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1. 发明授权

US11709425B2 Resist composition and method of forming resist pattern 有权
公开(公告)号：US11709425B2
公开(公告)日：2023-07-25
申请号：US16420828
申请日：2019-05-23
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Takaya Maehashi , Yoshitaka Komuro
IPC分类号： G03F7/004 , G03F7/039 , G03F7/30 , G03F7/027 , G03F7/38 , C07C321/28 , G03F7/20
CPC分类号： G03F7/0045 , C07C321/28 , G03F7/0048 , G03F7/0275 , G03F7/0392 , G03F7/0397 , G03F7/2004 , G03F7/2059 , G03F7/30 , G03F7/38
摘要： A resist composition including: a compound including an anion moiety and a cation moiety and represented by the following Formula (bd1); and an organic solvent having a hydroxyl group in which Rx1 to Rx4 each represent a hydrocarbon group or a hydrogen atom, or may be bonded to each other to form a ring structure; Ry1 and Ry2 each independently represent a hydrocarbon group or a hydrogen atom, or may be bonded to each other to form a ring structure; Rz1 to Rz4 each represent a hydrocarbon group or a hydrogen atom, or may be bonded to each other to form a ring structure; at least one of Rx1 to Rx4, Ry1 and Ry2 and Rz1 to Rz4 has an anionic group; and Mm+ represents an organic cation)

2. 发明授权

US10414918B2 Method of preparing polymer compound 有权
公开(公告)号：US10414918B2
公开(公告)日：2019-09-17
申请号：US15641959
申请日：2017-07-05
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Yoshitaka Komuro , Masatoshi Arai , Koshi Onishi , KhanhTin Nguyen , Masahiro Shiosaki , Takuya Ikeda , Takaya Maehashi
IPC分类号： C08L67/07 , C08L25/02 , C08F12/22 , C08F212/14 , C08F8/12 , C09D125/18 , G03F7/039 , C08L53/00
摘要： A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.

3. 发明申请

US20140322652A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：耐蚀组合物和形成耐力图案的方法
公开(公告)号：US20140322652A1
公开(公告)日：2014-10-30
申请号：US14258899
申请日：2014-04-22
申请人： Tokyo Ohka Kogyo Co., Ltd.
发明人： Yoshitaka Komuro , Takaya Maehashi , Takashi Nagamine
IPC分类号： G03F7/038
CPC分类号： G03F7/0397 , G03F7/2041 , G03F7/325
摘要： A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid and an acid generator which generates acid upon exposure, the base component containing a polymeric compound containing a structural unit represented by general formula (a0-1) and the acid generator containing a compound represented by general formula (b1). In the formulae, R represents H, an alkyl group of C1 to 5 or a halogenated alkyl group of C1 to 5; Ya1 represents a single bond or a divalent linking group; La1 and La2 represents —SO2— or —C(═O)—; Ra1 represents a cyclic group which may have a substituent and the like; n1 and n2 represents 0 or 1; R11 represents a cyclic group of C5 to 30 which may have a substituent; V11 represents a single bond or an alkylene group of C1 to 6; L11 represents an ester bond; Y11 represents an alkylene group of C1 to 5 which may have a fluorine atom; m represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m.
摘要翻译：一种抗蚀剂组合物，其包含在酸的作用下在显影液中显示出改变的溶解度的碱成分和在曝光时产生酸的酸产生剂，所述碱成分含有含有由通式（a0-1）表示的结构单元的聚合物和该酸产生剂含有通式（b1）表示的化合物。在该式中，R表示H，C1〜5的烷基或C1〜5的卤代烷基; Ya1表示单键或二价连接基团; La1和La2表示-SO2-或-C（= O） - ; Ra1表示可以具有取代基等的环状基团。 n1和n2表示0或1; R11表示可具有取代基的C5〜30的环状基团; V11表示C1〜6的单键或亚烷基; L11表示酯键; Y 11表示可以具有氟原子的C1〜5的亚烷基; m表示1以上的整数， Mm +表示化合价为m的有机阳离子。

