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1. 发明授权

US06407011B1 Low dielectric constant insulating films with laminated carbon-containing silicon oxide and organic layers 有权
标题翻译：低介电常数绝缘膜，含有层状碳的氧化硅和有机层
公开(公告)号：US06407011B1
公开(公告)日：2002-06-18
申请号：US09626397
申请日：2000-07-26
申请人： Koichi Ikeda , Masanaga Fukasawa , Hideyuki Kito , Toshiaki Hasegawa
发明人： Koichi Ikeda , Masanaga Fukasawa , Hideyuki Kito , Toshiaki Hasegawa
IPC分类号： H01L2131
CPC分类号： H01L21/76835 , H01L21/02118 , H01L21/0212 , H01L21/02137 , H01L21/022 , H01L21/02274 , H01L21/02282 , H01L21/31144 , H01L21/3122 , H01L21/3124 , H01L21/76801 , H01L21/76808
摘要： A stacked insulating film having an organic insulating film, and a carbon-containing silicon oxide film formed on the organic insulating film is disclosed. The carbon-containing silicon oxide film has a carbon content of 8 atom % to 25 atom %.
摘要翻译：公开了一种具有有机绝缘膜的叠层绝缘膜和在有机绝缘膜上形成的含碳氧化硅膜。含碳氧化硅膜的碳含量为8原子％至25原子％。

2. 发明授权

US06383907B1 Process for fabricating a semiconductor device 有权
标题翻译：制造半导体器件的工艺
公开(公告)号：US06383907B1
公开(公告)日：2002-05-07
申请号：US09655832
申请日：2000-09-06
申请人： Toshiaki Hasegawa , Koichi Ikeda , Hideyuki Kito
发明人： Toshiaki Hasegawa , Koichi Ikeda , Hideyuki Kito
IPC分类号： H01L2144
CPC分类号： H01L21/76835 , H01L21/31144 , H01L21/76811 , H01L21/76813 , H01L21/76825 , H01L21/76826 , H01L21/76829
摘要： A process for producing a semiconductor device comprising an interlayer dielectric containing an organic film, which process comprises the step of forming on the interlayer dielectric a three-layer mask comprising a first mask, a second mask and a third mask in this order from the bottom, in which the first mask, the second mask and the third mask are made of materials different from one another, and the second mask is formed from a film made of a material which protects a film for forming the first mask during formation of the third mask. The process of the present invention is advantageous not only in that the second mask serves as a protecting film for the layers under the first mask during formation of the third mask, so that etching using a resist mask can be conducted during formation of the third mask, and further it becomes possible to perform a regeneration treatment for the resist mask while preventing the layers under the first mask from suffering a damage, but also in that, as a material for the first mask, the same material as that for the resist mask, for example, a carbon-containing material having a low dielectric constant can be used.
摘要翻译：一种制造包含含有有机膜的层间电介质的半导体器件的方法，该方法包括在层间电介质上形成从底部开始依次形成第一掩模，第二掩模和第三掩模的三层掩模的步骤其中第一掩模，第二掩模和第三掩模由彼此不同的材料制成，并且第二掩模由在由形成第三掩模的第三掩模形成期间保护用于形成第一掩模的膜的材料制成的膜形成面具。本发明的方法不仅有利于第二掩模在形成第三掩模期间用作第一掩模下的层的保护膜，使得可以在形成第三掩模期间进行使用抗蚀剂掩模的蚀刻并且进一步地，可以在防止第一掩模下的层遭受损伤的同时进行抗蚀剂掩模的再生处理，而且作为用于第一掩模的材料与用于抗蚀剂掩模的材料相同例如，可以使用具有低介电常数的含碳材料。

