会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 91. 发明授权
    • Method and apparatus for maskless semiconductor and liquid crystal
display inspection
    • 无掩模半导体和液晶显示器检查的方法和装置
    • US6122397A
    • 2000-09-19
    • US888115
    • 1997-07-03
    • Shih-Jong J. LeeAlan C. Nelson
    • Shih-Jong J. LeeAlan C. Nelson
    • G01B11/30G01M11/00G01N21/956G01N21/958G06T1/00G06T7/00H01L21/66G06K9/00
    • G06T7/001G06T2207/30121G06T2207/30148
    • Image primitive based maskless semiconductor wafer and liquid crystal display panel inspection by the characterization of wafer patterns. Potential defects are detected as exceptions to the rules of general semiconductor surface pattern structure. The wafer or liquid crystal display, lcd, structure is encoded into multiple profiles of a set of primitive characterization modules. Primitive profiles are correlated with potential defects along with aligned pattern images for surface component to surface component, lcd active matrix element to lcd active matrix element, comparison and further refines the results using data from multiple surface components or lcd active matrix elements. Multiple stage defect classification is applied to the potential defects to reject false defects. Multiple layer correlation and automatic learning enhance and tailor detection rules during a ramp-up stage. There is a dramatic reduction of false and nuisance defects and a high sensitivity to critical defects. The highly robust method is not sensitive to factors such as metal grain structure and imperfect alignment. Automatic learning tailors the inspection system for a specific semiconductor surface design and manufacturing process.
    • 基于图像原始的无掩模半导体晶片和液晶显示面板通过晶圆图案的表征进行检查。 潜在的缺陷被检测为一般半导体表面图案结构规则的例外。 晶片或液晶显示器,lcd,结构被编码成一组原始表征模块的多个轮廓。 原始曲线与潜在的缺陷以及表面成分到表面分量,lcd有源矩阵元素到lcd有源矩阵元素的对齐图案图像相关,并且使用来自多个表面分量或lcd有源矩阵元素的数据进一步优化结果。 多级缺陷分类应用于潜在的缺陷以排除假缺陷。 多层相关和自动学习在加速阶段提高和定制检测规则。 虚假和滋扰缺陷大大减少,对关键缺陷有很高的敏感性。 高度鲁棒的方法对金属晶粒结构和不完全对准等因素不敏感。 自动学习为特定的半导体表面设计和制造过程定制了检测系统。