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1. 发明授权

US6063549A Wet-chemical, developable, etch-stable photoresist for UV radiation with a wavelength below 200 nm 失效
标题翻译：湿化学，可显影，蚀刻稳定的光致抗蚀剂，其波长低于200nm
公开(公告)号：US6063549A
公开(公告)日：2000-05-16
申请号：US86006
申请日：1998-05-27
申请人： Ulrich Schadeli , Manfred Hofmann , Norbert Muenzel , Arnold Grubenmann
发明人： Ulrich Schadeli , Manfred Hofmann , Norbert Muenzel , Arnold Grubenmann
IPC分类号： G03F7/004 , G03F7/023 , G03F7/029 , G03F7/033 , G03F7/038 , G03F7/039 , G03F7/40 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/40
摘要： Photoresist compositions are described, which are sufficiently transparent in the solvent-free state for radiation of a wavelength of approximately 193 nm, and which contain nonaromatic chemical groups, which can be converted into groups with aromatic structural elements (latent aromatic groups) under process conditions, for which an image structure comprised of the resist material is not disrupted. A preferred component with latent aromatic groups is bicyclo[3.2.2]nona-6,8-dien-3-one. Resist coatings, which are produced with these compositions, show a stability in plasma etching, which is comparable with the stability of conventional resists based on phenolic resins.
摘要翻译：描述了光致抗蚀剂组合物，其在无溶剂状态下对于约193nm的波长的辐射是足够透明的，并且其含有非芳族化学基团，其可以在加工条件下转化成具有芳族结构元素（潜芳族基团）的基团由抗蚀剂材料构成的图像结构不被破坏。具有潜芳族基团的优选组分是双环[3.2.2]壬-6,8-二烯-3-酮。用这些组合物生产的抗蚀涂层表现出等离子体蚀刻中的稳定性，其与基于酚醛树脂的常规抗蚀剂的稳定性相当。

2. 发明授权

US5210003A Acid labile dissolution inhibitors and positive- and negative-acting photosensitive composition based thereon 失效
标题翻译：酸性溶解抑制剂和基于其的阳性和阴性作用的感光性组合物
公开(公告)号：US5210003A
公开(公告)日：1993-05-11
申请号：US756631
申请日：1991-09-09
申请人： Ulrich Schadeli
发明人： Ulrich Schadeli
IPC分类号： C07D309/10 , G03C1/73 , G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： C07D309/10 , G03F7/0045 , Y10S430/106
摘要： Non-polymeric compounds which contain at least one aromatic ring system carrying one or more one or more tetrahydropyranyloxy substituents of formula I ##STR1## wherein R.sub.1 is hydrogen, halogen, alkyl, cycloalkyl, aryl, alkoxy or aryloxy,R.sub.2 is hydrogen, alkyl, cycloalkyl or aryl,R.sub.3 is a saturated or unsaturated hydrocarbon radical,R.sub.4 and R.sub.5 are each independently of the other hydrogen, halogen, alkyl, alkoxy or aryloxy, andX is a direct single bond or a methylene or ethylene bridge.These compounds are especially suitable for the preparation of photoresist compositions which can be used both for the production of positive as well as negative images. The photoresists are preferably used for deep-UV microlithography.
摘要翻译：含有至少一个带有一个或多个一个或多个式I的四氢吡喃氧基取代基的芳族环系的非聚合化合物其中R1是氢，卤素，烷基，环烷基，芳基，烷氧基或芳氧基，R2是氢烷基，环烷基或芳基，R 3为饱和或不饱和烃基，R 4和R 5各自独立地为氢，卤素，烷基，烷氧基或芳氧基，X为直接单键或亚甲基或乙烯桥。这些化合物特别适用于光刻胶组合物的制备，该组合物既可用于生产正面和负面图像。光致抗蚀剂优选用于深UV微光刻。