3. 发明授权

US08715899B2 Carrier for two-component developer, two-component developer, image forming method, and image forming apparatus 有权
标题翻译：用于双组分显影剂，双组分显影剂，成像方法和图像形成装置的载体
公开(公告)号：US08715899B2
公开(公告)日：2014-05-06
申请号：US13402352
申请日：2012-02-22
申请人： Norihito Fukushima , Takeshi Shoji , Toshiaki Hasegawa
发明人： Norihito Fukushima , Takeshi Shoji , Toshiaki Hasegawa
IPC分类号： G03G9/113
CPC分类号： G03G9/107 , G03G9/0819 , G03G9/1075 , G03G9/1133 , G03G9/1139 , G03G15/09 , G03G2215/0609
摘要： A carrier for a two-component developer includes magnetic particles, and a resin coating layer that covers the magnetic particles. The resin coating layer contains metal boride particles having a volume average primary particle diameter of from about 300 nm to about 2,500 nm.
摘要翻译：用于双组分显影剂的载体包括磁性颗粒和覆盖磁性颗粒的树脂涂层。树脂涂层含有体积平均一次粒径为约300nm至约2500nm的金属硼化物颗粒。

4. 发明授权

US06207585B1 Method of forming stacked insulating film and semiconductor device using the same 失效
标题翻译：层叠绝缘膜的形成方法及使用其的半导体装置
公开(公告)号：US06207585B1
公开(公告)日：2001-03-27
申请号：US09128545
申请日：1998-08-04
申请人： Toshiaki Hasegawa , Junichi Aoyama
发明人： Toshiaki Hasegawa , Junichi Aoyama
IPC分类号： H01L2131
CPC分类号： H01L21/02126 , C23C16/402 , H01L21/02211 , H01L21/02271 , H01L21/02304 , H01L21/02362 , H01L21/31051 , H01L21/3122 , H01L21/31612 , H01L21/76801 , H01L21/76828 , H01L21/76834 , H01L21/76837 , H01L23/53295 , H01L2924/0002 , H01L2924/00
摘要： Disclosed is a method of forming a cap insulating film at a high reliability prior to heat-treatment for removing an —OH group from a planarization insulating film (APL film) which is excellent in a gap fill ability and global planarization ability and which is formed by a liquid phase CVD process. The (lower) cap insulating film is formed by plasma CVD using a source gas containing an inorganic silane compound gas, O2 and a hydrocarbon; or an organic silane compound gas and O2. With this method, the cap insulating film can be formed without occurrence of harmful ammonia and particles in plasma.
摘要翻译：公开了一种在热处理之前以高可靠性形成帽绝缘膜的方法，用于从间隙填充能力和全局平坦化能力优异的平坦化绝缘膜（APL膜）中除去-OH基团，并形成通过液相CVD工艺。（下）帽绝缘膜通过使用含有无机硅烷化合物气体O 2和烃的源气体的等离子体CVD形成; 或有机硅烷化合物气体和O 2。通过该方法，可以形成帽绝缘膜，而不会在等离子体中产生有害的氨和颗粒。

5. 发明授权

US5751135A Charging connector for electric vehicle 失效
标题翻译：电动车充电接头
公开(公告)号：US5751135A
公开(公告)日：1998-05-12
申请号：US753497
申请日：1996-11-26
申请人： Hirotaka Fukushima , Toshiaki Hasegawa
发明人： Hirotaka Fukushima , Toshiaki Hasegawa
IPC分类号： H01R13/639 , B60L11/18 , H01R13/52 , H01R13/627 , H01R13/703 , H01R13/717 , H02J7/00 , H01R13/62
CPC分类号： H02J7/0045 , B60L11/1818 , B60L11/1846 , H01R13/6272 , H01R13/7036 , H01R13/7175 , H01R13/5227 , Y02T10/7005 , Y02T10/7072 , Y02T90/121 , Y02T90/128 , Y02T90/14 , Y02T90/163 , Y02T90/169 , Y04S30/14
摘要： In a charging connector device for an electric vehicle composed of a power supplying connector and a power receiving connector, an indicator lamp of a two color type is set in an illumination chamber within a case body of the power supplying connector. One color of the two colors is used for illumination. The power supplying connector includes a locking lever and a microswitch. When both connectors are provisionally coupled with each other, a securing piece at the one end of the locking lever runs over a securing protrusion of the power receiving connector so that the pressing potion at the other end of the locking lever presses a switch spring of the microswitch to be turned off, thereby giving rise to no energization of the charging connector device. When both connectors are completely coupled with each other, the lever is elastically restored by the action of a coil spring, thus energizing the connector device.
摘要翻译：在由供电连接器和受电连接器构成的用于电动车辆的充电连接器装置中，在供电连接器的壳体内的照明室内设置两色指示灯。两种颜色的一种颜色用于照明。供电连接器包括锁定杆和微动开关。当两个连接器彼此临时耦合时，在锁定杆的一端处的固定件在电力接收连接器的固定突起上延伸，使得在锁定杆的另一端的按压部分按压微动开关被关闭，从而不会使充电连接器装置通电。当两个连接器彼此完全连接时，杠杆通过螺旋弹簧的作用弹性恢复，从而对连接器装置通电。

