the steps of (a) dividing an area of the mask where a desired pattern is to be formed into a plurality of regions, (b) calculating a predetermined physical quantity for each of the regions for a case where one or a plurality of openings corresponding to the desired pattern are formed in the mask, and (c) prohibiting the desired pattern from being formed in the mask if the predetermined quantity calculated in the step (b) exceeds a threshold value for at least one of the regions.
摘要翻译：要在计算机上实现的模式判断方法自动地确定是否应该禁止在掩模中形成图案。模式判断方法包括以下步骤：（a）将要形成的期望图案的掩模的区域划分为多个区域，（b）为每个区域计算一个或多个区域的情况下的预定物理量，如果在步骤（b）中计算的预定量超过阈值中的至少一个，则在掩模中形成对应于期望图案的多个开口，和（c）禁止在掩模中形成期望的图案地区。

96. 发明授权

US5288567A Stencil mask and charged particle beam exposure method and apparatus using the stencil mask 失效
公开(公告)号：US5288567A
公开(公告)日：1994-02-22
申请号：US718433
申请日：1991-06-20
申请人： Kiichi Sakamoto , Yasushi Takahashi , Yoshihisa Oae , Hiroshi Yasuda
发明人： Kiichi Sakamoto , Yasushi Takahashi , Yoshihisa Oae , Hiroshi Yasuda
IPC分类号： H01L21/027 , G03F1/20 , G03F7/20 , H01J37/04 , H01J37/317 , H01L21/30 , G03F9/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/20 , G03F7/2047 , H01J37/045 , H01J37/3174
摘要： A stencil mask is used for exposing a pattern on a wafer using a charged particle beam which is transmitted through the stencil mask. The stencil mask is made up of a plate, and at least a block pattern region formed on the plate. The block pattern region includes apertures of arbitrary shapes for transmitting the charged particle beam which irradiates the apertures within the block pattern region in one shot of the charged particle beam. The block pattern region forms a block mask in which a pair of confronting blanking electrodes is provided with respect to at least predetermined ones of the apertures.

97. 发明授权

US5272347A Apparatus for adjusting a focal position of an electron beam and electron beam projection apparatus including the same 失效
标题翻译：用于调整电子束的焦点位置的装置和包括该电子束的电子束投影装置
公开(公告)号：US5272347A
公开(公告)日：1993-12-21
申请号：US968144
申请日：1992-10-29
申请人： Yoshihisa Oae , Akio Yamada , Hiroshi Yasuda
发明人： Yoshihisa Oae , Akio Yamada , Hiroshi Yasuda
IPC分类号： H01J37/141 , H01J37/21 , H01J37/305 , H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/1413 , H01J37/21 , H01J37/3174
摘要： An electron beam projection apparatus providing a magnetic refocusing lens for adjusting a focal position of an electron beam on an object. An axis of an auxiliary magnetic field produced by the magnetic refocusing lens is required equivalently to agree to that of a convergent magnetic field produced by a magnetic object lens. An inclination adjustment apparatus of the magnetic refocusing lens provides a rolling mechanism being independently rotatable on two axes being perpendicular to each other and also perpendicular to a direction of an axis of a convergent magnetic field. With this inclination adjustment apparatus, adjustment operation is improved.
摘要翻译：一种提供用于调节物体上的电子束的焦点位置的磁性重聚焦透镜的电子束投影装置。由磁性重聚焦透镜产生的辅助磁场的轴等同于与由磁性物镜产生的会聚磁场的轴相一致。磁性重聚焦透镜的倾斜调节装置提供滚动机构，该滚动机构可以在彼此垂直并垂直于会聚磁场的轴的方向的两个轴上独立地旋转。通过该倾斜调节装置，可以提高调整动作。

98. 发明授权

US5256881A Mask and charged particle beam exposure method using the mask 失效
标题翻译：掩模和带电粒子束曝光方法使用掩模
公开(公告)号：US5256881A
公开(公告)日：1993-10-26
申请号：US896715
申请日：1992-06-10
申请人： Satoru Yamazaki , Hiroshi Yasuda , Kiichi Sakamoto
发明人： Satoru Yamazaki , Hiroshi Yasuda , Kiichi Sakamoto
IPC分类号： H01L21/027 , H01J37/317 , H01L21/30 , H01J37/302
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/20 , H01J37/3174 , H01J2237/31776 , H01J2237/31788
摘要： A transmission mask is used when exposing patterns by a charged particle beam which passes therethrough. The transmission mask includes a plate, and a plurality of rectangular blocks formed on a surface of the plate and having an area approximately equal to a cross sectional area of the charged particle beam irradiated thereon, where the blocks include a first block in which at least one transmission hole is provided and a second block in which no transmission hole is provided. The transmission of the first block is partly irradiated by the charged particle beam when varying the size of the exposing pattern. A single second block is provided immediately adjacent to at least two first blocks, so that an irradiating position of the charged particle beam can be varied with respect to both the two first blocks from the single second block.