3. 发明授权

US5380881A Acid labile solution inhibitors and positive- and negative-acting photosensitive composition based thereon 失效
标题翻译：酸不稳定溶液抑制剂和基于其的正性和负性感光性组合物
公开(公告)号：US5380881A
公开(公告)日：1995-01-10
申请号：US7420
申请日：1993-01-22
申请人： Ulrich Schadeli
发明人： Ulrich Schadeli
IPC分类号： C07D309/10 , G03C1/73 , G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： C07D309/10 , G03F7/0045 , Y10S430/106
摘要： Non-polymeric compounds which contain at least one aromatic ring system carrying one or more one or more tetrahydropyranyloxy substituents of formula I ##STR1## wherein R.sub.1 is hydrogen, halogen, alkyl, cycloalkyl, aryl, alkoxy or aryloxy,R.sub.2 is hydrogen, alkyl, cycloalkyl or aryl,R.sub.3 is a saturated or unsaturated hydrocarbon radical,R.sub.4 and R.sub.5 are each independently of the other hydrogen, halogen, alkyl, alkoxy or aryloxy, andX is a direct single bond or a methylene or ethylene bridge.These compounds are especially suitable for the preparation of photoresist compositions which can be used both for the production of positive as well as negative images. The photoresists are preferably used for deep-UV microlithography.
摘要翻译：含有至少一个带有一个或多个一个或多个式I的四氢吡喃氧基取代基的芳族环系的非聚合化合物其中R1是氢，卤素，烷基，环烷基，芳基，烷氧基或芳氧基，R2是氢烷基，环烷基或芳基，R 3为饱和或不饱和烃基，R 4和R 5各自独立地为氢，卤素，烷基，烷氧基或芳氧基，X为直接单键或亚甲基或乙烯桥。这些化合物特别适用于光刻胶组合物的制备，该组合物既可用于生产正面和负面图像。光致抗蚀剂优选用于深UV微光刻。

4. 发明授权

US5369200A Positive photoresist having improved processing properties 失效
标题翻译：正光致抗蚀剂具有改进的加工性能
公开(公告)号：US5369200A
公开(公告)日：1994-11-29
申请号：US160818
申请日：1993-12-03
申请人： Ulrich Schadeli , Norbert Munzel
发明人： Ulrich Schadeli , Norbert Munzel
IPC分类号： C08F12/22 , C08F12/00 , C08F22/36 , C08F22/40 , C08F222/40 , C08K5/20 , C08L25/00 , C08L25/18 , C08L33/04 , C08L33/24 , C08L35/00 , G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , C08F222/40
摘要： Polymers having a molecular weight (weight average) M.sub.w from 10.sup.3 to 10.sup.6, comprising recurring structural units of the formulae (I), (IIa) and (IIb) ##STR1## in which R.sub.1 is hydrogen or methyl, Y is a direct bond or a divalent radical of the formula (III) ##STR2## in which Z is a C.sub.1 -C.sub.6 alkylene group bound to the phenyl nucleus,OR.sub.2 is an acid-cleavable radical,in which R.sub.2 is C.sub.4 -C.sub.10 tert-alkyl, allyl, cyclohex-2-enyl, C.sub.6 -C.sub.14 aryl or C.sub.7 -C.sub.16 aralkyl which are unsubstituted or mono- or poly-substituted by C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms, trialkylsilyl or a group of the formulae (IV)-(VII) ##STR3## in which R.sub.8 is C.sub.1 -C.sub.6 alkyl, or C.sub.6 -C.sub.14 aryl or C.sub.7 -C.sub.16 aralkyl which are unsubstituted or mono- or poly-substituted by C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms,R.sub.3 and R.sub.4 independently of one another are hydrogen, C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms,R.sub.5 and R.sub.6 independently of one another are hydrogen or methyl,X is C.sub.1 -C.sub.6 alkylene and R.sub.7 is C.sub.1 -C.sub.6 alkyl, or C.sub.6 -C.sub.14 aryl or C.sub.7 -C.sub.16 aralkyl which are unsubstituted or mono- or poly-substituted by C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms, or is --CO--R.sub.8 in which R.sub.8 is as defined in formula (IV), are suitable for use in DUV positive photoresists which show greatly reduced delay time effects and are distinguished by a high thermal stability and high resolution capacity.
摘要翻译：具有式（I），（IIa）和（IIb）的重复结构单元的分子量（重均分子量）Mw为103〜106的聚合物（IIa）（IIb）（IIb））其中R 1是氢或甲基，Y是直接键或式（III）的二价基团其中Z是与苯基结合的C 1 -C 6亚烷基，OR 2是酸 - C 1 -C 6烷基，C 1 -C 6烷氧基或卤素取代的未取代或单取代或多取代的C 1 -C 10烷基，烯丙基，环己-2-烯基，C 6 -C 14芳基或C 7 -C 16芳烷基（VI）其中R 8为C 1 -C 6烷基或C 6 -C 6烷基的化合物（Ⅶ）（Ⅶ） C1-C6烷基，C1-C6烷氧基或卤素原子未取代或单取代或多取代的-C14芳基或C7-C16芳烷基，R3和R4彼此独立地是氢，C1-C6烷基，C1-C6烷氧基或卤素原子，R5和R6独立地表示另一个是氢或甲基，X是C1-C6亚烷基，R7是C1-C6烷基或C6-C14芳基或C7-C16芳烷基，它们是未取代的或被C1-C6烷基，C1-C6烷氧基或卤素单取代或多取代或者是其中R8如式（IV）中所定义的-CO-R8，适用于DUV正性光致抗蚀剂，其显示出大大降低的延迟时间效应，并被高热稳定性和高分辨能力区分。

