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    • 92. 发明授权
    • Photo-mask for use in manufacturing an optical memory disc, a method for
making the photo-mask and a method for manufacturing the optical memory
disc
    • 用于制造光存储盘的照相掩模,用于制造光掩模的方法和用于制造光存储盘的方法
    • US4839251A
    • 1989-06-13
    • US36426
    • 1987-04-09
    • Kenji OhtaAkira TakahashiTetsuya InuiJunji HirokaneHiroyuki Katayama
    • Kenji OhtaAkira TakahashiTetsuya InuiJunji HirokaneHiroyuki Katayama
    • G11B7/26
    • G11B7/261
    • A photo-mask for use in manufacturing an optical memory disc has a substrate having a disc shape and made of a transparent material, and a film deposited on the substrate and formed with a predetermined pattern of grooves extending spirally or concentrically to the center of the disc shaped substrate such as to leave a thin film at the bottom of the grooves, and a number of microscopic pits in the form of minute indentations with a predetermined spacing aligned along the grooves so as to substantially leave no film at the bottom of the indentations. Thus, a light which has passed through the thin film at grooves is weakened and a light which has passed through the indentations loses substantially no power, and a light applied elsewhere on the film is cut off. The photo-mask is made through the steps of depositing an opaque film on a substrate having a disc shape and made of a transparent material, impinging a first laser at places where the grooves are to be formed, and impinging a second laser at places where the pits are to be formed. The first laser is weaker in power than the second laser.
    • 用于制造光学存储盘的光掩模具有盘形状并由透明材料制成的基板,以及沉积在基板上并形成有螺旋状或同心地延伸到其中心的预定图案的凹槽的薄膜 盘形基板,例如在凹槽的底部留下薄膜,并且具有沿着凹槽对准的预定间隔的微小凹痕形式的多个微凹坑,以便在凹痕的底部基本上不留下薄膜 。 因此,通过凹槽处的薄膜的光被削弱,并且已经穿过凹痕的光基本上不会损失功率,并且切断在膜上其他地方施加的光。 光掩模是通过以下步骤制成的:通过在具有圆盘形状并由透明材料制成的衬底上沉积不透明膜,将第一激光照射到要形成凹槽的位置,并将第二激光照射在 坑将形成。 第一个激光器的功率比第二个激光器弱。