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1. 发明授权

US06204606B1 Slotted waveguide structure for generating plasma discharges 失效
标题翻译：用于产生等离子体放电的开槽波导结构
公开(公告)号：US06204606B1
公开(公告)日：2001-03-20
申请号：US09406907
申请日：1999-09-28
申请人： Paul D. Spence , W. Edward Deeds
发明人： Paul D. Spence , W. Edward Deeds
IPC分类号： H05H146
CPC分类号： H01J37/32229 , H01J37/32192 , H05H1/46
摘要： A waveguide structure has at least one shaped slot machined in the wall of the waveguide. The slot is configured such that a high voltage is generated across the slot when the waveguide is suitably excited with high-power microwaves. The strong electric fields generated in the region of the slot can be used to produce a non-equilibrium plasma discharge in a working gas introduced in the vicinity of the slot. Various substrates can be translated past the slot and exposed to the plasma species generated by the microwave discharge. The slotted waveguide structure is designed to operate as a traveling wave structure with microwave energy uniformly dissipated along the length of the slot. Several methods are disclosed for providing uniform power dissipation. These methods include changing the dimensions of the waveguide, altering the position and shape of the wall slot, coupling power into the waveguide by means of auxiliary sources, and using an auxiliary ground plane. The auxiliary ground plane can also serve as a secondary electrode for the application of a low-frequency voltage for the enhancement of high-pressure operation. Altering the background gas pressure, gas composition, gas flow rate, and gas flow pattern provide additional ways to affect the plasma discharge. The structure can be designed to operate over the pressure range of about 10 Torr to atmospheric pressure (i.e., about 760 Torr) using a wide variety of gases and gas mixtures.
摘要翻译：波导结构具有加工在波导壁中的至少一个成形槽。槽被配置成使得当波导被大功率微波适当地激发时，跨越槽产生高电压。在狭缝区域产生的强电场可以用于在引入槽的附近的工作气体中产生非平衡等离子体放电。可以将各种衬底转移通过狭槽并暴露于由微波放电产生的等离子体物质。开槽波导结构被设计为作为行波结构工作，其中微波能量沿着槽的长度均匀消散。公开了几种用于提供均匀功率耗散的方法。这些方法包括改变波导的尺寸，改变壁槽的位置和形状，借助于辅助源将功率耦合到波导中，并且使用辅助接地平面。辅助接地层也可以作为用于施加低频电压的次级电极，用于增强高压操作。改变背景气体压力，气体组成，气体流速和气体流动模式提供了影响等离子体放电的额外方式。该结构可以设计成使用各种各样的气体和气体混合物在约10乇至大气压力（即约760乇）的压力范围内操作。

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