5. 发明授权

US6010567A Black-pigmented structured high molecular weight material 失效
公开(公告)号：US6010567A
公开(公告)日：2000-01-04
申请号：US57090
申请日：1998-04-08
申请人： Ulrich Schadeli , Eric Tinguely , Veronique Hall-Goulle , Gerardus de Keyzer
发明人： Ulrich Schadeli , Eric Tinguely , Veronique Hall-Goulle , Gerardus de Keyzer
IPC分类号： G03F7/004 , B41M5/00 , B41M5/385 , B41M5/388 , B41M5/39 , C08K5/00 , C08L101/00 , C09B29/33 , C09B33/153 , C09B35/035 , C09B55/00 , C09B67/20 , C09B67/22 , C09B67/28 , C09D11/00 , C09K9/02 , G02B5/22 , G03F1/56 , G03F7/00 , G03F7/105 , C09B67/50
CPC分类号： G03F1/56 , C09B29/338 , C09B33/153 , C09B35/035 , C09B67/0033 , C09B67/0077 , G03F7/0007 , G03F7/105 , G02B5/22
摘要： This invention relates to a black-pigmented high molecular weight organic material which is structured from a radiation-sensitive precursor by irradiation, the pigmentation of which material consists of coloured organic pigments, at least one of which is in latent form before irradiation. This material is preferably used as a thin layer which is built up in the form of patterns on a transparent substrate and which can be used, for example, as black matrix for optical colour filters. This invention also relates to a process for the preparation of this material as well as to novel soluble derivatives of yellow disazo condensation pigments which can be used in this process.

6. 发明授权

US5879855A Compositions for making structured color images and application thereof 失效
公开(公告)号：US5879855A
公开(公告)日：1999-03-09
申请号：US341721
申请日：1994-11-18
申请人： Ulrich Schadeli , John S. Zambounis , Abul Iqbal , Zhimin Hao
发明人： Ulrich Schadeli , John S. Zambounis , Abul Iqbal , Zhimin Hao
IPC分类号： B41M3/00 , B41M5/26 , B41M5/30 , B41M5/382 , B41M5/46 , B41M5/52 , C09B67/28 , G02B5/20 , G03F7/00 , G03F7/004 , G03F7/033 , G03F7/038 , G03F7/039 , G03F7/105 , G03C5/00
CPC分类号： G03F7/105 , B41M3/003 , B41M5/265 , B41M5/5254 , B41M5/5272 , C09B67/0077 , C09B68/443 , C09B68/46 , G03F7/0007 , G03F7/0045 , B41M5/26 , B41M5/30 , B41M5/382 , Y10S430/145 , Y10S430/146 , Y10S430/156 , Y10S430/163 , Y10S430/165
摘要： Compositions for making structured color images comprising (a) a soluble pigment precursor which can be transformed to an insoluble pigment by means of chemical, thermal, photolytic or radiation-induced method, and (b) a binder polymer or prepolymer, or a positive or negative resist-type resin which can be structured by crosslinking, polymerization or depolymerization by applying heat or electromagnetic irradiation. The compositions can be applied to optical and thermal recording, printing, and the production of color filters for Liquid Crystal Displays, with high accuracy, high transparency and high stability.

