专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

91. 发明授权

US06538254B1 Method and apparatus for sample fabrication 有权
标题翻译：样品制造方法和装置
公开(公告)号：US06538254B1
公开(公告)日：2003-03-25
申请号：US09202540
申请日：1999-03-22
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： H01J3720
CPC分类号： H01J37/3056 , G01N1/286 , G01N1/32 , G01N2001/028 , G01N2001/045 , G01N2001/282 , G01N2001/2886 , H01J2237/31745 , Y10S977/951
摘要： A method and an apparatus for fabrication of a specimen including a semiconductor wafer or a semiconductor device chip and the tip of a probe firmly joined to the vicinity of an area to be observed on the specimen substrate which is mounted on a sample stage. A micro-specimen including the area to be observed is separated from the specimen substrate. Firmly joined to the tip of the probe, the micro-specimen separated from the specimen substrate is then transferred to a specimen holder of an apparatus for carrying out an observation, an analysis and/or a measurement on the micro-specimen to be fixed to the specimen holder. Subsequently, the tip of the probe is separated from the micro-specimen fixed to the specimen holder.
摘要翻译：一种用于制造包括半导体晶片或半导体器件芯片的试样的方法和装置，以及牢固地接合到安装在样品台上的待检测区域附近的探针的尖端。将包含待观察区域的微量试样与试样基板分离。将与试样基板分离的微量试样牢固地接合到样品基板上分离的微量样品，然后转移到用于对要固定的微型试样进行观察，分析和/或测量的装置的试样保持器样品架。随后，将探针的尖端与固定到样品架上的微型样品分离。

92. 发明授权

US08933423B2 Charged particle beam device and sample production method 有权
标题翻译：带电粒子束装置和样品生产方法
公开(公告)号：US08933423B2
公开(公告)日：2015-01-13
申请号：US14119807
申请日：2012-05-16
申请人： Terutaka Nanri , Satoshi Tomimatsu
发明人： Terutaka Nanri , Satoshi Tomimatsu
IPC分类号： G21K5/04 , H01J37/305 , H01J37/244 , H01J37/30 , H01J37/304
CPC分类号： H01J37/3056 , H01J37/244 , H01J37/30 , H01J37/304 , H01J2237/31713 , H01J2237/31745
摘要： Provided is a technique to perform FIB milling, in spite of its sample dependency, effectively into a desired shape without influences of individual differences among operators. A charged particle beam device includes an ion beam optical system device configured to irradiate a sample with an ion beam generated at an ion source; a controller thereof; an element detector configured to detect elements constituting the sample; a controller thereof; and a central processor configured to automatically set conditions for the sample based on the element specified by the element detector.
摘要翻译：提供了一种执行FIB铣削的技术，尽管其样品依赖性有效地成为期望的形状，而不影响操作者之间的个体差异。带电粒子束装置包括：离子束光学系统装置，被配置为用在离子源处产生的离子束照射样品; 其控制器; 元件检测器，被配置为检测构成样品的元件; 其控制器; 以及中央处理器，其被配置为基于由所述元件检测器指定的元素来自动设置所述样本的条件。

93. 发明授权

US08680465B2 Charged particle beam apparatus and film thickness measurement method 有权
标题翻译：带电粒子束装置和膜厚测量方法
公开(公告)号：US08680465B2
公开(公告)日：2014-03-25
申请号：US13498994
申请日：2010-10-12
申请人： Satoshi Tomimatsu , Tsuyoshi Onishi , Toshihide Agemura , Terutaka Nanri
发明人： Satoshi Tomimatsu , Tsuyoshi Onishi , Toshihide Agemura , Terutaka Nanri
IPC分类号： H01J37/26
CPC分类号： H01J37/3005 , H01J37/244 , H01J37/28 , H01J37/3056 , H01J2237/24475 , H01J2237/24578 , H01J2237/3174
摘要： A charged particle beam apparatus of the present invention comprises a transmission electron detector (113; 206) having a detection portion divided into multiple regions (201 to 205; 301 to 305), wherein a film thickness of a sample is calculated by detecting a transmission electron beam (112) generated from the sample when the sample is irradiated with an electron beam (109), as a signal of each of the regions in accordance with scattering angles of the transmission electron beam, and thereafter calculating the intensities of the individual signals. According to the above, there is provided a charged particle beam apparatus capable of performing accurate film thickness monitoring while suppressing an error due to an external condition and also capable of processing a thin film sample into a sample having an accurate film thickness, which makes it possible to improve the accuracy in structure observations, element analyses and the like.
摘要翻译：本发明的带电粒子束装置包括具有分成多个区域（201〜205; 301〜305）的检测部的透射电子检测器（113; 206），其中通过检测透射率来计算样品的膜厚度当用电子束（109）照射样品时从样品产生的电子束（112）作为根据透射电子束的散射角的每个区域的信号，然后计算各个信号的强度。根据上述，提供了一种能够在抑制由于外部条件引起的误差的同时进行精确的膜厚度监测并且还能够将薄膜样品加工成具有精确膜厚度的样品的带电粒子束装置，这使得它可能提高结构观察，元素分析等方面的准确性。

