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    • 96. 发明申请
    • METHOD FOR FORMING POLYCRYSTALLINE THIN FILM BIPOLAR TRANSISTORS
    • 形成多晶薄膜双极晶体管的方法
    • US20080311722A1
    • 2008-12-18
    • US11763876
    • 2007-06-15
    • Christopher J. PettiS. Brad Herner
    • Christopher J. PettiS. Brad Herner
    • H01L21/331
    • H01L29/66265G11C17/16H01L29/7317
    • A method is described for forming a semiconductor device comprising a bipolar transistor having a base region, an emitter region and a collector region, wherein the base region comprises polycrystalline semiconductor material formed by crystallizing silicon, germanium or silicon germanium in contact with a silicide, germanide or silicide germanide. The emitter region and collector region also may be formed from polycrystalline semiconductor material formed by crystallizing silicon, germanium or silicon germanium in contact with a silicide, germanide or silicide germanide forming metal. The polycrystalline semiconductor material is preferably silicided polysilicon, which is formed in contact with C49 phase titanium silicide.
    • 描述了一种用于形成半导体器件的方法,该半导体器件包括具有基极区域,发射极区域和集电极区域的双极晶体管,其中,所述基极区域包括通过使硅,锗或硅锗与硅化物,锗化锗接触而形成的多晶半导体材料 或锗化锗。 发射极区域和集电极区域也可以由通过使硅,锗或硅锗与硅化物,锗化锗或锗化锗形成金属接触而形成的多晶半导体材料形成。 多晶半导体材料优选为与C49相钛硅化物接触形成的硅化多晶硅。