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91. 发明授权

US08586282B2 Resist composition and patterning process 有权
公开(公告)号：US08586282B2
公开(公告)日：2013-11-19
申请号：US13427653
申请日：2012-03-22
申请人： Satoshi Watanabe , Akinobu Tanaka , Takeru Watanabe , Takeshi Kinsho
发明人： Satoshi Watanabe , Akinobu Tanaka , Takeru Watanabe , Takeshi Kinsho
IPC分类号： G03F7/00 , G03F7/028 , G03F7/40
CPC分类号： G03F7/0045 , G03F7/0382 , Y10S430/114 , Y10S430/128
摘要： The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser, ArF laser, F2 laser, ultra-short ultraviolet light, electron beam, X-rays, or the like; and a patterning process utilizing the resist composition. The present invention provides a chemically amplified resist composition comprising one or more kinds of amine compounds or amine oxide compounds (except for those having a nitrogen atom of amine or amine oxide included in a ring structure of an aromatic ring) at least having a carboxyl group and having no hydrogen atoms covalently bonded to a nitrogen atom as a basic center.

92. 发明授权

US08546060B2 Chemically amplified positive resist composition and pattern forming process 有权
标题翻译：化学扩增正光刻胶组成和图案形成过程
公开(公告)号：US08546060B2
公开(公告)日：2013-10-01
申请号：US13027362
申请日：2011-02-15
申请人： Keiichi Masunaga , Satoshi Watanabe , Akinobu Tanaka , Daisuke Domon
发明人： Keiichi Masunaga , Satoshi Watanabe , Akinobu Tanaka , Daisuke Domon
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0395 , G03F7/0397
摘要： A chemically amplified positive resist composition is provided comprising a polymer PB having an amine structure bound thereto and a polymer PA comprising recurring units having an acidic side chain protected with an acid labile protective group and recurring units having an acid generating moiety on a side chain.
摘要翻译：提供化学放大的正性抗蚀剂组合物，其包含具有结合于其上的胺结构的聚合物PB和包含具有由酸不稳定保护基保护的酸性侧链的重复单元的聚合物PA和在侧链上具有产酸部分的重复单元。

93. 发明授权

US08540399B2 Socket device 有权
公开(公告)号：US08540399B2
公开(公告)日：2013-09-24
申请号：US13597804
申请日：2012-08-29
申请人： Satoshi Watanabe , Keiichi Shimizu , Takeshi Osada , Keiichi Shimizu , Toshiya Tanaka , Shigeru Osawa , Takeshi Hisayasu , Hirokazu Otake , Hitoshi Kawano , Makoto Sakai
发明人： Satoshi Watanabe , Keiichi Shimizu , Takeshi Osada , Keiichi Shimizu , Toshiya Tanaka , Shigeru Osawa , Takeshi Hisayasu , Hirokazu Otake , Hitoshi Kawano , Makoto Sakai
IPC分类号： F21V29/00
CPC分类号： F21V29/004 , F21K9/20 , F21V19/001 , F21V19/006 , F21V29/67 , F21V29/73 , F21V29/74 , F21Y2115/10 , H01R33/9456 , Y10T29/49879
摘要： A lighting fixture capable of efficiently radiating heat of a lamp device may be configured to be attached to a socket device. In some examples, by attaching the lamp device to the socket device, a cap portion of the lamp device is brought into contact with a fixture body, and pressed against and brought into close contact with the fixture body by an elastic body. Heat generated by lighting of LEDs of the lamp device is conducted from the cap portion to the fixture body and efficiently radiated.

94. 发明授权

US08470509B2 Negative resist composition and patterning process 有权
标题翻译：负阻抗组成和图案化工艺
公开(公告)号：US08470509B2
公开(公告)日：2013-06-25
申请号：US12902868
申请日：2010-10-12
申请人： Akinobu Tanaka , Keiichi Masunaga , Daisuke Domon , Satoshi Watanabe
发明人： Akinobu Tanaka , Keiichi Masunaga , Daisuke Domon , Satoshi Watanabe
IPC分类号： G03F7/004 , G03F7/028 , G03F7/038 , G03F7/26
CPC分类号： G03F7/0382 , G03F7/0045
摘要： There is disclosed a negative resist composition wherein a base resin contains at least repeating units represented by the following general formula (1) and general formula (2) and has a weight average molecular weight of 1,000 to 10,000, and the compound containing a nitrogen atom as a basic component contains one or more kinds of amine compounds having a carboxyl group and not having a hydrogen atom covalently bonded to a base-center nitrogen atom. There can be a negative resist composition in which a bridge hardly occurs, substrate dependence is low and a pattern with a high sensitivity and a high resolution can be formed, and a patterning process using the same.
摘要翻译：公开了一种负型抗蚀剂组合物，其中基础树脂至少含有由以下通式（1）和通式（2）表示的重复单元，其重均分子量为1,000至10,000，并且含有氮原子的化合物碱性组分含有一种或多种具有羧基并且不具有与碱中心氮原子共价键合的氢原子的胺化合物。可以存在几乎不发生桥的负的抗蚀剂组合物，衬底依赖性低，并且可以形成具有高灵敏度和高分辨率的图案，以及使用其的图案化处理。

