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91. 发明申请

US20110079939A1 IMPRINT LITHOGRAPHY APPARATUS AND METHOD 有权
标题翻译： IMPRINT LITHOGRAPHY APPARATUS和方法
公开(公告)号：US20110079939A1
公开(公告)日：2011-04-07
申请号：US12898084
申请日：2010-10-05
申请人： Jeroen Herman LAMMERS , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Roelof Koole
发明人： Jeroen Herman LAMMERS , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Roelof Koole
IPC分类号： B29C59/16 , B29B13/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed for forming a patterned layer from an imprintable liquid medium on a substrate by means of an imprint template having a patterned surface. The method involves contacting the patterned surface and imprintable liquid medium together for a filling period. Light emergent (e.g., scattered or reflected) from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an estimated end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be undertaken more rapidly, with reduced risk of defects arising from remnants of unfilled voids. An imprint lithography apparatus and component for putting the method into effect are also disclosed.
摘要翻译：公开了一种压印光刻方法，用于通过具有图案化表面的压印模板从衬底上的可压印液体介质形成图案化层。该方法包括将图案化表面和可压印液体介质接合在一起，以达到填充时间。在填充期间收集和测量从介质和图案化表面之间的界面出现的轻微的（例如，散射或反射）以获得关于界面处的一个或多个空隙的数据，并且导出填充时间的估计结束时间从数据和时间之间的关系。该方法可以允许更快速地进行随后的工艺步骤，同时减少由未填充的空隙残余物引起的缺陷的风险。还公开了一种用于使该方法生效的压印光刻设备和组件。

92. 发明申请

US20110018167A1 IMPRINT LITHOGRAPHY APPARATUS AND METHOD 有权
标题翻译： IMPRINT LITHOGRAPHY APPARATUS和方法
公开(公告)号：US20110018167A1
公开(公告)日：2011-01-27
申请号：US12842266
申请日：2010-07-23
申请人： Roelof Koole , Sander Frederik Wuister
发明人： Roelof Koole , Sander Frederik Wuister
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography apparatus is disclosed. The apparatus includes an imprint template arrangement for use in imprinting a pattern into a substrate provided with an amount of imprintable medium, a substrate holder configured to hold the substrate, and a chamber having an inlet to allow gas to flow into the chamber and an outlet to allow gas to flow out of the chamber, wherein the imprint template arrangement and the substrate holder are located within the chamber, the chamber, in use, being arranged to contain a gaseous atmosphere. The chamber may be part of a gas circulation system, the inlet and outlet of the chamber being connected to further components of the gas circulation system, the further components of the gas circulation system including: a gas circulation driver configured to drive gas around the gas circulation system; and/or a gas purification unit configured to purify the gas as it circulates around the gas circulation system.
摘要翻译：公开了压印光刻设备。该装置包括用于将图案压印到设置有一定量的可压印介质的基板中的压印模板布置，被配置为保持基板的基板保持器和具有允许气体流入室中的入口的室，以允许气体流出室，其中压印模板布置和衬底保持器位于室内，在使用中，室被布置成容纳气体气氛。腔室可以是气体循环系统的一部分，腔室的入口和出口连接到气体循环系统的另外的部件，气体循环系统的其它部件包括：气体循环驱动器，其配置成驱动气体周围的气体循环系统; 和/或气体净化单元，其构造成当气体在气体循环系统周围循环时净化气体。

