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91. 发明授权

US11555256B2 Aluminum nitride crystals having low urbach energy and high transparency to deep-ultraviolet wavelengths 有权
公开(公告)号：US11555256B2
公开(公告)日：2023-01-17
申请号：US16444147
申请日：2019-06-18
申请人： Robert T. Bondokov , James R. Grandusky , Jianfeng Chen , Shichao Wang , Toru Kimura , Thomas Miebach , Keisuke Yamaoka , Leo J. Schowalter
发明人： Robert T. Bondokov , James R. Grandusky , Jianfeng Chen , Shichao Wang , Toru Kimura , Thomas Miebach , Keisuke Yamaoka , Leo J. Schowalter
IPC分类号： C30B29/40 , H01L33/32 , C30B23/06 , C30B33/02 , C01B21/072
摘要： In various embodiments, single-crystal aluminum nitride boules and substrates have low Urbach energies and/or absorption coefficients at deep-ultraviolet wavelengths. The single-crystal aluminum nitride may function as a platform for the fabrication of light-emitting devices such as light-emitting diodes and lasers.

92. 发明授权

US09390995B2 Semiconductor device and method of manufacturing the same 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US09390995B2
公开(公告)日：2016-07-12
申请号：US14370803
申请日：2012-07-25
申请人： Kei Yamamoto , Kazuhiro Tada , Hideki Komori , Toru Kimura , Masaki Goto , Hiroyuki Yoshihara
发明人： Kei Yamamoto , Kazuhiro Tada , Hideki Komori , Toru Kimura , Masaki Goto , Hiroyuki Yoshihara
IPC分类号： H01L23/367 , H01L23/34 , B23P15/26 , H01L23/433 , H01L21/48 , H01L23/31 , H01L21/56 , H01L23/373 , H01L29/16 , H01L29/20
CPC分类号： H01L23/3672 , H01L21/4871 , H01L21/4882 , H01L21/56 , H01L21/565 , H01L23/3107 , H01L23/3735 , H01L23/4334 , H01L29/1602 , H01L29/1608 , H01L29/2003 , H01L2224/48091 , H01L2224/48137 , H01L2224/48247 , H01L2924/181 , H01L2924/00012 , H01L2924/00014
摘要： An object is to provide a fin integrated type semiconductor device and a method of manufacturing the same, which are provided with a simple structure and good heat dissipation characteristics. The semiconductor device includes: a base plate on which fins arranged in a standing condition are formed on a first main face; an insulating layer formed on a second main face of the base plate, the second main face being opposite to the first main face of the base plate; a circuit pattern fixed to the insulating layer; and a semiconductor element joined to the circuit pattern. The fins are formed with slits that pass through in the thickness direction of the fins.
摘要翻译：目的在于提供一种鳍状集成型半导体器件及其制造方法，其具有简单的结构和良好的散热特性。半导体器件包括：在第一主面上形成有以直立状态排列的翅片的基板; 绝缘层，形成在所述基板的第二主面上，所述第二主面与所述基板的所述第一主面相对; 固定到所述绝缘层的电路图案; 以及连接到电路图案的半导体元件。翅片形成有沿翅片的厚度方向穿过的狭缝。