6. 外观设计

USD375721S Connector for electric supplier for electric car 失效
公开(公告)号：USD375721S
公开(公告)日：1996-11-19
申请号：US52182
申请日：1996-03-25
申请人： Takayoshi Endo , Toshiaki Hasegawa
设计人： Takayoshi Endo , Toshiaki Hasegawa

7. 发明授权

US5573417A Feeding connector 失效
标题翻译：进料连接器
公开(公告)号：US5573417A
公开(公告)日：1996-11-12
申请号：US419935
申请日：1995-04-11
申请人： Shigemi Hashizawa , Shigemitsu Inaba , Toshiaki Hasegawa
发明人： Shigemi Hashizawa , Shigemitsu Inaba , Toshiaki Hasegawa
IPC分类号： H01R13/629 , H01R13/639 , H01R13/62
CPC分类号： B60L11/1818 , H01R13/639 , B60L2270/32 , B60L2270/34 , H01R13/629 , H01R4/48 , Y02T10/7005 , Y02T10/7072 , Y02T90/14
摘要： A feeding connector used for charging an automobile in which incomplete connection between a feeding connector half and a receiving connector half is prevented and the connection work of both connector halves can be easily carried out with small insertion force. The feeding connector according to the present invention comprises a feeding connector half and a receiving connector half, wherein the feeding connector half comprising: a case; a connector main body slidably accommodated in a front half portion of the case for accommodating a plurality of terminals; a handle attached to a rear half portion of the case; a slider for causing the connector main body in the case to slide; a rotatable lever of which intermediate portion is supported in the case, a working portion of the lever rotatably attached to the handle and an operating portion of the lever projecting out of the case; a locking means for locking the lever at a portion where the connector main body is locked to a connector main body of the receiving connector half due to a rotation of the rotatable lever; and a means for unlocking the lever.
摘要翻译：用于对汽车充电的馈电连接器，其中防止了馈电连接器半部和接收连接器半部之间的不完全连接，并且可以容易地以小的插入力执行两个连接器半部的连接工作。根据本发明的馈电连接器包括馈电连接器半部和接收连接器半部，其中馈电连接器半部包括：壳体; 连接器主体，其可滑动地容纳在所述壳体的前半部分中，用于容纳多个端子; 手柄，其附接到所述壳体的后半部分; 用于使连接器主体在壳体中滑动的滑块; 可转动的杆，其中间部分被支撑在壳体中，杆的工作部分可旋转地附接到手柄，并且杠杆的操作部分伸出壳体; 锁定装置，用于在连接器主体被锁定到接收连接器半部的连接器主体的部分处由于可旋转杆的旋转而锁定杆; 以及用于解锁杠杆的装置。

