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91. 发明授权

US07931522B2 Removable optical monitoring system for chemical mechanical polishing 有权
标题翻译：化学机械抛光可拆卸光学监控系统
公开(公告)号：US07931522B2
公开(公告)日：2011-04-26
申请号：US12579245
申请日：2009-10-14
申请人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
发明人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
IPC分类号： B24B49/00 , B24B51/00
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： A polishing system includes a platen having a top surface to receive a polishing pad, a recess in the top surface, and a cavity inside the platen spaced from the recess, a carrier head to hold a surface of a substrate against the polishing pad on the platen, a monitoring module located in the cavity, the monitoring module including a light source and a detector, an optical head removably mounted in the recess in the top surface platen, and an optical fiber having a proximate end coupled to the monitoring module and a distal end held by the optical head holding the distal end of the optical fiber in a position to direct light through a window in the polishing pad to the surface of the substrate and receive reflected light from the surface of the substrate.
摘要翻译：抛光系统包括具有顶表面以接收抛光垫的台板，顶表面中的凹部以及与凹部间隔开的压板内的空腔，用于将基板的表面保持在抛光垫上的载体头压板，位于空腔中的监测模块，监测模块包括光源和检测器，可拆卸地安装在顶表面压板中的凹部中的光学头，以及具有耦合到监测模块的近端的光纤和远端由保持光纤的远端的光学头保持在将光引导至抛光垫中的窗口的位置，并接收来自基板表面的反射光。

92. 发明申请

US20100284007A1 Spectrum Based Endpointing For Chemical Mechanical Polishing 有权
标题翻译：基于频谱的化学机械抛光终点
公开(公告)号：US20100284007A1
公开(公告)日：2010-11-11
申请号：US12843782
申请日：2010-07-26
申请人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
发明人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
IPC分类号： G01B11/00
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： Methods and apparatus for spectrum-based endpointing. An endpointing method includes selecting a reference spectrum. The reference spectrum is a spectrum of white light reflected from a film of interest on a first substrate and has a thickness greater than a target thickness. The reference spectrum is empirically selected for particular spectrum-based endpoint determination logic so that the target thickness is achieved when endpoint is called by applying the particular spectrum-based endpoint logic. The method includes obtaining a current spectrum. The current spectrum is a spectrum of white light reflected from a film of interest on a second substrate when the film of interest is being subjected to a polishing step and has a current thickness that is greater than the target thickness. The method includes determining, for the second substrate, when an endpoint of the polishing step has been achieved. The determining is based on the reference and current spectra.
摘要翻译：用于基于频谱的终点的方法和装置。终点方法包括选择参考频谱。参考光谱是在第一衬底上从感兴趣的膜反射的白光的光谱，并且具有大于目标厚度的厚度。对于特定的基于频谱的端点确定逻辑，经验地选择参考频谱，使得当通过应用特定的基于频谱的端点逻辑来调用端点时实现目标厚度。该方法包括获得当前频谱。目前的光谱是当感兴趣的薄膜经受抛光步骤并且具有大于目标厚度的电流厚度时，在第二基板上从感兴趣的薄膜反射的白光的光谱。该方法包括为第二基底确定何时已经实现了抛光步骤的终点。该确定是基于参考和当前光谱。

93. 发明申请

US20100075582A1 POLISHING PAD ASSEMBLY WITH GLASS OR CRYSTALLINE WINDOW 有权
标题翻译：抛光垫组件与玻璃或结晶窗
公开(公告)号：US20100075582A1
公开(公告)日：2010-03-25
申请号：US12572100
申请日：2009-10-01
申请人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
发明人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
IPC分类号： B24D7/12 , B24D18/00
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： Methods and apparatus for providing a chemical mechanical polishing pad. The pad includes a polishing layer having a top surface and a bottom surface. The pad includes an aperture having a first opening in the top surface and a second opening in the bottom surface. The top surface is a polishing surface. The pad includes a window that includes a first portion made of soft plastic and a crystalline or glass like second portion. The window is transparent to white light. The window is situated in the aperture so that the first portion plugs the aperture and the second portion is on a bottom side of the first portion, wherein the first portion acts a slurry-tight barrier.
摘要翻译：用于提供化学机械抛光垫的方法和设备。衬垫包括具有顶表面和底表面的抛光层。垫包括在顶表面中具有第一开口和底表面中的第二开口的孔。顶面是抛光面。该垫包括一个窗，其包括由软塑料制成的第一部分和类似第二部分的晶体或玻璃。窗户对白光透明。窗口位于孔中，使得第一部分插入孔，并且第二部分在第一部分的底侧上，其中第一部分起浆料密封的屏障。