93. 发明申请

US20100297282A1 IMPRINT LITHOGRAPHY APPARATUS 有权
公开(公告)号：US20100297282A1
公开(公告)日：2010-11-25
申请号：US12781225
申请日：2010-05-17
申请人： Catharinus De Schiffart , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen
发明人： Catharinus De Schiffart , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F9/00
摘要： An arrangement suitable for use in an imprint lithography apparatus is disclosed. The arrangement includes a support structure arranged to support an imprint template arrangement, a first actuator configured to apply a force to the imprint template arrangement, and a second actuator attached to the support structure, and arranged in use to extend between the support structure and the imprint template arrangement, the second actuator configured to apply a force to the imprint template arrangement, a range of movement of the second actuator being greater than a range of movement of the first actuator.
摘要翻译：公开了适用于压印光刻设备的布置。该布置包括布置成支撑压印模板布置的支撑结构，被配置为向压印模板布置施加力的第一致动器和附接到支撑结构的第二致动器，并且在使用中布置成在支撑结构和压印模板布置，所述第二致动器被配置为向所述压印模板布置施加力，所述第二致动器的移动范围大于所述第一致动器的移动范围。

94. 发明申请

US20100044917A1 IMPRINT LITHOGRAPHY 有权
公开(公告)号：US20100044917A1
公开(公告)日：2010-02-25
申请号：US12468743
申请日：2009-05-19
申请人： Yvonne Wendela KRUIJT-STEGEMAN , Andre Bernardus Jeunink , Johannes Petrus, Martinus Bernardus, Vermeulen , Sander Frederik Wuister , Raymond Wilhelmus, Louis Lafarre , Catharinus DE SCHIFFART , Norbert Erwin Therenzo JANSEN
发明人： Yvonne Wendela KRUIJT-STEGEMAN , Andre Bernardus Jeunink , Johannes Petrus, Martinus Bernardus, Vermeulen , Sander Frederik Wuister , Raymond Wilhelmus, Louis Lafarre , Catharinus DE SCHIFFART , Norbert Erwin Therenzo JANSEN
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography apparatus is disclosed that has a first support structure arranged to support an imprint template, and a first actuator attached to the first support structure, and arranged in use to be located between the first support structure and the imprint template. The first actuator is configured to apply a force to the imprint template. The imprint lithography apparatus further includes a second support structure and a second actuator located between the second support structure and the first support structure. The second actuator is configured to apply a force to the second support structure, wherein a range of movement of the second actuator is greater than a range of movement of the first actuator.
摘要翻译：公开了一种压印光刻设备，其具有布置成支撑压印模板的第一支撑结构，以及附接到第一支撑结构的第一致动器，并且被布置为位于第一支撑结构和压印模板之间。第一个致动器被配置为向压印模板施加力。压印光刻设备还包括位于第二支撑结构和第一支撑结构之间的第二支撑结构和第二致动器。第二致动器构造成向第二支撑结构施加力，其中第二致动器的运动范围大于第一致动器的移动范围。

95. 发明授权

US09927699B2 Imprint lithography 有权
公开(公告)号：US09927699B2
公开(公告)日：2018-03-27
申请号：US13070101
申请日：2011-03-23
申请人： Sander Frederik Wuister , Vadim Yevgenyevich Banine
发明人： Sander Frederik Wuister , Vadim Yevgenyevich Banine
IPC分类号： G01B11/25 , G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography apparatus is disclosed which includes a pattern fixing system configured to use actinic radiation to fix a pattern provided in a layer of imprintable medium by an imprint lithography template, and an inspection system configured to use inspection radiation to inspect an element constituting or, in use, being located within, the imprint lithography apparatus. The imprint lithography apparatus is configured such that the pattern fixing system and the inspection system are provided, in use, with, respectively, actinic radiation and inspection radiation from a single source of radiation.