4. 发明授权

US10649330B2 Resist composition, method of forming resist pattern, compound, and acid generator 有权
公开(公告)号：US10649330B2
公开(公告)日：2020-05-12
申请号：US15822999
申请日：2017-11-27
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Masatoshi Arai , Takaya Maehashi , Takuya Ikeda
IPC分类号： G03F7/004 , C07C25/18 , G03F7/012 , G03F7/039 , C07C309/12 , C07C381/12 , C09D125/18 , C08F2/46 , C08F212/14 , C08F12/24
摘要： A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and a compound (B1) having an anion moiety and a cation moiety and being represented by general formula (b1) (wherein R01 to R014 each independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of R01 to R014 may be mutually bonded to form a ring structure, provided that at least two of R01 to R014 are mutually bonded to form a ring structure, and at least one of R01 to R014 has an anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m).

5. 发明授权

US10295905B2 Resist composition, method for forming resist pattern, and polymer compound 有权
公开(公告)号：US10295905B2
公开(公告)日：2019-05-21
申请号：US15651177
申请日：2017-07-17
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Yoshitaka Komuro , Masatoshi Arai , Koshi Onishi , KhanhTin Nguyen , Takaya Maehashi
IPC分类号： G03F7/004 , G03F7/30 , C08F220/30 , C08F222/10 , G03F7/039 , G03F7/038 , C08F18/02 , H01L21/02
摘要： A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0″ is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.

6. 发明授权

US09567477B2 Undercoat agent and method of producing structure containing phase-separated structure 有权
标题翻译：底涂剂和含相分离结构结构的方法
公开(公告)号：US09567477B2
公开(公告)日：2017-02-14
申请号：US14324493
申请日：2014-07-07
申请人： Tokyo Ohka Kogyo Co., Ltd.
发明人： Takehiro Seshimo , Tasuku Matsumiya , Takaya Maehashi , Takahiro Dazai , Yoshiyuki Utsumi
IPC分类号： C09D133/12 , C09D125/16 , C09D125/14 , C08F212/08 , C08F230/08 , C09D153/02
CPC分类号： C09D133/12 , C08F212/08 , C08F230/08 , C09D125/14 , C09D125/16 , C09D153/02 , C08F220/14 , C08F220/06 , C08F212/12
摘要： An undercoat agent used for phase separating a layer containing a block copolymer having a block of a structural unit derived from an (α-substituted) acrylate ester on a substrate, and which contains a resin component including a structural unit represented by formula (ba0-1), and/or a structural unit represented by formula (ba0-2), and a structural unit (ba0-3) having a substrate interacting group, wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R1 and R2 represent a halogen atom or an organic group of 1 to 20 carbon atoms which may contain an oxygen atom, a halogen atom, or a silicon atom, and n is 1 to 5.
摘要翻译：一种底涂剂，用于在基材上相分离含有由（α-取代）丙烯酸酯衍生的结构单元的嵌段的嵌段共聚物的层，并含有包含由式（ba0- 1）和/或由式（ba0-2）表示的结构单元和具有底物相互作用基团的结构单元（ba0-3），其中R表示氢原子，1至5个碳原子的烷基或 1至5个碳原子的卤代烷基，R 1和R 2表示可以含有氧原子，卤素原子或硅原子的卤素原子或1-20个碳原子的有机基团，n为1至5 。

7. 发明申请

US20150034595A1 METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATION STRUCTURE, METHOD OF FORMING PATTERN, AND METHOD OF FORMING FINE PATTERN 有权
标题翻译：生产包含相分离结构的结构的方法，形成图案的方法和形成精细图案的方法
公开(公告)号：US20150034595A1
公开(公告)日：2015-02-05
申请号：US14445556
申请日：2014-07-29
申请人： Tokyo Ohka Kogyo Co., Ltd.
发明人： Takehiro Seshimo , Takahiro Dazai , Takaya Maehashi , Ken Miyagi , Yoshiyuki Utsumi
IPC分类号： G03F7/20 , G03F7/42 , G03F7/40
CPC分类号： G03F7/20 , C08L3/00 , C08L33/12 , G03F7/0002 , G03F7/0397 , G03F7/40 , G03F7/427
摘要： A method of forming a structure containing a phase-separated structure, the method including: a step of forming a layer containing a block copolymer having a plurality of blocks bonded and a purity of 98% or more, and a step of phase-separating the layer containing the block copolymer.
摘要翻译：一种形成包含相分离结构的结构的方法，所述方法包括：形成含有多个嵌段键合并且纯度为98％以上的嵌段共聚物的层的步骤，以及将含有嵌段共聚物的层。