94. 发明授权

US07614933B2 Polishing pad assembly with glass or crystalline window 有权
标题翻译：带玻璃或结晶窗的抛光垫组件
公开(公告)号：US07614933B2
公开(公告)日：2009-11-10
申请号：US11945987
申请日：2007-11-27
申请人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
发明人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
IPC分类号： B24B49/12
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： Methods and apparatus for providing a chemical mechanical polishing pad. The pad includes a polishing layer having a top surface and a bottom surface. The pad includes an aperture having a first opening in the top surface and a second opening in the bottom surface. The top surface is a polishing surface. The pad includes a window that includes a first portion made of soft plastic and a crystalline or glass like second portion. The window is transparent to white light. The window is situated in the aperture so that the first portion plugs the aperture and the second portion is on a bottom side of the first portion, wherein the first portion acts a slurry-tight barrier.
摘要翻译：用于提供化学机械抛光垫的方法和设备。衬垫包括具有顶表面和底表面的抛光层。垫包括在顶表面中具有第一开口和底表面中的第二开口的孔。顶面是抛光面。该垫包括一个窗，其包括由软塑料制成的第一部分和类似第二部分的晶体或玻璃。窗户对白光透明。窗口位于孔中，使得第一部分插入孔，并且第二部分在第一部分的底侧上，其中第一部分起浆料密封的屏障。

95. 发明授权

US07226339B2 Spectrum based endpointing for chemical mechanical polishing 有权
公开(公告)号：US07226339B2
公开(公告)日：2007-06-05
申请号：US11213674
申请日：2005-08-26
申请人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
发明人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
IPC分类号： B24B49/00
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： Methods and apparatus for providing a flushing system for flushing a top surface of an optical head. The flushing system includes a source of gas configured to provide a flow of gas, a delivery nozzle, a delivery line that connects the source of gas to the delivery nozzle, a vacuum source configured to provide a vacuum, a vacuum nozzle, and a vacuum line that connects the vacuum source to the vacuum nozzle. The source of gas and the delivery nozzle are configured to direct a flow of gas across the top surface of the optical head. The vacuum nozzle and vacuum sources are configured so that the flow if gas is laminar.

96. 发明授权

US07112119B1 Sealed polishing pad methods 失效
标题翻译：密封抛光垫方法
公开(公告)号：US07112119B1
公开(公告)日：2006-09-26
申请号：US11400416
申请日：2006-04-06
申请人： Bogdan Swedek , David J. Lischka , Jeffrey Drue David , Dominic J. Benvegnu
发明人： Bogdan Swedek , David J. Lischka , Jeffrey Drue David , Dominic J. Benvegnu
IPC分类号： B24B7/00
CPC分类号： B24B37/205 , B24D18/00
摘要： A polishing pad, polishing system, method of making a polishing pad and method of using a polishing pad. The polishing pad includes a polishing layer having a polishing surface, a backing layer with an aperture and a first portion that is permeable to liquid, and a sealant that penetrates a second portion of the backing layer adjacent to and surrounding the aperture such that the second portion is substantially impermeable to liquid. The aperture is positioned below a substantially fluid-impermeable element.
摘要翻译：抛光垫，抛光系统，制造抛光垫的方法和抛光垫的使用方法。抛光垫包括具有抛光表面的抛光层，具有孔的背衬层和可渗透液体的第一部分，以及密封剂，该密封剂穿透邻近并包围孔的背衬层的第二部分，使得第二部分对液体基本上是不可渗透的。孔被定位在基本上不透液体的元件之下。

97. 发明授权

US08892568B2 Building a library of spectra for optical monitoring 有权
标题翻译：建立光学监测光谱库
公开(公告)号：US08892568B2
公开(公告)日：2014-11-18
申请号：US13270137
申请日：2011-10-10
申请人： Jeffrey Drue David , Dominic J. Benvegnu , Xiaoyuan Hu
发明人： Jeffrey Drue David , Dominic J. Benvegnu , Xiaoyuan Hu
IPC分类号： G06F17/30 , H01L21/66 , B24B37/013 , B24B49/12 , H01L21/321
CPC分类号： H01L22/26 , B24B37/013 , B24B49/12 , H01L21/3212 , H01L22/12
摘要： A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.
摘要翻译：控制抛光的方法包括：存储具有多个参考光谱的库，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，对于光谱序列的每个测量光谱，使用除了平方差的和以产生最佳匹配参考光谱的序列之外的匹配技术，以及基于最佳匹配参考光谱的序列来确定抛光终点或抛光速率的调整中的至少一个。找到最佳匹配的参考光谱可以包括执行所测量的光谱与来自文库的多个参考光谱中的两个或更多个的互相关，并且选择与所测量的光谱具有最大相关性的参考光谱作为最佳匹配参考光谱。