96. 发明授权

US09285676B2 Self-assemblable polymer and method for use in lithography 有权
标题翻译：自组装聚合物和用于光刻的方法
公开(公告)号：US09285676B2
公开(公告)日：2016-03-15
申请号：US14124213
申请日：2012-06-07
申请人： Aurelie Marie Andree Brizard , Wilhelmus Sebastianus Marcus Maria Ketelaars , Sander Frederik Wuister , Roelof Koole , Emiel Peeters , Christianus Martinus Van Heesch , Henri Marie Joseph Boots , Thanh Trung Nguyen
发明人： Aurelie Marie Andree Brizard , Wilhelmus Sebastianus Marcus Maria Ketelaars , Sander Frederik Wuister , Roelof Koole , Emiel Peeters , Christianus Martinus Van Heesch , Henri Marie Joseph Boots , Thanh Trung Nguyen
IPC分类号： G03F7/11 , G03F7/00 , H01L51/00 , C08F299/02 , C08F299/04 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C08F299/02 , C08F299/04 , H01L51/0043
摘要： A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than TOD, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature Tg for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.
摘要翻译： BCP具有第一单体的第一嵌段和第二单体的第二嵌段，适于在低于TOD的温度下经历从无序状态转化为有序状态，还包括具有官能团的桥连部分以在桥连部分之间提供氢键相邻的第一和第二BCP分子处于有序状态并且在超过BCP的玻璃化转变温度Tg的温度下。包含BCP的组合物包含第一单体的第一嵌段和第二单体的第二嵌段，以及具有通过中心部分连接的第一和第二端基的交联化合物，并且被布置成通过提供非共价键来交联相邻的第一和第二BCP分子的第二嵌段当BCP处于有序状态时，端子组与第二块的第二单体的官能团之间。

97. 发明授权

US09011978B2 Method and apparatus for treatment of self-assemblable polymer layers for use in lithography 有权
标题翻译：用于光刻的自组装聚合物层的处理方法和装置
公开(公告)号：US09011978B2
公开(公告)日：2015-04-21
申请号：US13580356
申请日：2011-01-06
申请人： Roelof Koole , Vadim Yevgenyevich Banine , Sander Frederik Wuister , Emiel Peeters
发明人： Roelof Koole , Vadim Yevgenyevich Banine , Sander Frederik Wuister , Emiel Peeters
IPC分类号： B05D3/02 , G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Treatment of a layer comprising self-assemblable polymer at a surface of a substrate is disclosed. In an embodiment, the treatment includes arranging a zone of temperature change to sweep across the layer, wherein a temperature of the layer within the zone differs from an initial temperature of the layer prior to passage of the zone.
摘要翻译：公开了在衬底表面处理包含可自组装聚合物的层。在一个实施方案中，处理包括布置温度变化区域以扫过层，其中该区域内的层的温度与该区域通过之前该层的初始温度不同。

98. 发明授权

US08956804B2 Self-assemblable polymer and methods for use in lithography 有权
标题翻译：自组装聚合物和用于光刻的方法
公开(公告)号：US08956804B2
公开(公告)日：2015-02-17
申请号：US14123943
申请日：2012-06-07
申请人： Aurelie Marie Andree Brizard , Sander Frederik Wuister , Roelof Koole , Emiel Peeters
发明人： Aurelie Marie Andree Brizard , Sander Frederik Wuister , Roelof Koole , Emiel Peeters
IPC分类号： G03F7/26 , G03F7/004 , G03F7/00 , C30B19/00
CPC分类号： G03F7/004 , B82Y10/00 , B82Y40/00 , C30B19/00 , G03F7/0002
摘要： A block copolymer, adapted to self-assemble to form an ordered pattern on a substrate, has first and second blocks with a terminal moiety covalently bonded to the end of the first block. The molecular weight of the terminal moiety is 20% or less than that of the block copolymer and the terminal moiety has a low chemical affinity for the first block. The terminal moiety can assist the accurate positional placement of the domains of the ordered array and lead to improved critical dimension uniformity and/or reduced line edge roughness. The polymer may be useful in combination with a graphoepitaxy template, where the terminal moiety is chosen to associate with a sidewall of the template. This may reduce undesired aggregation of polymer domains at a sidewall and/or assist in domain placement accuracy.
摘要翻译：适于自组装以在基底上形成有序图案的嵌段共聚物具有第一和第二嵌段，其末端部分共价键合到第一嵌段的末端。末端部分的分子量为嵌段共聚物的分子量的20％以下，末端部分对第一嵌段具有低的化学亲和力。末端部分可以帮助有序阵列的域的精确位置放置并且导致改进的临界尺寸均匀性和/或减少的线边缘粗糙度。所述聚合物可以与骨架外延模板组合使用，其中末端部分被选择为与模板的侧壁缔合。这可以减少侧壁处的聚合物域的不希望的聚集和/或有助于域放置精度。

