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1. 发明申请

US20080268377A1 PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS 有权
标题翻译：生产光催化剂聚合物的方法
公开(公告)号：US20080268377A1
公开(公告)日：2008-10-30
申请号：US12146594
申请日：2008-06-26
申请人： Hitoshi WATANABE , Hidetaka Hayamizu , Masaaki Kishimura
发明人： Hitoshi WATANABE , Hidetaka Hayamizu , Masaaki Kishimura
IPC分类号： G03F7/004
CPC分类号： C08F220/18 , C08F6/00 , C08F6/02 , C08F6/06 , G03F7/0397
摘要： Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.
摘要翻译：具有对应于选自具有内酯骨架的单体（a）的单体的重复单元的反应单元的光致抗蚀剂聚合物的制造方法，具有通过用酸去除而变得易溶于碱的单体（b）和具有脂环族骨架的单体（c）具有羟基。方法包括（A）含有至少一种选自上述单体（a），（b）和（c）的单体的单体的混合物的聚合，和（B）通过使用有机溶剂和水来分离聚合中形成的聚合物将形成的聚合物转化为有机溶剂层和金属组分杂质进入水层或通过聚合物溶液，其含有对应于上述单体（a），（b）和（c）中的至少一种的重复单元的聚合物，并且金属含量其相对于包含具有阳离子交换基团的多孔聚烯烃膜的聚合物通过过滤器为1000ppb以下。光致抗蚀剂聚合物的金属杂质含量极低。

2. 发明申请

US20100099836A1 PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS 有权
标题翻译：生产光催化剂聚合物的方法
公开(公告)号：US20100099836A1
公开(公告)日：2010-04-22
申请号：US12645842
申请日：2009-12-23
申请人： Hitoshi WATANABE , Hidetaka Hayamizu , Masaaki Kishimura
发明人： Hitoshi WATANABE , Hidetaka Hayamizu , Masaaki Kishimura
IPC分类号： C08F24/00
CPC分类号： C08F220/18 , C08F6/00 , C08F6/02 , C08F6/06 , G03F7/0397
摘要： Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group. The photoresist polymeric compounds have a metallic impurity content that is extremely low.
摘要翻译：具有对应于选自具有内酯骨架的单体（a）的单体的重复单元的反应单元的光致抗蚀剂聚合物的制造方法，具有通过用酸去除而变得易溶于碱的单体（b）和具有脂环族骨架的单体（c）具有羟基。方法包括（A）含有至少一种选自上述单体（a），（b）和（c）的单体的单体的混合物的聚合，和（B）通过使用有机溶剂和水来分离聚合中形成的聚合物将形成的聚合物转化为有机溶剂层和金属组分杂质进入水层或通过聚合物溶液，其含有具有对应于上述单体（a），（b）和（c）中的至少一种的重复单元的聚合物和金属含量其相对于包含具有阳离子交换基团的多孔聚烯烃膜的聚合物通过过滤器为1000ppb以下。光致抗蚀剂聚合物的金属杂质含量极低。

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