94. 发明申请

US20130146765A1 Charged Particle Beam Device and Sample Observation Method 有权
标题翻译：带电粒子束装置和样品观察方法
公开(公告)号：US20130146765A1
公开(公告)日：2013-06-13
申请号：US13817644
申请日：2011-08-02
申请人： Shinya Kitayama , Wataru Suzuki , Satoshi Tomimatsu
发明人： Shinya Kitayama , Wataru Suzuki , Satoshi Tomimatsu
IPC分类号： H01J37/26
CPC分类号： H01J37/261 , H01J37/244 , H01J37/28 , H01J37/3056 , H01J2237/024 , H01J2237/184 , H01J2237/31745 , H01J2237/31749
摘要： Provided is a charged particle beam device that outputs both an ion beam and an electron beam at a sample, has a common detector for both the ion beam and the electron beam in the charged particle beam device that processes and observes the sample, and is able to provide a detection unit to an appropriate position corresponding to the process details and observation technique of the sample. Provided are an electron beam optical column in which an electron beam for observing the observation surface of a sample is generated, an ion beam optical column in which an ion beam that processes the sample is generated, a detection device that detects a secondary signal generated from the sample or transmitted electrons, and a sample stage that is capable of mounting the detection device thereon; is rotatable in a horizontal plane that includes the optical axis of the electron beam and the optical axis of the ion beam about a cross point where both optical axes intersect; and is able to change the distance between the observation surface of the sample and the cross point.
摘要翻译：提供了一种在样品输出离子束和电子束的带电粒子束装置，在处理和观察样品的带电粒子束装置中具有用于离子束和电子束两者的公共检测器，并且能够以将检测单元提供到对应于样品的处理细节和观察技术的适当位置。提供了一种电子束光学柱，其中产生用于观察样品观察表面的电子束，产生处理样品的离子束的离子束光学柱，检测装置，其检测从样品或透射电子，以及能够在其上安装检测装置的样品台; 可以在包括电子束的光轴和离子束的光轴的水平面中绕两个光轴相交的交叉点旋转; 并且能够改变样品的观察表面与交叉点之间的距离。

95. 发明申请

US20130032714A1 ION BEAM APPARATUS AND ION-BEAM PROCESSING METHOD 有权
标题翻译：离子束设备和离子束处理方法
公开(公告)号：US20130032714A1
公开(公告)日：2013-02-07
申请号：US13641211
申请日：2011-04-12
申请人： Shinya Kitayama , Satoshi Tomimatsu , Tsuyoshi Onishi
发明人： Shinya Kitayama , Satoshi Tomimatsu , Tsuyoshi Onishi
IPC分类号： H01J37/02
CPC分类号： H01J37/3056 , H01J37/304 , H01J2237/208 , H01J2237/31745
摘要： There is provided an apparatus and a method capable of preparing a standardized probe without need for working skill of probe processing. According to the present invention, a probe shape generation process of detecting a probe shape based on the probe incoming current detected by a probe current detection unit, a probe tip coordinate extraction process of detecting a tip position of the probe from the probe shape, a probe contour line extraction process of generating a probe contour line obtained by approximating a contour of the probe from the tip position of the probe and the probe shape, a probe center line extraction process of generating a center line and a vertical line of the probe from the probe contour line, a processing pattern generation process of generating a processing pattern based on the probe tip position, the probe center line, the probe vertical line, and a preset shape and dimension of a probe acute part, and an ion beam termination process of performing, based on the processing pattern, termination of ion-beam processing are performed.
摘要翻译：提供了一种能够准备标准化探针而不需要探头处理工作技能的装置和方法。根据本发明，根据由探针电流检测单元检测到的探针入射电流来检测探针形状的探针形状生成处理，从探针形状检测探针的末端位置的探针尖端坐标提取处理，探针轮廓线提取处理，其生成通过从探针的尖端位置和探针形状近似探针的轮廓而获得的探针轮廓线;探针中心线提取处理，用于产生探针的中心线和垂直线探针轮廓线，基于探针尖端位置，探针中心线，探针垂直线以及探针尖锐部分的预设形状和尺寸产生处理图案的处理图案生成处理以及离子束终止处理基于处理模式执行离子束处理的终止。

