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    • 94. 发明授权
    • System and method for providing residual stress test structures
    • 提供残余应力测试结构的系统和方法
    • US07636151B2
    • 2009-12-22
    • US11453633
    • 2006-06-15
    • Manish KothariLior KogutClarence Chui
    • Manish KothariLior KogutClarence Chui
    • G01L1/24G01B11/02G01B9/02
    • G01L5/0047G02B26/001
    • The invention comprises systems and methods determining residual stress such as that found in interferometric modulators. In one example, a test unit can be configured to indicate residual stress in a film by interferometrically modulating light indicative of an average residual stress in two orthogonal directions of the substrate. The test unit can include a reflective membrane attached to the substrate where membrane is configured as a parallelogram with at least a portion of each side attached to the substrate, and an interferometric cavity formed between a portion of the membrane and a portion of the substrate, and where the membrane is configured to deform based on the residual stress of in the film and modulate light indicative of the amount of membrane deformation.
    • 本发明包括确定残余应力的系统和方法,例如在干涉式调制器中发现的。 在一个示例中,测试单元可以被配置为通过对指示基板的两个正交方向上的平均残余应力的光进行干涉测量来指示膜中的残余应力。 测试单元可以包括附接到基底的反射膜,其中膜被构造为平行四边形,其中每侧的至少一部分附着到基底,以及形成在膜的一部分和基底的一部分之间的干涉腔, 并且其中膜被配置为基于膜的残余应力而变形并且调制指示膜变形量的光。