99. 发明授权

US08822139B2 Method for providing an ordered layer of self-assemblable polymer for use in lithography 有权
标题翻译：提供用于光刻的自组装聚合物的有序层的方法
公开(公告)号：US08822139B2
公开(公告)日：2014-09-02
申请号：US13640293
申请日：2011-01-19
申请人： Emiel Peeters , Sander Frederik Wuister , Roelof Koole
发明人： Emiel Peeters , Sander Frederik Wuister , Roelof Koole
IPC分类号： G03F7/26 , B29C59/00 , C08G83/00 , B82Y40/00 , B82Y10/00 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method for providing an ordered polymer layer at a surface of a substrate includes depositing a self-assemblable polymer layer directly onto a primer layer on a substrate to provide an interface between the self-assemblable polymer layer and the primer layer, and treating the self-assemblable polymer layer to provide self-assembly into an ordered polymer layer, such as a block copolymer, having first and second domain types at the interface. The primer layer is adapted to improve its chemical affinity to each domain type at the interface, in response to the presence of the respective domain type in the self-assembled polymer at the interface during the self-assembly of the self-assemblable polymer layer into the ordered polymer layer. This may lead to reduction in defect levels and/or improved persistence length for the ordered polymer layer. The method may be useful for forming resist layers for use in device lithography.
摘要翻译：在衬底的表面提供有序聚合物层的方法包括将可自组装的聚合物层直接沉积在基底上的底漆层上，以提供可自组装的聚合物层和底漆层之间的界面，以及处理自身可以将聚合物层自组装成有序聚合物层，例如在界面处具有第一和第二域类型的嵌段共聚物。响应于在自组装聚合物层的自组装期间在界面处的自组装聚合物中存在相应的畴型，引物层适于改善其在界面处对每种畴型的化学亲和力有序聚合物层。这可能导致有序聚合物层的缺陷水平和/或改善的持续长度的降低。该方法可用于形成用于器件光刻的抗蚀剂层。

100. 发明申请

US20140212819A1 LITHOGRAPHIC PATTERNING PROCESS AND RESISTS TO USE THEREIN 有权
标题翻译：地图绘制过程及其使用电阻
公开(公告)号：US20140212819A1
公开(公告)日：2014-07-31
申请号：US14131141
申请日：2012-05-30
申请人： Sander Frederik Wuister , Vladimir Mihailovitch Krivtsun , Andrei Mikhailovich Yakunin
发明人： Sander Frederik Wuister , Vladimir Mihailovitch Krivtsun , Andrei Mikhailovich Yakunin
IPC分类号： G03F7/038 , G03F7/004 , G03F7/20
CPC分类号： G03F7/0388 , C08F30/08 , G03F7/0043 , G03F7/0758 , G03F7/2002
摘要： A lithographic process includes the use of a silicon-containing polymer or a compound that includes at least one element selected from the group consisting of: Ta, W, Re, Os, Ir, Ni, Cu or Zn in a resist material for an EUV lithographic process. The wavelength of the EUV light used in the process is less than 11 nm, for example 6.5-6.9 nm. The invention further relates to novel silicon-containing polymers.
摘要翻译：光刻工艺包括在EUV抗蚀剂材料中使用含硅聚合物或包含至少一种选自Ta，W，Re，Os，Ir，Ni，Cu或Zn的元素的化合物光刻工艺。在该过程中使用的EUV光的波长小于11nm，例如6.5-6.9nm。本发明还涉及新的含硅聚合物。

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