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1. 发明申请

US20180239266A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20180239266A1
公开(公告)日：2018-08-23
申请号：US15956000
申请日：2018-04-18
申请人： NIKON CORPORATION , NIKON ENGINEERING CO., LTD.
发明人： Hiroyuki NAGASAKA , Takeshi OKUYAMA
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341
摘要： An exposure apparatus includes a projection system provided with a final element which has a first outer surface that is liquid repellent, and a component disposed adjacent to the final element and having a second outer surface which is liquid repellent, the first outer surface and the second outer surface facing each other with a gap between the first and second outer surfaces. A substrate is exposed with exposure light from the projection system through immersion liquid between an end surface of the final element and the substrate, the immersion liquid covering a portion of an upper surface of the substrate. The gap is formed above the end surface of the final element.

2. 发明申请

US20170068176A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20170068176A1
公开(公告)日：2017-03-09
申请号：US15354396
申请日：2016-11-17
申请人： NIKON CORPORATION , NIKON ENGINEERING CO., LTD.
发明人： Hiroyuki NAGASAKA , Takeshi OKUYAMA
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341
摘要： A device manufacturing method forms a liquid immersion area under a projection system via which an exposure light is projected, while supplying a liquid via a liquid supply inlet of a liquid retaining member and collecting the supplied liquid along with a gas via a liquid recovery outlet of the liquid retaining member. The liquid retaining member surrounds a tip portion of the projection system, which has a last optical element having a surface. The liquid retaining member has a surface opposite to the surface of the last optical element with a gap between the surfaces. A substrate is exposed with the exposure light through the liquid of the liquid immersion area, while moving the substrate below and relative to the projection system and the liquid retaining member. One of the liquid and the gas is separated from the other which have been collected via the liquid recovery outlet.
摘要翻译：装置制造方法在投影系统下面形成液浸区域，通过该投影系统投射曝光光，同时通过液体保持构件的液体供给入口供给液体，并将供应的液体与气体一起通过液体回收口液体保持构件。液体保持构件围绕投影系统的尖端部分，其具有具有表面的最后一个光学元件。液体保持构件具有与最后光学元件的表面相对的表面，其表面之间具有间隙。在使衬底在投影系统和液体保持构件下方并相对于投影系统和液体保持构件移动的同时，衬底被曝光光通过液浸区域的液体曝光。液体和气体中的一个与通过液体回收出口收集的另一个分离。

3. 发明申请

US20160097982A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 审中-公开
公开(公告)号：US20160097982A1
公开(公告)日：2016-04-07
申请号：US14823673
申请日：2015-08-11
申请人： NIKON CORPORATION , NIKON ENGINEERING CO., LTD.
发明人： Hiroyuki NAGASAKA , Takeshi OKUYAMA
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70833 , G03F7/7085
摘要： Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.

4. 发明申请

US20140307238A1 EXPOSURE APPARATUS AND METHOD FOR PRODUCING DEVICE 审中-公开
标题翻译：曝光装置及其制造方法
公开(公告)号：US20140307238A1
公开(公告)日：2014-10-16
申请号：US14314664
申请日：2014-06-25
申请人： NIKON CORPORATION , NIKON ENGINEERING CO., LTD.
发明人： Hirotaka KOHNO , Takeshi OKUYAMA , Hiroyuki NAGASAKA , Katsushi NAKANO
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341
摘要： A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes a projection system, a first nozzle member having an aperture through which the exposure beam is projected, the first nozzle member having a liquid supply inlet and a liquid recovery outlet, a second nozzle member having a gas supply inlet via which a gas is supplied to a space surrounding the liquid immersion area during the exposure, a driving system which moves the second nozzle member relative to the first nozzle member, and a stage system having a holder which holds the substrate and which is movable relative to and below the projection system, the first nozzle member and the second nozzle member.
摘要翻译：液浸曝光装置通过形成在基板表面的一部分上的液浸区域，用曝光光束使基板曝光。该装置包括一个投影系统，一个具有一个孔的第一喷嘴构件，该曝光光束通过该孔突出，该第一喷嘴构件具有一个液体供应入口和一个液体回收出口，第二喷嘴构件具有气体供应入口，在暴露期间被供应到围绕液浸区域的空间，使第二喷嘴构件相对于第一喷嘴构件移动的驱动系统，以及具有保持基板并且可相对于第一喷嘴构件可移动的支架的台架系统投影系统，第一喷嘴构件和第二喷嘴构件。

5. 发明申请

US20180011411A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 审中-公开
公开(公告)号：US20180011411A1
公开(公告)日：2018-01-11
申请号：US15706244
申请日：2017-09-15
申请人： NIKON CORPORATION , NIKON ENGINEERING CO., LTD.
发明人： Hiroyuki NAGASAKA , Takeshi OKUYAMA
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70833 , G03F7/7085
摘要： Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.