99. 发明授权

US5180919A Electron beam exposure system having the capability of checking the pattern of an electron mask used for shaping an electron beam 失效
标题翻译：具有检查用于成形电子束的电子掩模的图案的能力的电子束曝光系统
公开(公告)号：US5180919A
公开(公告)日：1993-01-19
申请号：US761454
申请日：1991-09-18
申请人： Yoshihisa Oae , Kiichi Sakamoto , Hiroshi Yasuda
发明人： Yoshihisa Oae , Kiichi Sakamoto , Hiroshi Yasuda
IPC分类号： H01J37/304 , H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3174 , H01J2237/0451 , H01J2237/30455 , H01J2237/31776
摘要： An electron beam exposure system having a capability of checking a pattern to be written on an object comprises an electron beam source for producing an electron beam along an optical axis toward the object, a block mask provided on the optical axis and having selectable aperture patterns therein for correspondingly shaping the electron beam, an addressing deflector fixture for selectively passing the electron beam through a desired aperture on the block mask, an electron optical system for focusing the electron beam shaped by the block mask on the object such that an image of the aperture of the block mask is projected on the object, a screen provided along the optical axis between the block mask and the object for interrupting the electron beam when the electron beam is offset from the alignment with the optical axis, the screen having a through-hole in alignment with the optical axis for passing the electron beam therethrough a controller for controlling the electron optical system such that an image of the aperture of the beam shaping means through which the electron beam has passed is projected on the screen when checking the pattern of the apertures on the block mask, and a detection unit for detecting the image of the aperture that is projected on the screen.
摘要翻译：具有检查要写在物体上的图案的能力的电子束曝光系统包括用于沿着光轴向物体产生电子束的电子束源，设置在光轴上并具有可选孔径图案的块掩模为了对应地形成电子束，用于选择性地使电子束通过块掩模上的所需孔的寻址偏转器固定装置，用于将由掩模掩模形成的电子束聚焦在物体上的电子光学系统，使得孔径的图像块屏蔽物投影在物体上，当电子束偏离与光轴对准时，沿着光轴设置在屏蔽掩模和物体之间的屏幕，用于中断电子束，屏幕具有通孔与用于使电子束通过的光轴对准用于控制电子光学系统的控制器使得当检查块掩模上的孔的图案时，电子束已经通过的光束整形装置的孔径的图像被投影在屏幕上;以及检测单元，用于检测投影的光圈的图像屏幕上。

100. 发明授权

US5175435A Electron beam exposure system with increased efficiency of exposure operation 失效
标题翻译：电子束曝光系统具有更高的曝光效率
公开(公告)号：US5175435A
公开(公告)日：1992-12-29
申请号：US782251
申请日：1991-10-25
申请人： Kiichi Sakamoto , Shunsuke Fueki , Hiroshi Yasuda
发明人： Kiichi Sakamoto , Shunsuke Fueki , Hiroshi Yasuda
IPC分类号： H01L21/027 , H01J37/302
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/30422 , H01J2237/31776
摘要： An electron beam exposure system comprises a pattern data generator for producing first pattern data indicative of a desired pattern of electron beam to be written on a wafer and second pattern data indicative of the number of repetitions of the pattern specified by the first pattern data, as a time sequential mixture of the first and second pattern data. The time sequential mixture of the data is sorted in a data sorting unit into a parallel data of the first pattern data and the second pattern data. Then, a discrimination is made whether the data is the first pattern data or the second pattern data, and when the data is the second pattern data, the data that follows immediately behind the second pattern data is transferred to an output path simultaneously with the second pattern data, which is transferred to another output path. Thereby, the first and second pattern data form a parallel data. The parallel data thus formed is next compressed by deleting the data, that follows immediately behind the data which contains the second pattern data, from both output paths.
摘要翻译：电子束曝光系统包括图形数据发生器，用于产生指示要写入晶片的电子束的期望图案的第一图案数据和指示由第一图案数据指定的图案的重复次数的第二图案数据，第一和第二图案数据的时间顺序混合。将数据的时间序列混合在数据排序单元中排列成第一图案数据和第二图案数据的并行数据。然后，判断数据是第一图案数据还是第二图案数据，并且当数据是第二图案数据时，紧接在第二图案数据之后的数据与第二图案数据同时被传送到输出路径模式数据，传输到另一个输出路径。由此，第一和第二图案数据形成并行数据。这样形成的并行数据接下来通过从两个输出路径中删除紧跟在包含第二模式数据的数据之后的数据来进行压缩。

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