8. 发明授权

US11560444B2 Method of producing block copolymer capable of creating specific structure pattern 有权
公开(公告)号：US11560444B2
公开(公告)日：2023-01-24
申请号：US16780643
申请日：2020-02-03
申请人： TOKYO OHKA KOGYO CO., LTD. , TOKYO INSTITUTE OF TECHNOLOGY
发明人： Teruaki Hayakawa , Seina Yamazaki , Akiyoshi Yamazaki , Daisuke Kawana , Yoshitaka Komuro , Takaya Maehashi , Rin Odashima
IPC分类号： C08F297/02 , C09D153/00
摘要： A block copolymer including a first block consisting of a polymer having a repeating structure of a structural unit (u1) containing no silicon atom, and a second block consisting of a polymer having a repeating structure of a structural unit (u2) containing a silicon atom, the second block containing a block (b21) consisting of a polymer having a repeating structure of a structural unit (u21) represented by general formula (u2-1) shown below, and the volume ratio of the first block, based on all blocks constituting the block copolymer being 42 to 44 vol %: In which RP211 represents an alkyl group, a halogenated alkyl group, a hydrogen atom, or an organic group having a polar group; and RP212 is a group derived from a compound represented by formula SHRt1, wherein Rt1 represents a hydrocarbon group having 1 to 5 carbon atoms optionally having a substituent.

9. 发明授权

US11448963B2 Resist composition and method of forming resist pattern 有权
公开(公告)号：US11448963B2
公开(公告)日：2022-09-20
申请号：US16441652
申请日：2019-06-14
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Masatoshi Arai , Takaya Maehashi , Koshi Onishi
IPC分类号： G03F7/039 , G03F7/30 , G03F7/038 , G03F7/004 , C08F212/14 , C08F220/18 , G03F7/20 , G03F7/16 , G03F7/32 , G03F7/38
摘要： A resist composition including a base component and an acid generator component, the base component including a resin component having a structural unit (a0) represented by general formula (a0) shown below, and the acid generator component containing at least one of a compound (b-1), a compound (b-2) and a compound (b-3) represented by general formula (b-3) shown below in which Wa represents a divalent aromatic hydrocarbon group; Ra00 represents an acid dissociable group; R101, R104 and R106 each independently represents a hydrocarbon group containing an aromatic ring; R105, R107 and R108 each independently represents a cyclic group, a chain alkyl group which may have a substituent or a chain alkenyl group; R102 represents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms and M′m+ represents an m-valent onium cation.

10. 发明授权

US11275307B2 Resist composition, method of forming resist pattern, polymeric compound, and compound 有权
公开(公告)号：US11275307B2
公开(公告)日：2022-03-15
申请号：US16443001
申请日：2019-06-17
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Masatoshi Arai , Takaya Maehashi , Koshi Onishi
IPC分类号： G03F7/039 , G03F7/038 , C07C69/76 , C08F220/14 , C08F212/14 , C08F220/18 , G03F7/16 , G03F7/20 , G03F7/38 , G03F7/32
摘要： A resist composition including a resin component which exhibits changed solubility in a developing solution under action of acid, the resin component including a structural unit represented by general formula (a0) shown below in which Vax0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Ya0 represents a carbon atom; Xa0 represents a group which forms a cyclic hydrocarbon group together with Ya0; Ra00 represents a hydrocarbon group which may have a substituent; provided that at least one of Xa0 and Ra00 has a carbon atom constituting a carbon-carbon unsaturated bond at an α-position of Ya0.

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