6. 发明申请

US20170329239A1 EXPOSURE APPARATUS AND METHOD FOR PRODUCING DEVICE 审中-公开
公开(公告)号：US20170329239A1
公开(公告)日：2017-11-16
申请号：US15667242
申请日：2017-08-02
申请人： NIKON CORPORATION , NIKON ENGINEERING CO., LTD.
发明人： Hirotaka KOHNO , Takeshi OKUYAMA , Hiroyuki NAGASAKA , Katsushi NAKANO
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341
摘要： A liquid immersion exposure apparatus exposes a substrate with an exposure beam via a liquid immersion area formed on a portion of a surface of the substrate. The apparatus includes: a projection system; a first nozzle member having an aperture through which the exposure beam is projected, the first nozzle member having a liquid supply inlet and a liquid recovery outlet; a second nozzle member having a gas supply inlet via which a gas is supplied, the gas being supplied via the gas supply inlet to a space surrounding the liquid immersion area during the exposure; and a stage system having a holder by which the substrate is held. The substrate held by the holder is moved below and relative to the projection system, the first nozzle member and the second nozzle member.

7. 发明申请

US20170097578A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 审中-公开
公开(公告)号：US20170097578A1
公开(公告)日：2017-04-06
申请号：US15367348
申请日：2016-12-02
申请人： NIKON CORPORATION , NIKON ENGINEERING CO., LTD.
发明人： Hiroyuki NAGASAKA , Takeshi OKUYAMA
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70833 , G03F7/7085
摘要： Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.

8. 发明申请

US20130293860A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 有权
标题翻译：曝光装置，曝光方法和生产装置的方法
公开(公告)号：US20130293860A1
公开(公告)日：2013-11-07
申请号：US13936793
申请日：2013-07-08
申请人： Nikon Engineering Co., Ltd. , Nikon Corporation
发明人： Hiroyuki NAGASAKA , Takeshi OKUYAMA
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70833 , G03F7/7085
摘要： Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.
摘要翻译：曝光装置通过投影光学系统和液体用曝光光照射基板来曝光基板。曝光装置设置有用于供给液体并回收液体的浸液机构。浸液机构具有与基板的表面相对的倾斜面，并且相对于基板的表面倾斜，并且在倾斜面上形成有液浸机构的液体回收口。在基板和投影光学系统之间设置平坦部分。液浸区域可以保持较小。

9. 发明申请

US20190146360A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 审中-公开
公开(公告)号：US20190146360A1
公开(公告)日：2019-05-16
申请号：US16245917
申请日：2019-01-11
申请人： NIKON CORPORATION , NIKON ENGINEERING CO., LTD.
发明人： Hiroyuki NAGASAKA , Takeshi OKUYAMA
IPC分类号： G03F7/20
摘要： Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.

10. 发明申请

US20150331335A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20150331335A1
公开(公告)日：2015-11-19
申请号：US14812366
申请日：2015-07-29
申请人： NIKON CORPORATION , NIKON ENGINEERING CO., LTD.
发明人： Hiroyuki NAGASAKA , Takeshi OKUYAMA
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341
摘要： A liquid confinement member supplies liquid to and collects the liquid from a liquid immersion area formed adjacent to a final optical element of an immersion exposure apparatus, and includes a channel formation member that surrounds a portion of the final optical element of the immersion exposure apparatus. The channel formation member includes a hole through which exposure light projected by the final optical element passes, a liquid supply opening through which the liquid is supplied to the liquid immersion area, a liquid recovery opening through which the liquid is recovered from the liquid immersion area, a liquid supply channel by which the liquid is supplied to the liquid supply opening, and a liquid recovery channel by which the liquid is recovered from the liquid recovery opening. At least one of the liquid supply and liquid recovery channels includes a protrusion into a portion of the channel.
摘要翻译：液体限制部件从与浸没曝光装置的最终光学元件相邻形成的液浸区域供给液体并收集液体，并且包括围绕浸没曝光装置的最终光学元件的一部分的通道形成部件。通道形成构件包括由最终光学元件投射的曝光光通过的孔，液体供应到液浸区域的液体供应开口，液体从液浸区域回收的液体回收开口液体供给到液体供给口的液体供给通道，从液体回收口回收液体的液体回收通道。液体供应和液体回收通道中的至少一个包括进入通道的一部分的突起。

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