93. 发明授权

US09182674B2 Immersion upper layer film forming composition and method of forming photoresist pattern 有权
标题翻译：浸渍上层成膜组合物和形成光致抗蚀剂图案的方法
公开(公告)号：US09182674B2
公开(公告)日：2015-11-10
申请号：US13550733
申请日：2012-07-17
申请人： Toru Kimura , Yukio Nishimura , Tomohiro Utaka , Hiroaki Nemoto , Atsushi Nakamura , Takashi Chiba , Hiroki Nakagawa
发明人： Toru Kimura , Yukio Nishimura , Tomohiro Utaka , Hiroaki Nemoto , Atsushi Nakamura , Takashi Chiba , Hiroki Nakagawa
IPC分类号： G03F7/11 , G03F7/20 , C08F214/18 , C08F216/10 , C08F220/18 , C08F220/24
CPC分类号： G03F7/2041 , C08F214/182 , C08F214/186 , C08F216/10 , C08F220/18 , C08F220/24 , G03F7/11 , C08F220/06 , C08F2222/1013
摘要： An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on a photoresist film in an immersion exposure process in which the photoresist film is irradiated through water provided between a lens and the photoresist film.
摘要翻译：浸渍上层膜组合物包括树脂和溶剂。树脂在照射期间形成水稳定膜并溶解在随后的显影剂中。溶剂含有具有6个或更少碳原子的一价醇。在浸渍曝光工艺中，应用该组合物在光致抗蚀剂膜上形成涂层，其中光致抗蚀剂膜通过设置在透镜和光致抗蚀剂膜之间的水进行照射。

94. 发明授权

US09134076B2 Radiator and method of manufacturing radiator 有权
标题翻译：散热器及散热器制造方法
公开(公告)号：US09134076B2
公开(公告)日：2015-09-15
申请号：US13510162
申请日：2009-11-17
申请人： Hiroyuki Yoshihara , Masaki Goto , Toru Kimura
发明人： Hiroyuki Yoshihara , Masaki Goto , Toru Kimura
IPC分类号： F28F3/02 , B23P11/00 , H01L21/48 , H01L23/367 , B21D53/02 , H01L23/00
CPC分类号： F28F3/02 , B23P11/00 , B23P2700/10 , H01L21/4878 , H01L21/4882 , H01L23/3672 , H01L24/48 , H01L2224/451 , H01L2224/48091 , H01L2224/48137 , H01L2224/48247 , H01L2224/73265 , H01L2924/00014 , H01L2924/1305 , H01L2924/13055 , H01L2924/13091 , H01L2924/181 , Y10T29/4935 , H01L2924/00 , H01L2924/00012 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
摘要： A radiator including: a plurality of radiation fins; and a radiation fin support base having a heater element mounted to one surface thereof and a plurality of parallel fin grooves to which the radiation fins are installed and a projection configured to fix the radiation fin formed to the other surface thereof, wherein a top of the projection pushes one side surface of the radiation fin to push the other side surface of the radiation fin toward a side surface of the fin groove, and wherein the fin groove and the projection are each divided in a plurality of pieces in a longitudinal direction of the fin groove, and each of the divided fin grooves and each of the divided projections have a same length in the longitudinal direction of the fin groove and are paired with each other.
摘要翻译：一种散热器，包括：多个散热片; 以及辐射翅片支撑基座，其具有安装到其一个表面的加热器元件和安装有辐射翅片的多个平行翅片槽，以及突出部，其将形成的辐射翅片固定到其另一个表面上，其中，突起推动散热片的一个侧表面，以将散热片的另一侧表面推向散热片槽的侧表面，并且其中散热片槽和突起分别沿着翅片槽，并且分割的翅片槽和每个分割的突起在翅片槽的纵向方向上具有相同的长度，并且彼此成对配合。

95. 发明申请

US20120282553A1 IMMERSION UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN 审中-公开
标题翻译：上层膜成膜组合物及形成光电子图案的方法
公开(公告)号：US20120282553A1
公开(公告)日：2012-11-08
申请号：US13550733
申请日：2012-07-17
申请人： Toru KIMURA , Yukio NISHIMURA , Tomohiro UTAKA , Hiroaki NEMOTO , Atsushi NAKAMURA , Takashi CHIBA , Hiroki NAKAGAWA
发明人： Toru KIMURA , Yukio NISHIMURA , Tomohiro UTAKA , Hiroaki NEMOTO , Atsushi NAKAMURA , Takashi CHIBA , Hiroki NAKAGAWA
IPC分类号： C09D133/16 , C09D133/06 , C09D141/00 , G03F7/20
CPC分类号： G03F7/2041 , C08F214/182 , C08F214/186 , C08F216/10 , C08F220/18 , C08F220/24 , G03F7/11 , C08F220/06 , C08F2222/1013
摘要： An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on a photoresist film in an immersion exposure process in which the photoresist film is irradiated through water provided between a lens and the photoresist film.
摘要翻译：浸渍上层膜组合物包括树脂和溶剂。树脂在照射期间形成水稳定膜并溶解在随后的显影剂中。溶剂含有具有6个或更少碳原子的一价醇。在浸渍曝光工艺中，应用该组合物在光致抗蚀剂膜上形成涂层，其中光致抗蚀剂膜通过设置在透镜和光致抗蚀剂膜之间的水进行照射。

