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    • 93. 发明申请
    • INCREASED POWER LINE NOISE IMMUNITY IN IC USING CAPACITOR STRUCTURE IN FILL AREA
    • 使用电容器结构在IC中增加电源线噪声免疫
    • US20070038968A1
    • 2007-02-15
    • US11161634
    • 2005-08-10
    • Florian BraunHanyi DingKai FengZhong-Xiang HeHoward LandisXuefeng LiuGeoffrey Woodhouse
    • Florian BraunHanyi DingKai FengZhong-Xiang HeHoward LandisXuefeng LiuGeoffrey Woodhouse
    • G06F17/50
    • G06F17/5068
    • Increase power line noise immunity in an IC is provided by using decoupling capacitor structure in an area of the IC that is typically not used for routing, but filled with unconnected and non-functional metal squares (fills). In one embodiment, a method includes providing a circuit design layout; determining a density of a structure in an area of the circuit design layout; and in response to the density being less than a pre-determined density for the structure in the area, filling in a portion of the area with at least one capacitor structure until a combined density of the structure and the at least one capacitor structure in the area is about equal to the pre-determined density. Power line noise immunity is increased by increasing decoupling capacitance without enlarging the IC's total size by using a (fill) area that would normally be filled with unconnected and non-functional metal shapes.
    • 通过在IC的区域中使用去耦电容器结构来提供IC中的电力线噪声抗扰度,该结构通常不用于布线,而是填充有未连接和非功能金属正方形(填充)。 在一个实施例中,一种方法包括提供电路设计布局; 确定电路设计布局区域中结构的密度; 并且响应于所述密度小于所述区域中的结构的预定密度,用至少一个电容器结构填充所述区域的一部分,直到所述结构和所述至少一个电容器结构的组合密度在 面积约等于预定密度。 通过使用通常用非连接和非功能金属形状填充的(填充)区域,通过增加去耦电容而不扩大IC的总尺寸来增加电力线噪声抗扰度。
    • 94. 发明授权
    • Multiple layer structure for substrate noise isolation
    • 用于衬底噪声隔离的多层结构
    • US07071530B1
    • 2006-07-04
    • US10905934
    • 2005-01-27
    • Hanyi DingKai D. FengZhong-Xiang HeXuefeng Liu
    • Hanyi DingKai D. FengZhong-Xiang HeXuefeng Liu
    • H01L21/762
    • H01L21/76264H01L23/552H01L23/585H01L2924/0002H01L2924/3011H01L2924/00
    • A method of forming a semiconductor structure, comprising: providing a substrate having a buried insulative layer and a heavily doped layer; forming a first trench within the substrate around a protected area; filling the first trench with an insulative material, wherein the first trench filled with the insulative material and the buried insulative layer combine to form a high impedance noise isolation that surrounds the protected area on all sides except one side of the protected area to isolate noise from the protected area; forming a second trench within the substrate around the first trench; and filling the second trench with a conductive material, wherein the second trench filled with the conductive material and the heavily doped layer combine to form a low impedance ground path that surrounds the high impedance noise isolation on all sides except one side of the high impedance noise isolation to isolate noise from the protected area.
    • 一种形成半导体结构的方法,包括:提供具有掩埋绝缘层和重掺杂层的衬底; 在保护区域周围形成衬底内的第一沟槽; 用绝缘材料填充第一沟槽,其中填充有绝缘材料的第一沟槽和埋入绝缘层组合形成高阻抗噪声隔离,围绕保护区域的保护区域,除了保护区域的一侧以隔离噪声 保护区; 在所述衬底内围绕所述第一沟槽形成第二沟槽; 以及用导电材料填充所述第二沟槽,其中填充有所述导电材料和所述重掺杂层的所述第二沟槽组合以形成低阻抗接地路径,所述低阻抗接地路径围绕除所述高阻抗噪声的一侧之外的所有侧面上的高阻抗噪声隔离 隔离隔离来自保护区的噪音。
    • 95. 发明授权
    • On-chip inductor with magnetic core
    • 带磁芯的片上电感
    • US07061359B2
    • 2006-06-13
    • US10604180
    • 2003-06-30
    • Hanyi DingKai Di FengZhong-Xiang HeXuefeng Liu
    • Hanyi DingKai Di FengZhong-Xiang HeXuefeng Liu
    • H01F5/00
    • H01F41/046H01F17/0006H01L23/5227H01L2924/0002H01L2924/00
    • An inductor formed on an integrated circuit chip including one or more inner layers (12) between two or more outer layers (14), inductor metal winding turns (16) included in one or more inner layers (12), and a magnetic material forming the two or more outer layers (14) and the one or more inner layers (12). In one embodiment, the magnetic material is a photoresist paste having magnetic particles. In another embodiment, the magnetic material is a series of magnetic metallic strips (32 and 36) disposed on each of the first and second portions (30 and 34, respectively) of the two or more outer layers (14) and on each of the one or more inner layers (12). The series of magnetic metallic strips on the first and second portions (30, 34) form a grid pattern. Other embodiments include an adjustable controlled compound deposit and control windings with adjustable electrical currents.
    • 形成在集成电路芯片上的电感器,其包括在一个或多个内层(12)中包括的两个或多个外层(14),电感器金属绕组匝(16)之间的一个或多个内层(12) 两个或多个外层(14)和一个或多个内层(12)。 在一个实施例中,磁性材料是具有磁性颗粒的光致抗蚀剂浆料。 在另一个实施例中,磁性材料是一系列设置在两个或多个外层(14)的第一和第二部分(30和34)的每一个上的磁性金属条(32和36) 一个或多个内层(12)。 第一和第二部分(30,34)上的一系列磁性金属条形成网格图案。 其他实施例包括具有可调电流的可调控制的化合物沉积和控制绕组。
    • 96. 发明授权
    • On-chip transmission line structures with balanced phase delay
    • 具有平衡相位延迟的片上传输线结构
    • US08860191B2
    • 2014-10-14
    • US13168512
    • 2011-06-24
    • Hanyi DingKai D. FengZhong-Xiang HeXuefeng Liu
    • Hanyi DingKai D. FengZhong-Xiang HeXuefeng Liu
    • H01L23/66H01P1/18H01L23/522
    • H01L23/5222H01L23/5225H01L23/66H01L2223/6638H01L2924/0002H01P1/184Y10T29/49117H01L2924/00
    • A transmission wiring structure, associated design structure and associated method for forming the same. A structure is disclosed having: a plurality of wiring levels formed on a semiconductor substrate; a pair of adjacent first and second signal lines located in the wiring levels, wherein the first signal line comprises a first portion formed on a first wiring level and a second portion formed on a second wiring level; a primary dielectric structure having a first dielectric constant located between the first portion and a ground shield; and a secondary dielectric structure having a second dielectric constant different than the first dielectric constant, the secondary dielectric structure located between the second portion and the ground shield, and the second dielectric layer extending co-planar with the second portion and having a length that is substantially the same as the second portion.
    • 一种传输线路结构,相关设计结构及其相关方法。 公开了一种结构,其具有:形成在半导体衬底上的多个布线层; 位于布线层中的一对相邻的第一和第二信号线,其中第一信号线包括形成在第一布线层上的第一部分和形成在第二布线层上的第二部分; 第一介电结构,其具有位于第一部分和接地屏蔽之间的第一介电常数; 以及具有不同于所述第一介电常数的第二介电常数的次级介电结构,所述第二介电结构位于所述第二部分和所述接地屏蔽之间,并且所述第二电介质层与所述第二部分共面延伸并且具有长度为 基本上与第二部分相同。