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    • 92. 发明授权
    • Washing apparatus
    • 洗衣机
    • US5787910A
    • 1998-08-04
    • US652923
    • 1996-05-24
    • Masao OdaMichio FujiwaraTomoyuki KandaHideho TaguchiYasunori KurahashiTakao MorisakiTakasuke UmemotoTakayuki InoueFusako Tanaka
    • Masao OdaMichio FujiwaraTomoyuki KandaHideho TaguchiYasunori KurahashiTakao MorisakiTakasuke UmemotoTakayuki InoueFusako Tanaka
    • A47L15/00A47L17/00B05B9/00B08B3/02
    • A47L17/00A47L15/0086
    • A washing apparatus is compact as well as easy to handle, with which a user can wash down dirt effectively in a short time. Washing liquid supplied from the washing liquid supplying means is made in the form of high-speed jet liquid by a high-speed jet stream spouting means. The high-speed jet liquid is spouted from the aperture of the first cover to wash down dirt by the impact given by the high-speed jet liquid. A washing object is dewatered by gas spouted from the aperture by a blowing means. The high-speed jet stream spouting means is comprised of a rotating object having a plurality of radial shape flow paths extending from a center portion to a circumference of the rotating object, and a liquid supplying portion for supplying washing liquid to a central portion of the radial shape flow paths. A rotating means rotates the rotating object so that washing liquid supplied in the radial shape flow paths is accelerated in the direction of a circumference as well as a radius of the rotating object by rotation. The accelerated washing liquid is spouted from an aperture in the form of high-speed jet liquid.
    • 洗涤装置紧凑,易于操作,用户可以在短时间内有效地清洗污垢。 从洗涤液供给装置供给的洗涤液通过高速喷射流喷射装置被制成高速喷射液体的形式。 高速喷射液体从第一盖的孔口喷出,以通过高速喷射液体的冲击来清除污垢。 洗涤物体通过吹出装置从孔中喷出的气体脱水。 高速喷射流喷射装置包括具有从旋转物体的中心部分延伸到圆周的多个径向形状的流动路径的旋转物体,以及用于将清洗液供应到旋转物体的中心部分的液体供应部分 径向形状流动路径。 旋转装置旋转旋转物体,使得在径向形状流动路径中供应的洗涤液体在圆周方向以及旋转物体的旋转半径方向上被加速。 加速的洗涤液体以高速喷射液体形式的孔径喷出。
    • 100. 发明授权
    • Semiconductor device and method for manufacturing the same
    • 半导体装置及其制造方法
    • US08441047B2
    • 2013-05-14
    • US12754393
    • 2010-04-05
    • Hiromichi GodoTakayuki Inoue
    • Hiromichi GodoTakayuki Inoue
    • H01L29/80H01L31/112
    • H01L29/7869H01L27/1225
    • An object is to provide an n-channel transistor and a p-channel transistor having a preferred structure using an oxide semiconductor. A first source or drain electrode which is electrically connected to a first oxide semiconductor layer and is formed using a stacked-layer structure including a first conductive layer containing a first material and a second conductive layer containing a second material, and a second source or drain electrode which is electrically connected to a second oxide semiconductor layer and is formed using a stacked-layer structure including a third conductive layer containing the first material and a fourth conductive layer containing the second material are included. The first oxide semiconductor layer is in contact with the first conductive layer of the first source or drain electrode, and the second oxide semiconductor layer is in contact with the third and the fourth conductive layers of the second source or drain electrode.
    • 目的是提供使用氧化物半导体的具有优选结构的n沟道晶体管和p沟道晶体管。 第一源极或漏极,其电连接到第一氧化物半导体层,并且使用包括包含第一材料的第一导电层和包含第二材料的第二导电层的堆叠层结构形成,以及第二源极或漏极 电连接到第二氧化物半导体层并且使用包括包含第一材料的第三导电层和包含第二材料的第四导电层的层叠结构形成的电极。 第一氧化物半导体层与第一源极或漏极的第一导电层接触,并且第二氧化物半导体层与第二源极或漏极的第三导电层和第四导电层接触。