7. 发明授权

US6040108A Compositions for making structured color images and application thereof 有权
标题翻译：用于制作结构化彩色图像的组合及其应用
公开(公告)号：US6040108A
公开(公告)日：2000-03-21
申请号：US204190
申请日：1998-12-03
申请人： Ulrich Schadeli , John S. Zambounis , Abul Iqbal , Zhimin Hao , Henri Dubas
发明人： Ulrich Schadeli , John S. Zambounis , Abul Iqbal , Zhimin Hao , Henri Dubas
IPC分类号： B41M3/00 , B41M5/26 , B41M5/30 , B41M5/382 , B41M5/46 , B41M5/52 , C09B67/28 , G02B5/20 , G03F7/00 , G03F7/004 , G03F7/033 , G03F7/038 , G03F7/039 , G03F7/105 , G03C8/02 , B05D3/06 , B41J2/315 , G03C5/16
CPC分类号： G03F7/105 , B41M3/003 , B41M5/265 , B41M5/5254 , B41M5/5272 , C09B67/0077 , C09B68/443 , C09B68/46 , G03F7/0007 , G03F7/0045 , B41M5/26 , B41M5/30 , B41M5/382 , Y10S430/145 , Y10S430/146 , Y10S430/156 , Y10S430/163 , Y10S430/165
摘要： Compositions for making structured color images comprising(a) a soluble pigment precursor which can be transformed to an insoluble pigment by means of chemical, thermal, photolytic or radiation-induced method, and(b) a binder polymer or prepolymer, or a positive or negative resist-type resin which can be structured by crosslinking, polymerization or depolymerization by applying heat or electromagnetic irradiation.The compositions can be applied to optical and thermal recording, printing, and the production of color filters for Liquid Crystal Displays, with high accuracy, high transparency and high stability.
摘要翻译：用于制备结构化彩色图像的组合物包括（a）通过化学，热，光解或辐射诱导的方法可转变成不溶性颜料的可溶性颜料前体，和（b）粘合剂聚合物或预聚物，或阳性或可以通过加热或电磁照射进行交联，聚合或解聚而构成的负型抗蚀剂型树脂。该组合物可用于液晶显示器的光学和热记录，印刷和彩色滤光片的生产，具有高精度，高透明度和高稳定性。

8. 发明授权

US5274060A Copolymers crosslinkable by acid catalysis 失效
标题翻译：通过酸催化可交联的共聚物
公开(公告)号：US5274060A
公开(公告)日：1993-12-28
申请号：US843798
申请日：1992-02-27
申请人： Ulrich Schadeli
发明人： Ulrich Schadeli
IPC分类号： C08F8/00 , C08F12/00 , C08F20/52 , C08F22/40 , C08F212/14 , G03F7/038 , H01L21/027 , H05K3/06 , C08F224/00 , C08F216/38
CPC分类号： G03F7/038 , C08F212/14
摘要： Copolymers having a molecular weight (Mw) of from 10.sup.3 to 10.sup.6, measured by gel-permeation chromatography, that are crosslinkable by acid catalysis and that consist ofa) 100-80 mol. % of structural repeating units of formulae I and II ##STR1## in a ratio of from 1:1 to 1:9 and b) 0-20 mol. % of structural repeating units of formula III ##STR2## wherein X and X' each independently of the other are ##STR3## R is hydrogen or a protecting group that can be removed by the action of acids, the radicals R.sub.1 each independently of the other are C.sub.1 -C.sub.5 alkyl, phenyl or naphthyl or together are 1,2-phenylene or --[C(R.sub.3)(R.sub.4)].sub.x -- wherein R.sub.3 and/or R.sub.4 =hydrogen or methyl and x is from 2 to 5, the radicals R.sub.2 each independently of the other are hydrogen, C.sub.1 -C.sub.5 alkyl or C.sub.1 -C.sub.5 alkoxy, R.sub.5 and R.sub.7 are each hydrogen, R.sub.6 is hydrogen, halogen or methyl and R.sub.8 is hydrogen, halogen, methyl, --CH.sub.2 halogen, --CH.sub.2 CN, --CN, --COOH, --CONH.sub.2, --O--C.sub.1 -C.sub.5 alkyl, --O--CO--C.sub.1 -C.sub.5 alkyl, --COO--C.sub.1 -C.sub.5 alkyl, --COO-phenyl or phenyl, or R.sub.5 and R.sub.6 are each hydrogen and R.sub.7 and R.sub.8 together are --CO--O--CO-- or each independently of the other are --COOH or --COO--C.sub.1 -C.sub.5 alkyl, are described.The said copolymers are suitable, together with compounds that form an acid under actinic radiation, for the production of negative resist systems.
摘要翻译：通过凝胶渗透色谱法测定的分子量（Mw）为103至106的共聚物，其可通过酸催化交联并且由以下组成：a）100-80mol。式I和II的结构重复单元的比例为1：1至1：9，b）为0-20摩尔。式III的结构重复单元的％（III）其中X和X'各自独立地是氢或可以通过酸的作用除去的保护基，基团R1各自独立地的另一个是C 1 -C 5烷基，苯基或萘基或一起是1,2-亚苯基或 - [C（R 3）（R 4）] x - ，其中R 3和/或R 4 =氢或甲基，x为2至5，基团R 2各自独立地为氢，C 1 -C 5烷基或C 1 -C 5烷氧基，R 5和R 7各自为氢，R 6为氢，卤素或甲基，R 8为氢，卤素，甲基，-CH 2卤素，-CH 2 CN，-CN ，-COOH，-CONH 2，-O-C 1 -C 5烷基，-O-CO-C 1 -C 5烷基，-COO-C 1 -C 5烷基，-COO-苯基或苯基，或R 5和R 6各自为氢，并且R 7和R 8一起为 -CO-O-CO-或各自独立地为-COOH或-COO-C 1 -C 5烷基。所述共聚物与在光化辐射下形成酸的化合物一起适用于制备负性抗蚀剂体系。