96. 发明申请

US20120227952A1 RADIATOR AND METHOD OF MANUFACTURING RADIATOR 有权
标题翻译：散热器和制造辐射器的方法
公开(公告)号：US20120227952A1
公开(公告)日：2012-09-13
申请号：US13510162
申请日：2009-11-17
申请人： Hiroyuki Yoshihara , Masaki Goto , Toru Kimura
发明人： Hiroyuki Yoshihara , Masaki Goto , Toru Kimura
IPC分类号： F28F7/00 , B21D53/02
CPC分类号： F28F3/02 , B23P11/00 , B23P2700/10 , H01L21/4878 , H01L21/4882 , H01L23/3672 , H01L24/48 , H01L2224/451 , H01L2224/48091 , H01L2224/48137 , H01L2224/48247 , H01L2224/73265 , H01L2924/00014 , H01L2924/1305 , H01L2924/13055 , H01L2924/13091 , H01L2924/181 , Y10T29/4935 , H01L2924/00 , H01L2924/00012 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
摘要： A radiator including: a plurality of radiation fins; and a radiation fin support base having a heater element mounted to one surface thereof and a plurality of parallel fin grooves to which the radiation fins are installed and a projection configured to fix the radiation fin formed to the other surface thereof, wherein a top of the projection pushes one side surface of the radiation fin to push the other side surface of the radiation fin toward a side surface of the fin groove, and wherein the fin groove and the projection are each divided in a plurality of pieces in a longitudinal direction of the fin groove, and each of the divided fin grooves and each of the divided projections have a same length in the longitudinal direction of the fin groove and are paired with each other.
摘要翻译：一种散热器，包括：多个散热片; 以及辐射翅片支撑基座，其具有安装到其一个表面的加热器元件和安装有辐射翅片的多个平行翅片槽，以及突出部，其将形成的辐射翅片固定到其另一个表面上，其中，突起推动散热片的一个侧表面，以将散热片的另一侧表面推向散热片槽的侧表面，并且其中散热片槽和突起分别沿着翅片槽，并且分割的翅片槽和每个分割的突起在翅片槽的纵向方向上具有相同的长度，并且彼此成对配合。

