会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Wall-wash fixture for directional light sources
    • 定向光源洗墙灯
    • US09234640B2
    • 2016-01-12
    • US13599659
    • 2012-08-30
    • Tony GeraldsMartin Lee
    • Tony GeraldsMartin Lee
    • F21V7/00F21S8/00F21S8/02F21V7/10
    • F21S8/026F21V7/0033F21V7/10
    • A downlight reflector assembly for a light-emitting diode (LED) light source includes a kicker reflector and an upper scoop. The kicker reflector has a reflector wall extending between a small top opening and a large bottom opening along a transverse axis. The reflector wall has an internal surface with an illuminated area and a non-illuminated area. The upper scoop is mounted in the small top opening of the kicker reflector and has a reflective multi-faceted surface with a concave curvature relative to the LED light source. The upper scoop extends from the top opening in part along the transverse axis and covering a portion of the top opening. The multi-faceted surface faces both of the illuminated area of the kicker reflector and the top opening for reflecting light rays received through the top opening towards the illuminated area.
    • 用于发光二极管(LED)光源的筒灯反射器组件包括踢球反射器和上勺。 踢球反射器具有沿着横向轴线在小顶部开口和大的底部开口之间延伸的反射器壁。 反射器壁具有带有照明区域和非照明区域的内表面。 上勺安装在踢球反射器的小顶部开口中,并且具有相对于LED光源具有凹曲率的反射多面面。 上勺从顶部开口部分沿着横向轴线延伸并且覆盖顶部开口的一部分。 多面表面面对踢球反射器的照明区域和顶部开口,用于将通过顶部开口接收的光线反射到照明区域。
    • 8. 发明申请
    • Apparatus for processing a fluid sample
    • 用于处理流体样品的装置
    • US20060011539A1
    • 2006-01-19
    • US10536574
    • 2003-11-28
    • Martin LeeDavid SquirrellMichael BestBrian Croft
    • Martin LeeDavid SquirrellMichael BestBrian Croft
    • C02F3/00
    • B01L3/502B01L2200/0621B01L2200/10B01L2300/0681B01L2300/0864B01L2300/0867B01L2300/1827B01L2400/0478B01L2400/049B01L2400/0605B01L2400/0633G01N1/40
    • This invention relates to an apparatus for an apparatus for processing a fluid sample comprising: (i) a sample processing chamber comprising a fluid inlet and a fluid outlet; (ii) a waste chamber downstream from the sample processing chamber and in fluid communication with the sample processing chamber fluid outlet and wherein the fluid communication between the sample processing chamber outlet and the waste chamber comprises a divergent analyte flow path; (iii) at least two further chambers up stream from the sample processing chamber both of which are in fluid communication with the sample processing chamber fluid inlet; (iv) a means for moving fluid from each of the at least two further chambers through the sample processing chamber and into the waste chamber or into the divergent analyte flow path as desired by applying positive or negative pressure to the desired flow path; and (v) a passive means for restricting the flow of fluid. This invention also relates to a method and use of the same.
    • 本发明涉及一种用于处理流体样品的设备的装置,包括:(i)样品处理室,其包括流体入口和流体出口; (ii)在样品处理室下游并与样品处理室流体出口流体连通的废物室,并且其中样品处理室出口和废物室之间的流体连通包括发散的分析物流动路径; (iii)从样品处理室向上游的至少两个另外的室,二者都与样品处理室流体入口流体连通; (iv)用于通过向期望的流动路径施加正压或负压将流体从所述至少两个另外的室中的每一个移动通过样品处理室并进入废物室或发散分析物流动路径的装置, 和(v)用于限制流体流动的被动装置。 本发明还涉及其方法和用途。
    • 9. 发明申请
    • Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
    • 具有动态隔离框架的定位装置以及设置有这种定位装置的光刻设备
    • US20050002009A1
    • 2005-01-06
    • US10840373
    • 2004-05-07
    • Martin Lee
    • Martin Lee
    • G03F7/20H01L21/68G03B27/58
    • G03F7/70358G03F7/70716G03F7/70833G03F7/709H01L21/68H01L21/682
    • A lithographic device and an exposure method utilize mask and substrate tables, and a projection system. A mask having a mask pattern is provided on the mask table. A substrate having a radiation-sensitive layer is provided on the substrate table. The mask is irradiated to project an image of at least a portion of the mask pattern onto the radiation-sensitive layer of the substrate using the projection system. Before or during the projecting, at least one of the mask and substrate tables is positioned using a drive unit that includes a stationary part coupled to a reaction frame of the lithographic device. A position of at least one of the mask and substrate tables is measured using a measuring system having a plurality of measurement sensors that have a stationary part and a movable part. The movable part of one of the sensors is coupled to the one of the mask table and the substrate table whose position is measured, and the stationary parts of the sensors are coupled to a support frame mechanically isolated from the reaction frame.
    • 光刻设备和曝光方法利用掩模和基板台,以及投影系统。 具有掩模图案的掩模设置在掩模台上。 具有辐射敏感层的基板设置在基板台上。 照射掩模以使用投影系统将至少一部分掩模图案的图像投影到基板的辐射敏感层上。 在投影之前或期间,使用包括耦合到光刻设备的反应框架的固定部分的驱动单元来定位掩模和基板台中的至少一个。 使用具有多个测量传感器的测量系统来测量掩模和衬底台中的至少一个的位置,该测量系统具有静止部分和可移动部分。 传感器之一的可移动部分耦合到掩模台和测量位置的基板台之一,并且传感器的固定部分联接到与反应框架机械隔离的支撑框架上。