8. 外观设计

USD361749S Electrical charging plug 失效
公开(公告)号：USD361749S
公开(公告)日：1995-08-29
申请号：US20177
申请日：1994-03-18
申请人： Yasuyoshi Fukao , Toshiyuki Sekimori , Hiromichi Kuno , Nobuaki Yoshioka , Toshiaki Hasegawa , Shigemitsu Inaba
设计人： Yasuyoshi Fukao , Toshiyuki Sekimori , Hiromichi Kuno , Nobuaki Yoshioka , Toshiaki Hasegawa , Shigemitsu Inaba

9. 发明授权

US5421888A Low pressure CVD apparatus comprising gas distribution collimator 失效
标题翻译：低压CVD装置包括气体分配准直器
公开(公告)号：US5421888A
公开(公告)日：1995-06-06
申请号：US175690
申请日：1993-12-30
申请人： Toshiaki Hasegawa
发明人： Toshiaki Hasegawa
IPC分类号： C23C16/04 , C23C16/44 , C23C16/455 , C23C16/00
CPC分类号： C23C16/45565 , C23C16/045 , C23C16/45591
摘要： The present invention provides a low-pressure CVD apparatus capable of forming a film with improved step coverage and which fills up contact holes without forming any seam therein. The low-pressure CVD apparatus comprises a CVD reaction chamber (6) provided with a source gas inlet (5), a susceptor (1) for supporting a wafer (2), and a gas distributing means (3) disposed between the source gas inlet (5) and a wafer (2) supported on the susceptor (1) to distribute a source gas uniformly over the surface of the wafer (2). The gas distributing means (3) is provided with a plurality of minute pores (16) serving as passages (10a) for the source gas and extending substantially perpendicularly to the surface of the wafer (2).
摘要翻译：本发明提供一种低压CVD装置，其能够形成具有改善的台阶覆盖率的膜，并且填充接触孔而不在其中形成任何接缝。低压CVD装置包括设置有源气体入口（5）的CVD反应室（6），用于支撑晶片（2）的基座（1）和设置在源气体之间的气体分配装置入口（5）和支撑在基座（1）上的晶片（2），以将源气体均匀地分布在晶片（2）的表面上。气体分配装置（3）设置有用作源气体的通道（10a）的多个微孔（16），并基本上垂直于晶片（2）的表面延伸。

10. 发明授权

US5374591A Method of making a metal plug 失效
标题翻译：制作金属插头的方法
公开(公告)号：US5374591A
公开(公告)日：1994-12-20
申请号：US856115
申请日：1992-03-23
申请人： Toshiaki Hasegawa , Junichi Sato
发明人： Toshiaki Hasegawa , Junichi Sato
IPC分类号： H01L21/285 , H01L21/28 , H01L21/302 , H01L21/3065 , H01L21/768 , H01L21/441
CPC分类号： H01L21/76802 , H01L21/76841 , H01L21/76877
摘要： A metal plug is formed in a connection hole such as a via hole or a contact hole to provide an interconnection between multilayer wires in a semiconductor integrated circuit. First, an adhesion layer is deposited on an insulating film, and an area of the adhesion layer is etched away isotropic etching through an opening in a resist mask, the area being larger than the opening in the resist mask. Thereafter, the insulating film is etched through the opening in the resist mask by anisotropic etching, forming a connection hole in the insulating film. Then, a metal layer such as a blanket tungsten layer is deposited on the adhesion layer and in the connection hole. The metal layer is etched back and the adhesion layer is etched away, leaving the metal layer as a metal plug in the connection hole.
摘要翻译：金属插塞形成在诸如通孔或接触孔的连接孔中，以在半导体集成电路中的多层导线之间形成互连。首先，在绝缘膜上沉积粘合层，并且通过抗蚀剂掩模中的开口蚀刻粘附层的区域各向同性蚀刻，该面积大于抗蚀剂掩模中的开口。此后，通过各向异性蚀刻在抗蚀剂掩模中的开口蚀刻绝缘膜，在绝缘膜中形成连接孔。然后，在粘合层和连接孔中沉积诸如覆盖钨层的金属层。金属层被回蚀刻，并且粘附层被蚀刻掉，使金属层作为连接孔中的金属塞。

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