97. 发明授权

US08226802B2 Thin film forming apparatus, film thickness measuring method and film thickness sensor 有权
标题翻译：薄膜成膜装置，薄膜厚度测定方法及薄膜厚度传感器
公开(公告)号：US08226802B2
公开(公告)日：2012-07-24
申请号：US12725658
申请日：2010-03-17
申请人： Masato Fukao , Toru Kimura
发明人： Masato Fukao , Toru Kimura
IPC分类号： C23C14/00 , C23C14/32
CPC分类号： C23C14/545 , C23C14/546 , G01B17/02
摘要： A technology which is capable of an accurate measurement of the film thickness even if an exfoliation occurs is provided. A difference frequency Δf0 is calculated from a resonance frequency f0 of a film thickness sensor at a current time a0 and a resonance frequency f1 at an immediate past time a1, and whether the exfoliation has occurred or not is detected from its sign and a comparison result relative to a reference value. When the exfoliation has occurred, a corrected film thickness value T′ is obtained by adding the thickness Δt0 of the exfoliation film to an increased film thickness value T which is determined from a resonance frequency fx measured at a future time ax to be converted to the thickness of a film on a film forming object, and whether the formation of the film should be terminated is judged in comparison to an aimed value. Thus, even if the exfoliation occurs in the film thickness sensor, the film thickness value of the thin film on the surface of the film forming object can be accurately obtained.
摘要翻译：提供即使发生剥离也能够精确测量膜厚度的技术。从当前时间a0的膜厚度传感器的谐振频率f0和紧接着的时刻a1的谐振频率f1计算差频率Dgr; f0，从其符号检测出剥离是否发生，比较结果相对于参考值。当发生剥离时，通过将剥离膜的厚度＆gt; t0添加到从将来的时间ax测量的共振频率fx确定的增加的膜厚度值T来获得校正的膜厚度值T'以进行转换相对于成膜物体上的膜的厚度，以及膜的形成是否应该终止，与目标值相比较。因此，即使在膜厚传感器中发生剥离，也能够精确地得到成膜体表面的薄膜的膜厚值。

98. 发明申请

US20100084123A1 COOLING APPARATUS, ELECTRONIC APPARATUS, AND BLOWER APPARATUS 审中-公开
标题翻译：冷却装置，电子装置和鼓风装置
公开(公告)号：US20100084123A1
公开(公告)日：2010-04-08
申请号：US12567274
申请日：2009-09-25
申请人： Yuji Shishido , Takashi Mochida , Toru Kimura , Tadaomi Fujieda
发明人： Yuji Shishido , Takashi Mochida , Toru Kimura , Tadaomi Fujieda
IPC分类号： F28F27/00 , F28D15/00 , F28F13/12
CPC分类号： F04D29/582 , F04D27/002 , G06F1/203
摘要： Disclosed is a cooling apparatus including a heat sink, a blower mechanism, an opening member, and a movement mechanism. The blower mechanism has a blower opening that has a predetermined area and is opposed to the heat sink. The opening member has a first opening that has an area smaller than the area of the blower opening. The movement mechanism moves the opening member so that switching between a first state and a second state is performed. The first state is a state in which the first opening is disposed between the blower opening and the heat sink, and the second state is a state in which the first opening is removed from between the blower opening and the heat sink.
摘要翻译：公开了一种冷却装置，包括散热器，鼓风机构，开口部件和移动机构。鼓风机构具有鼓风机开口，该鼓风机开口具有预定区域并与散热器相对。打开构件具有第一开口，该第一开口的面积小于鼓风机开口的面积。移动机构移动开口构件，从而执行第一状态和第二状态之间的切换。第一状态是其中第一开口设置在鼓风机开口和散热器之间的状态，第二状态是第一开口从鼓风机开口和散热器之间移除的状态。

99. 发明申请

US20090114372A1 HEAT SINK 审中-公开
标题翻译：散热器
公开(公告)号：US20090114372A1
公开(公告)日：2009-05-07
申请号：US11994501
申请日：2005-09-13
申请人： Shigetoshi Ippoushi , Tetsuro Ogushi , Seiji Haga , Toru Kimura , Akira Yamada , Hiroshi Yamabuchi , Akihiro Murahashi , Hideo Okayama , Nobuaki Uehara
发明人： Shigetoshi Ippoushi , Tetsuro Ogushi , Seiji Haga , Toru Kimura , Akira Yamada , Hiroshi Yamabuchi , Akihiro Murahashi , Hideo Okayama , Nobuaki Uehara
IPC分类号： F28D15/00
CPC分类号： F28F3/12 , F28F3/022 , F28F13/12 , H01L23/467 , H01L23/473 , H01L2924/0002 , H01L2924/00
摘要： A heat sink includes a heat-transfer container incorporating a flow path through which a cooling fluid flows, for cooling a heating element in contact with the heat-transfer container The flow path includes a first cross-sectional portion that becomes narrower as the distance between a given point in the flow path and a side of the heat-transfer container which makes contact with the heating element becomes longer in a direction perpendicular to the direction in which the cooling fluid flows, and a second cross-sectional portion that is approximately constant in the direction perpendicular to the direction in which the cooling fluid flows. The first cross-sectional portion and the second cross-sectional portion alternately continue in the direction in which the cooling fluid flows causing a three-dimensional flow so the heat-transfer properties are enhanced with a simplified structure.
摘要翻译：散热器包括一个传热容器，该传热容器包括冷却流体流过的流动通道，用于冷却与传热容器接触的加热元件。流路包括第一横截面部分，该第一横截面部分随着与该加热元件接触的传热容器中的给定点和与传热容器接触的一侧在与冷却流体流动方向垂直的方向上变长，第二横截面部分大致恒定在垂直于冷却流体流动方向的方向上。第一横截面部分和第二横截面部分在冷却流体流动的方向上交替地继续，导致三维流动，从而以简化的结构增强了传热性能。

