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    • 7. 发明授权
    • Thermal head driving integrated circuit
    • 热敏头驱动集成电路
    • US06346960B1
    • 2002-02-12
    • US09404936
    • 1999-09-23
    • Yoshihide KanakuboYasuhiro MoyaTatsuya KittaKazutoshi IshiiSumitaka Goto
    • Yoshihide KanakuboYasuhiro MoyaTatsuya KittaKazutoshi IshiiSumitaka Goto
    • B41J2345
    • B41J2/355
    • A thermal head driving integrated circuit may be used to perform an “n” color or “n” gradation printing operation with a simplified circuit having a reduced size by employing a single delay element connected to a plurality of resistive heating elements. The integrated circuit has a plurality of drive units each for driving a respective one of the heating elements and each having a drive transistor for driving a respective heating element, one or more delay elements, the number of delay elements being less than “n”, for supplying delayed print data to the drive transistor, a print data storing unit for storing the print data of each of the “n” types, and a print data supplying unit for supplying print data stored in the print data storing unit to the “n” delay elements.
    • 可以使用热敏头驱动集成电路,通过采用连接到多个电阻加热元件的单个延迟元件,通过具有减小的尺寸的简化电路来执行“n”种颜色或“n”级别打印操作。 集成电路具有多个驱动单元,每个驱动单元用于驱动相应的一个加热元件,并且每个驱动单元具有用于驱动相应加热元件的驱动晶体管,一个或多个延迟元件,延迟元件的数量小于“n” 用于将延迟的打印数据提供给驱动晶体管;打印数据存储单元,用于存储每个“n”类型的打印数据,以及打印数据提供单元,用于将存储在打印数据存储单元中的打印数据提供给“n” “延迟元素
    • 8. 发明授权
    • Semiconductor device and method of manufacturing the same
    • 半导体装置及其制造方法
    • US6107128A
    • 2000-08-22
    • US324693
    • 1999-06-02
    • Kazutoshi IshiiSumitaka GotouYasuhiro MoyaTatsuya KittaYoshihide Kanakubo
    • Kazutoshi IshiiSumitaka GotouYasuhiro MoyaTatsuya KittaYoshihide Kanakubo
    • H01L29/78H01L21/8238H01L27/092
    • H01L27/0925H01L21/823857
    • Since a field effect MOS transistor can be formed with a reduced number of manufacturing processes, a semiconductor integrated circuit device can be materialized at a low cost. A semiconductor device has a structure in which a gate electrode is provided in the vicinity of the surface of a semiconductor substrate through a gate insulating film, a second conductive type heavily doped impurity region is provided in a region adjacent to a part of the gate electrode through a part of the gate insulating film and a part of a thick oxide film, another second conductive type heavily doped impurity region is provided in a region adjacent to an opposite part of the gate electrode opposing the part of the gate electrode through the part of the gate insulating film and a part of another thick oxide film, and a first conductive type heavily doped impurity region for device isolation is provided so as to surround the gate electrode and the second conductive type heavily doped impurity regions.
    • 由于能够以较少数量的制造工艺形成场效应MOS晶体管,所以能够以低成本实现半导体集成电路器件。 半导体器件具有其中通过栅极绝缘膜在半导体衬底的表面附近设置栅电极的结构,在与栅电极的一部分相邻的区域中设置第二导电型重掺杂杂质区 通过栅极绝缘膜的一部分和厚氧化物膜的一部分,另一个第二导电型重掺杂杂质区设置在与栅电极的与栅电极的一部分相对的相对部分附近的区域中, 设置栅绝缘膜和另一厚氧化膜的一部分,以及用于器件隔离的第一导电型重掺杂杂质区域,以围绕栅电极和第二导电型重掺杂杂质区。