98. 发明申请

US20120278028A1 GENERATING MODEL BASED SPECTRA LIBRARY FOR POLISHING 审中-公开
标题翻译：用于抛光的基于模型的光谱图
公开(公告)号：US20120278028A1
公开(公告)日：2012-11-01
申请号：US13096777
申请日：2011-04-28
申请人： Jeffrey Drue David , Dominic J. Benvegnu , Xiaoyuan Hu
发明人： Jeffrey Drue David , Dominic J. Benvegnu , Xiaoyuan Hu
IPC分类号： G06F15/00
CPC分类号： B24B37/013 , B24B37/042 , B24B49/12 , G01N21/278 , G01N21/55 , G01N2021/8411
摘要： A method of generating a library of reference spectra, includes receiving a first spectrum representing a reflectance of a first stack of layers on a substrate, the first stack including a first dielectric layer, receiving a second spectrum representing a reflectance of a second stack layer on the substrate, the second stack including the first dielectric layer and a second dielectric layer that is not in the first stack, receiving user input identifying a plurality of different contribution percentages for at least one of the first stack or the second stack on the substrate, and for each contribution percentage from the plurality of different contribution percentages, calculating a reference spectrum from the first spectrum, the second spectrum and the contribution percentage.
摘要翻译：一种产生参考光谱库的方法，包括接收表示衬底上第一层叠层的反射率的第一光谱，第一堆叠包括第一介电层，接收表示第二堆叠层的反射率的第二光谱所述基板，所述第二堆叠包括所述第一介电层和不在所述第一堆叠中的第二介电层，接收用于识别所述基板上的所述第一堆叠或所述第二堆叠中的至少一个的多个不同贡献百分比的用户输入，并且对于来自多个不同贡献百分比的每个贡献百分比，从第一光谱，第二光谱和贡献百分比计算参考光谱。

99. 发明授权

US07938714B2 Polishing pad assembly with glass or crystalline window 有权
标题翻译：带玻璃或结晶窗的抛光垫组件
公开(公告)号：US07938714B2
公开(公告)日：2011-05-10
申请号：US12572100
申请日：2009-10-01
申请人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
发明人： Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
IPC分类号： B24B49/12
CPC分类号： H01L22/26 , B24B37/013 , B24B37/205 , B24B49/08 , B24B49/12 , B24D7/14 , H01L21/30625 , H01L21/31053 , H01L21/31055 , H01L21/3212 , H01L21/67075 , H01L21/67092 , H01L21/67253
摘要： Methods and apparatus for providing a chemical mechanical polishing pad. The pad includes a polishing layer having a top surface and a bottom surface. The pad includes an aperture having a first opening in the top surface and a second opening in the bottom surface. The top surface is a polishing surface. The pad includes a window that includes a first portion made of soft plastic and a crystalline or glass like second portion. The window is transparent to white light. The window is situated in the aperture so that the first portion plugs the aperture and the second portion is on a bottom side of the first portion, wherein the first portion acts a slurry-tight barrier.
摘要翻译：用于提供化学机械抛光垫的方法和设备。衬垫包括具有顶表面和底表面的抛光层。垫包括在顶表面中具有第一开口和底表面中的第二开口的孔。顶面是抛光面。该垫包括一个窗，其包括由软塑料制成的第一部分和类似第二部分的晶体或玻璃。窗户对白光透明。窗口位于孔中，使得第一部分插入孔，并且第二部分在第一部分的底侧上，其中第一部分起浆料密封的屏障。

100. 发明申请

US20120276815A1 VARYING OPTICAL COEFFICIENTS TO GENERATE SPECTRA FOR POLISHING CONTROL 有权
标题翻译：用于生成抛光控制光谱的变化的光学系数
公开(公告)号：US20120276815A1
公开(公告)日：2012-11-01
申请号：US13096714
申请日：2011-04-28
申请人： Jeffrey Drue David , Dominic J. Benvegnu , Xiaoyuan Hu
发明人： Jeffrey Drue David , Dominic J. Benvegnu , Xiaoyuan Hu
IPC分类号： B24B49/12 , G06F17/10
CPC分类号： B24B37/013 , B24B37/042 , B24B49/12 , G01N21/84 , G01N2021/8416
摘要： A method of generating a library of reference spectra includes storing an optical model for a layer stack having at a plurality of layers, receiving user input identifying a set of one or more refractive index functions and a set of one or more extinction coefficient functions a first layer from the plurality of layers, wherein the set of one or more refractive index functions includes a plurality of different refractive index functions or the set of one or more extinction coefficient functions includes a plurality of different extinction coefficient functions, and for each combination of a refractive index function from the set of refractive index functions and an extinction coefficient function from the set of extinction coefficient functions, calculating a reference spectrum using the optical model based on the refractive index function, the extinction coefficient function and a first thickness of the first layer.
摘要翻译：生成参考光谱库的方法包括：存储具有多个层的层堆叠的光学模型，接收标识一组一个或多个折射率函数的用户输入和一组一个或多个消光系数函数，第一个层，其中所述一个或多个折射率函数的集合包括多个不同的折射率函数，或者一组或多个消光系数函数包括多个不同的消光系数函数，并且对于每个组合根据折射率函数的折射率函数和来自消光系数函数的消光系数函数，使用基于折射率函数的光学模型计算参考光谱，消光系数函数和第一层的第一厚度。

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