100. 发明申请

US20080310284A1 DIFFRACTIVE OPTICAL ELEMENT AND OPTICAL PICKUP APPARATUS 审中-公开
标题翻译：衍射光学元件和光学拾取器
公开(公告)号：US20080310284A1
公开(公告)日：2008-12-18
申请号：US12179751
申请日：2008-07-25
申请人： Kyu TAKADA , Junji Hashimura , Yuichiro Ori , Toru Kimura
发明人： Kyu TAKADA , Junji Hashimura , Yuichiro Ori , Toru Kimura
IPC分类号： G11B7/00
CPC分类号： G11B7/1353 , G02B3/08 , G02B13/003 , G02B13/0045 , G02B13/0055 , G02B13/0065 , G11B7/1367 , G11B7/13922 , G11B7/13925 , G11B2007/0006
摘要： An optical pickup apparatus includes a diffractive optical element, and an objective lens that focuses a light beam of a first wavelength λ1, a light beam of a second wavelength λ2 and a light beam of a third wavelength λ3 on a first recording medium, a second recording medium, and a third recording medium, respectively, the wavelengths λ1, λ2, and λ3 being different from each other. The diffractive optical element includes a first diffractive surface that neither diffracts the light beam of the first wavelength λ1 nor the light beam of the third wavelength λ3 but diffracts the light beam of the second wavelength λ2, and a second diffractive surface that neither diffracts the light beam of the first wavelength λ1 nor the light beam of the second wavelength λ2 but diffracts the light beam of the third wavelength λ3, and each of the first and second diffractive surfaces satisfies the following condition inequality: Λ/λ≧8 wherein Λ represents the minimum pitch in the case that the width which generates a phase difference of one wavelength when the closest wavefronts resulting from adjacent steps in each of the diffractive surfaces are linked with each other is defined as one pitch, and λ represents the wavelength of the diffracted light.
摘要翻译：光拾取装置包括衍射光学元件和将第一波长λ1的光束，第二波长λ2的光束和第三波长λ3的光束的光束聚焦在第一记录介质上的物镜，第二记录介质和第三记录介质，波长λ1，λ2和λ3彼此不同。衍射光学元件包括：第一衍射面，其既不衍射第一波长λ1的光束也不衍射第三波长λ3的光束，但衍射第二波长λ2的光束;以及第二衍射面，其不衍射光第一波长λ1的光束和第二波长λ2的光束，但是衍射第三波长λ3的光束，并且第一和第二衍射面中的每一个满足以下条件不等式：<βin-line-formula description = “In-line Formulas”end =“lead”？>λ/λ> = 8 <？in-line-formula description =“In-line Formulas”end =“tail”？>其中Lambda表示该情况下的最小间距当由每个衍射表面中的相邻步骤产生的最接近的波前相互连接时产生一个波长的相位差的宽度被定义为一个间距，并且λ表示衍射光的波长。

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