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    • 1. 发明申请
    • Magnetic device having multilayered free ferromagnetic layer
    • 具有多层自由铁磁层的磁性器件
    • US20070063237A1
    • 2007-03-22
    • US11498294
    • 2006-08-01
    • Yiming HuaiZhitao DiaoEugene Chen
    • Yiming HuaiZhitao DiaoEugene Chen
    • H01L29/94
    • H01L43/08B82Y25/00G11B5/3983G11C11/161G11C11/1659H01F10/3254H01F10/3259H01F10/3263H01F10/3268H01L27/228H01L43/10
    • Magnetic multilayer structures, such as magnetic or magnetoresistive tunnel junctions (MTJs) and spin valves, having a magnetic biasing layer formed next to and magnetically coupled to the free ferromagnetic layer to achieve a desired stability against fluctuations caused by, e.g., thermal fluctuations and astray fields. Stable MTJ cells with low aspect ratios can be fabricated using CMOS processing for, e.g., high-density MRAM memory devices and other devices, using the magnetic biasing layer. Such multilayer structures can be programmed using spin transfer induced switching by driving a write current perpendicular to the layers. Each free ferromagnetic layer can include two or more layers and may be a multilayered free ferromagnetic stack that includes first and second ferromagnetic layers and a non-magnetic spacer between the first and second ferromagnetic layers.
    • 诸如磁性或磁阻型隧道结(MTJ)和自旋阀的磁性多层结构具有磁性偏置层,该磁性偏置层形成在自由铁磁层的旁边并磁耦合到自由铁磁层,以实现针对由例如热波动和误差引起的波动的期望的稳定性 领域。 具有低纵横比的稳定的MTJ单元可以使用CMOS处理制造,例如使用磁偏置层的例如高密度MRAM存储器件和其他器件。 可以通过驱动垂直于层的写入电流,使用自旋转移感应开关对这种多层结构进行编程。 每个自由铁磁层可以包括两层或更多层,并且可以是多层自由铁磁性堆叠,其包括第一和第二铁磁层和第一和第二铁磁层之间的非磁性间隔物。
    • 8. 发明授权
    • Method and system for providing a magnetic memory structure utilizing spin transfer
    • 提供利用自旋转移的磁记忆体结构的方法和系统
    • US07623369B2
    • 2009-11-24
    • US12030541
    • 2008-02-13
    • Xiao LuoEugene ChenLien-Chang WangYiming Huai
    • Xiao LuoEugene ChenLien-Chang WangYiming Huai
    • G11C16/04
    • G11C11/1675G11C8/12G11C8/14G11C11/1657G11C11/1659G11C11/1673
    • A method and system for providing a magnetic memory is described. The method and system include providing magnetic memory cells, local and global word lines, bit lines, and source lines. Each magnetic memory cell includes a magnetic element and a selection device connected with the magnetic element. The magnetic element is programed by first and second write currents driven through the magnetic element in first and second directions. The local word lines are connected with the selection device of and have a first resistivity. Each global word line corresponds to a portion of the local word lines and has a resistivity lower than the first resistivity. The bit lines are connected with the magnetic element. The source lines are connected with the selection device. Each source line corresponds to a more than one of the magnetic memory cells and carries the first and second write currents.
    • 描述了一种用于提供磁存储器的方法和系统。 该方法和系统包括提供磁存储器单元,局部和全局字线,位线和源极线。 每个磁存储单元包括磁性元件和与该磁性元件连接的选择装置。 磁性元件由在第一和第二方向通过磁性元件驱动的第一和第二写入电流编程。 局部字线与第一电阻率的选择装置连接。 每个全局字线对应于局部字线的一部分,并具有低于第一电阻率的电阻率。 位线与磁性元件连接。 源极线与选择器件连接。 每个源极线对应于多个磁存储器单元并且承载第一和第二写入电流。
    • 9. 发明申请
    • METHOD FOR MANUFACTURING MAGNETIC STORAGE DEVICE AND MAGNETIC STORAGE DEVICE
    • 用于制造磁存储器件和磁存储器件的方法
    • US20100264501A1
    • 2010-10-21
    • US12528854
    • 2008-02-25
    • Haruo FurutaShuichi UenoRyoji MatsudaTatsuta FukumuraTakeharu KuroiwaLien-Chang WangEugene ChenYiming Huai
    • Haruo FurutaShuichi UenoRyoji MatsudaTatsuta FukumuraTakeharu KuroiwaLien-Chang WangEugene ChenYiming Huai
    • H01L29/82H01L21/02
    • H01L43/12B82Y10/00H01L27/228
    • Disclosed is a method for manufacturing a magnetic storage device comprising a TMR element, which comprises a step for forming an insulting film on an interlayer insulating film provided with a wiring layer, an opening formation step for forming an opening in the insulating film so that the wiring layer is exposed therefrom, a metal layer formation step for forming a metal layer on the insulating layer so that the opening is filled therewith, a CMP step for polishing and removing the metal layer on the insulating layer by a CMP method and forming the metal layer remaining in the opening into a lower electrode, and a step for forming a TMR element on the lower electrode. Also disclosed is a magnetic storage device comprising an interlayer insulating film provided with a wiring layer, an insulating film formed on the interlayer insulating film, an opening formed in the insulating film so that the wiring layer is exposed therefrom, a barrier metal layer provided so as to cover the inner surface of the opening, a lower electrode formed on the barrier metal so as to fill the opening, and a TMR element formed on the lower electrode.
    • 公开了一种制造包括TMR元件的磁存储装置的方法,该方法包括在具有布线层的层间绝缘膜上形成绝缘膜的步骤,用于在绝缘膜上形成开口的开口形成步骤, 布线层暴露于其中,金属层形成步骤用于在绝缘层上形成金属层以使其开口被填充; CMP步骤,用于通过CMP方法在绝缘层上抛光和去除金属层,并形成金属 剩余在开口中的层形成下电极,以及在下电极上形成TMR元件的步骤。 还公开了一种磁存储装置,其包括设置有布线层的层间绝缘膜,形成在层间绝缘膜上的绝缘膜,形成在绝缘膜中的开口,使得布线层暴露于其中,阻挡金属层设置为 为了覆盖开口的内表面,形成在阻挡金属上以便填充开口的下电极和形成在下电极上的TMR元件。