9. 发明授权

US6120944A Highly transparent, color-pigmented high molecular weight material 失效
标题翻译：高透明度的着色高分子材料
公开(公告)号：US6120944A
公开(公告)日：2000-09-19
申请号：US57089
申请日：1998-04-08
申请人： Ulrich Schadeli , Eric Tinguely , Veronique Hall-Goulle , Heinz Wolleb , Zhimin Hao , Abul Iqbal
发明人： Ulrich Schadeli , Eric Tinguely , Veronique Hall-Goulle , Heinz Wolleb , Zhimin Hao , Abul Iqbal
IPC分类号： G02B5/20 , C08K5/34 , C08L101/00 , C09B29/33 , C09B33/153 , C09B35/035 , C09B67/22 , C09B67/28 , G02B5/22 , G03F1/56 , G03F7/00 , G03F7/105 , G02F1/1335 , G03C1/73
CPC分类号： G03F1/56 , C09B29/338 , C09B33/153 , C09B35/035 , C09B67/0033 , C09B67/0077 , G03F7/0007 , G03F7/105 , G02B5/22
摘要： The invention relates to a color-pigmented high molecular weight organic material structured from a radiation-sensitive precursor by irradiation, the pigmentation of which material consists of extremely fine particles, at least 80 mol % of the pigmentation consisting of a pigment of the class diketopyrrolopyrrole, dioxazine, isoindoline, isoindolinone, disazo condensation yellow or benzimidazolonazo, each containing at least one --NHCO-- group, and, where appropriate, a second pigment of the class diketopyrrolopyrrole, dioxazine, isoindoline, isoindolinone, benzimidazolonazo, disazo or phthalocyanine, and, when the structure of the main pigment is point-symmetrical, the two pigments being present in a balanced molar ratio of from 1:1 to 7:3. Those materials are used preferably in the form of thin layers which are built up in patterns in one or more layers on a transparent substrate and can be used, for example, as optical color filters.
摘要翻译：本发明涉及通过照射由辐射敏感性前体构成的着色着色高分子量有机材料，其颜料由极细颗粒组成，至少80mol％由二酮吡咯并吡咯类颜料组成的色素沉积，二恶嗪，异二氢吲哚，异吲哚啉酮，双偶氮缩合黄或苯并咪唑烷，各自含有至少一个-NHCO-基，以及适当时为二酮吡咯并吡咯，二恶嗪，异二氢吲哚，异吲哚啉酮，苯并咪唑并唑，二偶氮或酞菁的第二颜料，当主颜料的结构是点对称的时，两种颜料的平衡摩尔比为1：1至7：3。这些材料优选地以薄层的形式使用，其以透明基底上的一个或多个层的图案构成，并且可以用于例如光学滤色器。