95. 发明授权

US08456677B2 Image information transmission device, image information transmission method and computer readable medium 有权
标题翻译：图像信息发送装置，图像信息发送方法和计算机可读介质
公开(公告)号：US08456677B2
公开(公告)日：2013-06-04
申请号：US12787733
申请日：2010-05-26
申请人： Isao Tanaka , Minoru Yoshida , Toshitaka Nakagawa , Satoshi Watanabe , Nobuyuki Kudo , Hitoshi Tamura
发明人： Isao Tanaka , Minoru Yoshida , Toshitaka Nakagawa , Satoshi Watanabe , Nobuyuki Kudo , Hitoshi Tamura
IPC分类号： G06F3/12
CPC分类号： H04N1/32037 , H04N1/32058 , H04N1/3209 , H04N2201/0093 , H04N2201/0094
摘要： An image information transmission device includes a registration unit, a storage unit, a determination unit, and an image information transmission unit. The registration unit registers an image information transmission instruction describing a destination number specifying a destination of image information and an abbreviated number corresponding to the destination number. The storage unit stores the destination number and transmission setting information used for transmitting the image information to the destination specified by the destination number. The determination unit determines whether or not the destination number described in the image information transmission instruction is contained in the destination number. The image information transmission unit transmits the image information.
摘要翻译：图像信息传输装置包括注册单元，存储单元，确定单元和图像信息传输单元。注册单元注册描述指定图像信息的目的地的目的地号码和对应于目的地号码的缩写号码的图像信息传输指令。存储单元将用于将图像信息发送到由目的地号码指定的目的地的目的地号码和发送设置信息存储。确定单元确定图像信息发送指令中描述的目的地号码是否包含在目的地号码中。图像信息发送单元发送图像信息。

96. 发明授权

US08442036B2 Image communication apparatus 有权
标题翻译：图像通信装置
公开(公告)号：US08442036B2
公开(公告)日：2013-05-14
申请号：US12608471
申请日：2009-10-29
申请人： Satoshi Watanabe , Kazutaka Saitoh , Yuji Fujikawa , Isao Tanaka , Hirotaka Kawabata
发明人： Satoshi Watanabe , Kazutaka Saitoh , Yuji Fujikawa , Isao Tanaka , Hirotaka Kawabata
IPC分类号： H04L12/66
CPC分类号： H04L65/1053 , H04L65/1006
摘要： An image communication apparatus comprises: a call connection control unit that establishes a session with a communication partner using an SIP message; and an image communication control unit that controls an image communication, wherein (i) when the call connection control unit receives, as a calling party, from a called party, an INVITE SIP message in which a T.38 communication and a first priority transport are specified in a session description protocol, and when a second priority transport is set in the image communication apparatus of the calling party, the call connection control unit opens the second priority transport, and (ii) when no priority transport is set in the image communication apparatus of the calling party, the call connection control unit opens the first priority transport specified by the called party, and performs a T.38 communication using the opened transport.
摘要翻译：一种图像通信装置，包括：呼叫连接控制单元，其使用SIP消息建立与通信对方的会话; 以及图像通信控制单元，其控制图像通信，其中（i）当呼叫连接控制单元从被叫方接收作为主叫方的INVITE SIP消息时，其中T.38通信和第一优先传输在会话描述协议中指定，并且当在主叫方的图像通信设备中设置第二优先级传输时，呼叫连接控制单元打开第二优先级传输，并且（ii）当在图像中没有设置优先级传输时呼叫连接控制单元打开由被叫方指定的第一优先级传输，并使用打开的传输进行T.38通信。

97. 发明申请

US20130083511A1 LUMINAIRE 有权
公开(公告)号：US20130083511A1
公开(公告)日：2013-04-04
申请号：US13496193
申请日：2011-06-21
申请人： Takeshi Osada , Satoshi Watanabe , Keiichi Shimizu , Shigeru Osawa
发明人： Takeshi Osada , Satoshi Watanabe , Keiichi Shimizu , Shigeru Osawa
IPC分类号： F21V19/00 , H01R13/73
CPC分类号： F21V19/00 , F21K9/20 , F21S8/026 , F21V15/01 , F21V19/0035 , F21V19/006 , F21V29/507 , F21V29/74 , F21Y2115/10 , H01R13/73
摘要： A luminaire capable of contacting a lamp device to a luminaire main body is provided.A luminaire includes a luminaire main body that includes an abutment portion in which heat is transferred and a mounting receiving portion, a socket device that includes a socket main body having an opening portion, an engagement receiving portion which is provided in the opening portion, a mounting member which is fixed to the mounting receiving portion, a receiving portion which receives an elastic member generating an elastic force between the socket main body and the mounting member, and a connection portion which is electrically connected to an external power source, and is mounted so as to move in the elasticity direction of the elastic member with respect to the luminaire main body by the mounting member, and a lamp device that includes a contact portion which contacts the abutment portion, an engagement portion which engages with the engagement receiving portion, and a lamp side connection portion which is electrically connected to the connection portion, wherein the abutment portion of the luminaire main body and the contact portion of the lamp device closely contact with each other by the elastic force of the elastic member according to an operation in which the engagement portion of the lamp device and the engagement receiving portion of the socket device are engaged with each other.
摘要翻译：提供能够将灯具与灯具主体接触的灯具。一种照明装置，其特征在于，包括照明装置主体，其具有传递热量的抵接部和安装容纳部，插座装置，具备具有开口部的插座主体，设置于所述开口部的卡合容纳部，安装构件，固定到安装接收部分;容纳部，其容纳在插座主体和安装构件之间产生弹力的弹性构件;以及连接部，其与外部电源电连接，并且安装以便通过所述安装构件相对于所述照明装置主体沿所述弹性构件的弹性方向移动;以及灯装置，其包括接触所述抵接部的接触部，与所述接合部接合的卡合部，以及电连接到连接部的灯侧连接部，其中，根据灯装置的接合部和插座装置的接合部的动作，通过弹性部件的弹力将灯具的接触部分与灯具的接触部分紧密接触互相接触。

