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    • 93. 发明授权
    • Thick porous anodic alumina films and nanowire arrays grown on a solid substrate
    • 在固体基底上生长的厚多孔阳极氧化铝膜和纳米线阵列
    • US07267859B1
    • 2007-09-11
    • US10303653
    • 2002-11-25
    • Oded RabinPaul R. HerzMildred S. DresselhausAkintunde I. AkinwandeYu-Ming Lin
    • Oded RabinPaul R. HerzMildred S. DresselhausAkintunde I. AkinwandeYu-Ming Lin
    • B32B3/10B32B9/00B32B15/00G03C5/00C23C28/00
    • C23C14/024B82Y30/00C23C14/16C23C14/5873C30B7/00C30B7/005C30B29/605H01L35/32H01L35/34Y10T156/10Y10T428/12486Y10T428/1259Y10T428/24273Y10T428/24322Y10T428/24917
    • The presently disclosed invention provides for the fabrication of porous anodic alumina (PAA) films on a wide variety of substrates. The substrate comprises a wafer layer and may further include an adhesion layer deposited on the wafer layer. An anodic alumina template is formed on the substrate. When a rigid substrate such as Si is used, the resulting anodic alumina film is more tractable, easily grown on extensive areas in a uniform manner, and manipulated without danger of cracking. The substrate can be manipulated to obtain free-standing alumina templates of high optical quality and substantially flat surfaces PAA films can also be grown this way on patterned and non-planar surfaces. Furthermore, under certain conditions the resulting PAA is missing the barrier layer (partially or completely) and the bottom of the pores can be readily accessed electrically. The resultant film can be used as a template for forming an array of nanowires wherein the nanowires are deposited electrochemically into the pores of the template. By patterning the electrically conducting adhesion layer, pores in different areas of the template can be addressed independently, and can be filled electrochemically by different materials. Single-stage and multi-stage nanowire-based thermoelectric devices, consisting of both n-type and p-type nanowires, can be assembled on a silicon substrate by this method.
    • 目前公开的发明提供了在各种基底上制造多孔阳极氧化铝(PAA)膜。 衬底包括晶片层,并且还可以包括沉积在晶片层上的粘附层。 在基板上形成阳极氧化铝模板。 当使用诸如Si的刚性基材时,所得的阳极氧化铝膜更易于处理,容易在均匀的方式在广泛的区域生长,并且操作而没有开裂的危险。 可以操作基底以获得高光学质量的自立式氧化铝模板和基本平坦的表面。也可以在图案化和非平面表面上生长PAA膜。 此外,在某些条件下,所得PAA缺少阻挡层(部分或完全),并且孔的底部可以容易地电接触。 所得膜可以用作形成纳米线阵列的模板,其中纳米线电化学沉积到模板的孔中。 通过图案化导电粘合层,可以独立地解决模板的不同区域中的孔,并且可以通过不同的材料电化学填充。 通过这种方法,可以在硅衬底上组装由n型和p型纳米线组成的单级和多级纳米线型热电装置。