10. 发明授权

US5397680A Positive photoresist having improved processing properties 失效
标题翻译：正光致抗蚀剂具有改进的加工性能
公开(公告)号：US5397680A
公开(公告)日：1995-03-14
申请号：US249972
申请日：1994-05-27
申请人： Ulrich Schadeli , Norbert Munzel
发明人： Ulrich Schadeli , Norbert Munzel
IPC分类号： C08F12/22 , C08F12/00 , C08F22/36 , C08F22/40 , C08F222/40 , C08K5/20 , C08L25/00 , C08L25/18 , C08L33/04 , C08L33/24 , C08L35/00 , G03F7/004 , G03F7/039 , G03C1/73
CPC分类号： G03F7/039 , C08F222/40
摘要： Polymers having a molecular weight (weight average) M.sub.w from 10.sup.3 to 10.sup.6, comprising recurring structural units of the formulae (I), (IIa) and (IIb) ##STR1## in which R.sub.1 is hydrogen or methyl, Y is a direct bond or a divalent radical of the formula (III) ##STR2## in which Z is a C.sub.1 -C.sub.6 alkylene group bound to the phenyl nucleus,OR.sub.2 is an acid-cleavable radical,in which R.sub.2 is C.sub.4 -C.sub.10 tert-alkyl, allyl, cyclohex-2-enyl, C.sub.6 -C.sub.14 aryl or C.sub.7 -C.sub.16 aralkyl which are unsubstituted or mono- or poly-substituted by C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms, trialkylsilyl or a group of the formulae (IV)-(VII) ##STR3## in which R.sub.8 is C.sub.1 -C.sub.6 alkyl, or C.sub.6 -C.sub.14 aryl or C.sub.7 -C.sub.16 aralkyl which are unsubstituted or mono- or poly-substituted by C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms,R.sub.3 and R.sub.4 independently of one another are hydrogen, C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms,R.sub.5 and R.sub.6 independently of one another are hydrogen or methyl,X is C.sub.1 -C.sub.6 alkylene and R.sub.7 is C.sub.1 -C.sub.6 alkyl, or C.sub.6 -C.sub.14 aryl or C.sub.7 -C.sub.16 aralkyl which are unsubstituted or mono- or poly-substituted by C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms, or is --CO--R.sub.8 in which R.sub.8 is as defined in formula (IV),are suitable for use in DUV positive photoresists which show greatly reduced delay time effects and are distinguished by a high thermal stability and high resolution capacity.
摘要翻译：具有式（I），（IIa）和（IIb）的重复结构单元的分子量（重均分子量）Mw为103〜106的聚合物（IIa）（IIb）（IIb））其中R 1是氢或甲基，Y是直接键或式（III）的二价基团其中Z是与苯基结合的C 1 -C 6亚烷基，OR 2是酸 - C 1 -C 6烷基，C 1 -C 6烷氧基或卤素取代的未取代或单取代或多取代的C 1 -C 10烷基，烯丙基，环己-2-烯基，C 6 -C 14芳基或C 7 -C 16芳烷基（VI）其中R 8为C 1 -C 6烷基或C 6 -C 6烷基的化合物（Ⅶ）（Ⅶ） C1-C6烷基，C1-C6烷氧基或卤素原子未取代或单取代或多取代的-C14芳基或C7-C16芳烷基，R3和R4彼此独立地是氢，C1-C6烷基，C1-C6烷氧基或卤素原子，R5和R6独立地表示另一个是氢或甲基，X是C1-C6亚烷基，R7是C1-C6烷基或C6-C14芳基或C7-C16芳烷基，它们是未取代的或被C1-C6烷基，C1-C6烷氧基或卤素单取代或多取代或者是其中R8如式（IV）中所定义的-CO-R8，适用于DUV正性光致抗蚀剂，其显示出大大降低的延迟时间效应，并被高热稳定性和高分辨能力区分。

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