96. 发明申请

US20110140006A1 METHOD AND APPARATUS FOR SPECIMEN FABRICATION 有权
标题翻译：方法和装置用于样本制造
公开(公告)号：US20110140006A1
公开(公告)日：2011-06-16
申请号：US13026568
申请日：2011-02-14
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： G21K5/04
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A focused ion beam apparatus, including: a specimen transferring unit having a probe to which a micro-specimen extracted from a specimen, can be joined through a joining deposition film, for transferring the micro-specimen to a sample holder; and wherein, the specimen transferring unit holds the probe which is joined through the joining deposition film to the micro-specimen extracted from the specimen, and the sample stage moves so that the sample holder mounted on the holder clasp is provided into an irradiated range of the focused ion beam, and the specimen transferring unit approaches the probe to the sample holder, and the gas nozzle supplies the deposition gas so that the micro-specimen is fixed to the sample holder through a fixing deposition film, and the ion beam irradiating optical system irradiates the focused ion beam to the micro-specimen fixed to the sample holder for various procedures.
摘要翻译：一种聚焦离子束装置，其特征在于，包括：具有从样本中提取微量试样的探针的检体转印单元，能够通过接合沉积膜接合，将所述微观样品转印到样品保持体上; 并且其中，所述检体转印单元将通过所述接合沉积膜接合的所述探针保持在从所述检体提取的所述微量试样上，并且所述样品台移动，使得安装在所述保持器扣上的样品保持器被设置在聚焦离子束和样品转印单元接近探针到样品保持器，并且气体喷嘴提供沉积气体，使得微量样品通过定影沉积膜固定到样品保持器，并且离子束照射光学系统将聚焦的离子束照射到固定到样品保持器上的微量样品用于各种程序。

97. 发明授权

US07397052B2 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US07397052B2
公开(公告)日：2008-07-08
申请号：US11701415
申请日：2007-02-02
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： H01J37/20
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A system for analyzing a semiconductor device, including: a first specimen fabricating apparatus including: a vacuum chamber in which a sample substrate is placed, an ion beam irradiating optical system for forming a specimen on the sample substrate, a specimen holder to mount the specimen, and a probe for removing the specimen from the sample substrate; a second specimen fabricating apparatus, and an analyzer to analyze the specimen, wherein said first specimen fabrication apparatus has a function to separate the specimen mounted on the specimen holder and the probe in a vacuum condition.
摘要翻译：一种用于分析半导体器件的系统，包括：第一试样制造装置，包括：放置样品基板的真空室，用于在样品基板上形成试样的离子束照射光学系统，用于安装试样的试样保持器以及用于从样品基板除去试样的探针; 第二试样制造装置和分析器，其中所述第一试样制造装置具有在真空条件下分离安装在试样架上的试样和探针的功能。

98. 发明授权

US07397051B2 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US07397051B2
公开(公告)日：2008-07-08
申请号：US11701414
申请日：2007-02-02
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： H01J37/20
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A specimen fabrication apparatus including: a vacuum chamber that accommodates a sample stage to mount a sample, an irradiating optical system that irradiates a focused ion beam to the sample to form a specimen, and a specimen holder placed in the vacuum chamber, to which said formed specimen is transferred by transferring means while the specimen chamber remains substantially sealed.
摘要翻译：一种标本制造装置，包括：容纳样品台以安装样品的真空室，将聚焦离子束照射到样品以形成样品的照射光学系统和放置在所述真空室中的试样保持器，形成的样品通过转移装置转移，同时样品室保持基本上密封。

99. 发明授权

US07397050B2 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US07397050B2
公开(公告)日：2008-07-08
申请号：US11701413
申请日：2007-02-02
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： H01J37/20
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A specimen fabrication apparatus, including: an ion beam irradiating optical system to irradiate a sample placed in a chamber, with an ion beam, a specimen holder to mount a specimen separated by the irradiation of the ion beam, a holder cassette to hold the specimen holder, and a sample stage to hold the sample and the holder cassette, wherein said holder cassette is transferred to outside of the chamber in a condition of holding said specimen holder with the specimen mounted.
摘要翻译：一种试样制造装置，包括：离子束照射光学系统，用于照射放置在室中的样品，离子束，试样保持器，以安装通过离子束照射分离的试样;保持器盒，用于保持试样保持器和样品台以保持样品和保持器盒，其中所述保持器盒在保持所述样本保持器的状态下被转移到所述室的外部。

100. 发明申请

US20070145301A1 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US20070145301A1
公开(公告)日：2007-06-28
申请号：US11701414
申请日：2007-02-02
申请人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
发明人： Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
IPC分类号： H01J37/08
CPC分类号： G01N1/32 , G01N1/28 , G01N2001/028 , G01N2001/045 , G01N2001/282 , H01J37/20 , H01J37/302 , H01J37/3056 , H01J2237/2007 , H01J2237/201 , H01J2237/202 , H01J2237/31732 , H01J2237/31745 , H01J2237/31749
摘要： A specimen fabrication apparatus including: a vacuum chamber that accommodates a sample stage to mount a sample, an irradiating optical system that irradiates a focused ion beam to the sample to form a specimen, and a specimen holder placed in the vacuum chamber, to which said formed specimen is transferred by transferring means while the specimen chamber remains substantially sealed.
摘要翻译：一种标本制造装置，包括：容纳样品台以安装样品的真空室，将聚焦离子束照射到样品以形成样品的照射光学系统，以及放置在所述真空室中的试样保持架，形成的样品通过转移装置转移，同时样品室保持基本上密封。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式