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    • 9. 发明授权
    • Substrate holding device
    • 基板保持装置
    • US08817449B2
    • 2014-08-26
    • US13634316
    • 2011-03-16
    • Naoki MorimotoMasahiko Ishida
    • Naoki MorimotoMasahiko Ishida
    • H01L21/683
    • H01L21/6831
    • A substrate holding device for clamping a substrate in a processing chamber in which plasma processing is carried out includes a chuck main body having positive and negative electrodes and, a chuck plate having a rib portion capable of bringing the peripheral edge portion of the substrate into surface contact therewith and multiple support portions provided upright and arranged at predetermined intervals in an internal space surrounded by the rib portion, a DC power supply for applying a DC voltage between the two electrodes, an AC power supply for passing an alternating current through the capacitance of the chuck plate, and first measuring means for measuring the alternating current passing through the capacitance of the chuck plate, and further includes removing means for removing an AC component superimposed on the alternating current from a plasma produced in the processing chamber during plasma processing.
    • 用于在执行等离子体处理的处理室中夹持基板的基板保持装置包括具有正极和负极的卡盘主体,以及具有能够使基板的周边部分成为表面的肋部的卡盘板 与其直接连接并且设置在由肋部包围的内部空间中的直立设置的多个支撑部,用于在两个电极之间施加直流电压的直流电源,用于使交流电流通过电容的交流电源 卡盘板和用于测量通过卡盘板电容的交流电流的第一测量装置,还包括用于从等离子体处理期间由处理室中产生的等离子体移除叠加在交流电上的交流分量的去除装置。
    • 10. 发明申请
    • METHOD OF MANAGING SUBSTRATE
    • 管理基板的方法
    • US20110201139A1
    • 2011-08-18
    • US13119985
    • 2009-10-05
    • Masahiko IshidaNaoki MorimotoKouji Sokabe
    • Masahiko IshidaNaoki MorimotoKouji Sokabe
    • H01L21/02
    • H01L21/6831H01L21/67253
    • The electrostatic chuck is made up of: a chuck main body having electrodes; a chuck plate of a dielectric material and having a rib portion with which a peripheral edge portion of the substrate is capable of coming into surface contact, and a plurality of supporting portions which are vertically disposed at a predetermined distance from one another in an inner space enclosed by the rib portion; and a gas introduction means for introducing a predetermined gas into the inner space. When the substrate is held by the electrostatic chuck which is arranged to attract the substrate by the chuck plate and to form a gas atmosphere by supplying a predetermined gas into the inner space, a current value is monitored by causing an AC current to flow in a capacitance of the chuck plate through an AC power supply, a gas flow amount is monitored by causing the gas to flow through the gas introduction means, and a substrate state is managed based on a variation in at least one of the current value and the gas flow amount to prevent damages to the substrate.
    • 静电卡盘由具有电极的卡盘主体构成; 介电材料的卡盘板,具有能够与基板的周缘部进行表面接触的肋部,以及在内部空间中彼此以规定距离垂直配置的多个支撑部 由肋部包围; 以及用于将预定气体引入内部空间的气体引入装置。 当基板被设置成通过卡盘板吸引基板的静电卡盘保持并且通过将预定的气体供应到内部空间来形成气体气氛时,通过使AC电流在 通过交流电源对卡盘板的电容进行监测,通过使气体流过气体引入装置来监测气体流量,并且基于当前值和气体中的至少一个的变化来管理基板状态 流量以防止损坏基板。