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    • 95. 发明授权
    • Recording medium detecting system
    • 记录介质检测系统
    • US07301324B2
    • 2007-11-27
    • US11477566
    • 2006-06-30
    • Shoji YamaguchiYasunori KodaKunihiro TakahashiMario FuseTsukasa Matsuda
    • Shoji YamaguchiYasunori KodaKunihiro TakahashiMario FuseTsukasa Matsuda
    • G01R19/00
    • G11B5/00804
    • A recording medium detecting system includes a magnetic field-generating unit that generates an alternating magnetic field in a predetermined particular region, a detecting unit provided close to the particular region, that detects a change in magnetic flux density not smaller than a predetermined magnetic-flux-density difference B2, and a recording medium, containing multiple magnetic wires made of a magnetic material and formed in a wire shape having a predetermined length, that causes a large Barkhausen effect when the alternating magnetic field is applied. A magnetic-flux-density difference B1 detected by the detecting unit at an installation position thereof when the recording medium is placed in the particular region is not smaller than the magnetic-flux-density difference B2.
    • 记录介质检测系统包括:在预定的特定区域中产生交变磁场的磁场产生单元,靠近特定区域设置的检测单元,其检测不小于预定磁通量的磁通密度变化 密度差B 2,以及包含由磁性材料制成并形成具有预定长度的线状的多个磁线的记录介质,当施加交变磁场时会导致较大的巴克豪森效应。 当记录介质放置在特定区域中时,由检测单元在其安装位置检测到的磁通密度差B 1不小于磁通密度差B 2。
    • 98. 发明申请
    • Plasma enhanced atomic layer deposition system
    • 等离子体增强原子层沉积系统
    • US20060213438A1
    • 2006-09-28
    • US11090256
    • 2005-03-28
    • Tadahiro IshizakaTsukasa MatsudaFrank CerioKaoru Yamamoto
    • Tadahiro IshizakaTsukasa MatsudaFrank CerioKaoru Yamamoto
    • C23C16/00
    • C23C16/4409C23C16/4404C23C16/4412C23C16/45542C23C16/45544C23C16/5096
    • A plasma enhanced atomic layer deposition (PEALD) system includes a first chamber component coupled to a second chamber component to provide a processing chamber defining an isolated processing space within the processing chamber. A substrate holder is provided within the processing chamber and configured to support a substrate, a first process material supply system is configured to supply a first process material to the processing chamber and a second process material supply system is configured to supply a second process material to the processing chamber. A power source is configured to couple electromagnetic power to the processing chamber, and a sealing assembly interposed between the first and second chamber components. The sealing assembly includes a plurality of sealing members configured to reduce the amount of external contaminants permeating through an interface of the first and second components into the isolated processing space of the processing chamber, wherein the film is formed on the substrate by alternatingly introducing the first process material and the second process material.
    • 等离子体增强原子层沉积(PEALD)系统包括耦合到第二室部件的第一室部件,以提供限定处理室内的隔离处理空间的处理室。 衬底保持器设置在处理室内并被配置为支撑衬底,第一处理材料供应系统被配置为将第一处理材料供应到处理室,第二处理材料供应系统被配置为将第二处理材料供应到 处理室。 电源被配置为将电磁功率耦合到处理室,以及插入在第一和第二室部件之间的密封组件。 密封组件包括多个密封构件,其被配置为将渗透通过第一和第二组件的界面的外部污染物的量减少到处理室的隔离处理空间中,其中通过交替地引入第一 工艺材料和第二工艺材料。