98. 发明授权

US08394577B2 Patterning process 有权
标题翻译：图案化过程
公开(公告)号：US08394577B2
公开(公告)日：2013-03-12
申请号：US12756587
申请日：2010-04-08
申请人： Akinobu Tanaka , Tamotsu Watanabe , Satoshi Watanabe
发明人： Akinobu Tanaka , Tamotsu Watanabe , Satoshi Watanabe
IPC分类号： G03F7/26
CPC分类号： G03F7/0382 , G03F7/0048 , G03F7/0392 , G03F7/40
摘要： In a chemically amplified resist composition comprising a base resin, an acid generator, and a solvent, 1,400-5,000 pbw of the solvent is present per 100 pbw of the base resin, and the solvent comprises at least 60 wt % of PGMEA and ethyl lactate, and 0.2-20 wt % of a high-boiling solvent. A resist pattern is formed by coating the resist composition on a substrate, prebaking, patternwise exposure, post-exposure baking, development, and heat treatment.
摘要翻译：在包含基础树脂，酸产生剂和溶剂的化学放大型抗蚀剂组合物中，每100pbw的基础树脂存在1,400-5,000pbw的溶剂，溶剂包含至少60wt％的PGMEA和乳酸乙酯，和0.2-20重量％的高沸点溶剂。通过将抗蚀剂组合物涂布在基材上，预烘烤，图案曝光，曝光后烘烤，显影和热处理来形成抗蚀剂图案。

99. 发明授权

US08388189B2 Socket device 有权
公开(公告)号：US08388189B2
公开(公告)日：2013-03-05
申请号：US13597953
申请日：2012-08-29
申请人： Satoshi Watanabe , Keiichi Shimizu , Takeshi Osada , Keiichi Shimizu , Toshiya Tanaka , Shigeru Osawa , Takeshi Hisayasu , Hirokazu Otake , Hitoshi Kawano , Makoto Sakai
发明人： Satoshi Watanabe , Keiichi Shimizu , Takeshi Osada , Keiichi Shimizu , Toshiya Tanaka , Shigeru Osawa , Takeshi Hisayasu , Hirokazu Otake , Hitoshi Kawano , Makoto Sakai
IPC分类号： F21V29/00
摘要： A lighting fixture capable of efficiently radiating heat of a lamp device may be configured to be attached to a socket device. In some examples, by attaching the lamp device to the socket device, a cap portion of the lamp device is brought into contact with a fixture body, and pressed against and brought into close contact with the fixture body by an elastic body. Heat generated by lighting of LEDs of the lamp device is conducted from the cap portion to the fixture body and efficiently radiated.

100. 发明授权

US08361693B2 Chemically amplified positive photoresist composition and pattern forming process 有权
标题翻译：化学扩增正光致抗蚀剂组合物和图案形成工艺
公开(公告)号：US08361693B2
公开(公告)日：2013-01-29
申请号：US12815787
申请日：2010-06-15
申请人： Keiichi Masunaga , Akinobu Tanaka , Daisuke Domon , Satoshi Watanabe , Youichi Ohsawa , Masaki Ohashi
发明人： Keiichi Masunaga , Akinobu Tanaka , Daisuke Domon , Satoshi Watanabe , Youichi Ohsawa , Masaki Ohashi
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028
CPC分类号： G03F7/0392 , G03F7/0045
摘要： A polymer comprising a high proportion of aromatic ring structure-containing units and containing an aromatic sulfonic acid sulfonium salt on a side chain is used to form a chemically amplified positive photoresist composition which is effective in forming a resist pattern having high etch resistance. The polymer overcomes the problems of dissolution in solvents for polymerization and purification and in resist solvents.
摘要翻译：使用包含高比例的含芳环结构的单元并在侧链上含有芳族磺酸锍盐的聚合物形成化学放大的正性光致抗蚀剂组合物，该组合物有效地形成具有高耐蚀刻性的抗蚀剂图案。该聚合物克服了用于聚合和纯化的溶剂溶解和抗蚀剂溶剂中的问题。

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