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1. 发明授权

US06177874B1 Liquid supplying device for providing chemical solution with a liquid level sensor 失效
标题翻译：用于向液位传感器提供化学溶液的液体供应装置
公开(公告)号：US06177874B1
公开(公告)日：2001-01-23
申请号：US09074057
申请日：1998-05-07
申请人： Ching-Chih Cheng , Wen-Liang Fang , Kuo-Feng Huang , Hung-Lung Ma
发明人： Ching-Chih Cheng , Wen-Liang Fang , Kuo-Feng Huang , Hung-Lung Ma
IPC分类号： G08B2100
CPC分类号： G01F23/2925 , Y10S250/902 , Y10S250/904
摘要： A liquid supplying device comprising a liquid container for storing a liquid so as to supply an external device and a liquid level sensor for detecting the liquid level. As the liquid within the liquid container is gradually used up, liquid level drops. As soon as the remaining liquid in the container drops to a predetermined amount, the liquid level sensor emits a warning signal to the operator, and the operator can then replenish the liquid in the container.
摘要翻译：一种液体供应装置，包括用于存储液体以供应外部装置的液体容器和用于检测液面的液位传感器。随着液体容器内的液体逐渐消耗，液面下降。一旦容器中的剩余液体下降到预定量，液位传感器向操作者发出警告信号，然后操作者可以补充容器中的液体。

2. 发明授权

US5937876A Rinsing system used in a photoresist coater with capability to avoid a reversed pressure effect 有权
标题翻译：用于光刻胶涂布机的冲洗系统具有避免反向压力效应的能力
公开(公告)号：US5937876A
公开(公告)日：1999-08-17
申请号：US185399
申请日：1998-11-03
申请人： Kuei-Hsi Lai , Ching-Chih Cheng , Hung-Lung Ma
发明人： Kuei-Hsi Lai , Ching-Chih Cheng , Hung-Lung Ma
IPC分类号： G03F7/16 , H01L21/00 , B08B3/08
CPC分类号： H01L21/67051 , H01L21/6704 , G03F7/162
摘要： A rinsing system used in a photoresist coater to remove a brim portion of the formed photoresist layer on a substrate. The rinsing system has capability to avoid a reversed pressure effect. The rinsing system includes several distribution ducts, which are coupled to a solvent container. Each duct includes an one-way valve, an automatically-releasing-gas filter, and a pump with sequential couplings from the solvent container. The pump is used to transport solvent to the substrate to rinse the photoresist layer. The pump also induces the reversed pressure effect, which can be avoided by the automatically-releasing-gas filter, the one-way valve, and the solvent container. The one-way valve includes a spring to hold a ball-like stopper of the valve so that the reversed pressure effect is consumed by the spring force. The automatically-releasing-gas filter contains a gas and includes a releasing-gas valve to release the gas. The solvent container also contain a gas with a pressure of about one atmospheric pressure. The reversed pressure effect is reduced by the pressure induced by the gases.
摘要翻译：一种用于光致抗蚀剂涂布机的漂洗系统，用于去除衬底上形成的光致抗蚀剂层的边缘部分。冲洗系统具有避免反向压力作用的能力。冲洗系统包括多个分配管道，其连接到溶剂容器。每个管道包括单向阀，自动释放气体过滤器和具有来自溶剂容器的顺序耦合的泵。泵用于将溶剂输送到基材上以冲洗光致抗蚀剂层。泵还引起反向压力效应，这可以通过自动释放气体过滤器，单向阀和溶剂容器来避免。单向阀包括用于保持阀的球状塞子的弹簧，使得反作用力由弹簧力消耗。自动释放气体过滤器包含气体并且包括释放气体阀以释放气体。溶剂容器还含有压力约为一个大气压的气体。由气体引起的压力会降低反向压力效应。

3. 发明授权

US06295683B1 Equipment for brushing the underside of a semiconductor wafer 失效
标题翻译：用于刷涂半导体晶片下侧的设备
公开(公告)号：US06295683B1
公开(公告)日：2001-10-02
申请号：US09457308
申请日：1999-12-09
申请人： Kuei-Si Lai , Shih-Hsun Chiou , Kuo-Feng Huang , Ching-Chih Cheng
发明人： Kuei-Si Lai , Shih-Hsun Chiou , Kuo-Feng Huang , Ching-Chih Cheng
IPC分类号： B08B104
CPC分类号： B08B1/04 , B08B3/02
摘要： The present invention provides equipment for brushing the underside of a semiconductorwafer that is placed on a rotary wafer chuck. The equipment comprises a brush rod, a brush with a channel in it mounted at an end point of the brush rod, a nozzle for spraying water on the underside of the semiconductor wafer, and a driving device connected to the brush rod for driving the brush rod in a reciprocating motion. The wafer chuck rotates the semiconductor wafer and, simultaneously, water drives the blade and the brush to raise and rotate so as to spray water over the underside of the semiconductor wafer. The driving device drives the brush to brush the underside of the semiconductor wafer along a radial direction of the semiconductor wafer.
摘要翻译：本发明提供了用于刷涂放置在旋转晶片卡盘上的半导体晶片的下侧的设备。该设备包括一个刷杆，一个刷子，其中安装在刷杆端部的通道，用于在半导体晶片的下侧喷水的喷嘴，以及连接到刷杆的驱动装置，用于驱动刷子杆往复运动。晶片卡盘旋转半导体晶片，同时，水驱动叶片和刷子以升高和旋转，以便在半导体晶片的下侧喷射水。驱动装置驱动刷子沿着半导体晶片的径向刷刷半导体晶片的下侧。

4. 发明授权

US6048399A SOG coater nozzle pot 失效
标题翻译： SOG涂布机喷壶
公开(公告)号：US6048399A
公开(公告)日：2000-04-11
申请号：US82949
申请日：1998-05-21
申请人： En-Tien Tan , Ming-Che Yang , Kuo-Feng Huang , Ching-Chih Cheng
发明人： En-Tien Tan , Ming-Che Yang , Kuo-Feng Huang , Ching-Chih Cheng
IPC分类号： B05C5/00 , B05C11/08 , B05C11/10 , H01L21/00 , H01L21/31 , B05C11/02 , B05D3/12
CPC分类号： H01L21/6715 , B05C11/08 , B05C11/10
摘要： A SOG coater nozzle pot includes a pot for containing fluid and letting the fluid in the pot flow out, a funneled nozzle including a wider opening for receiving fluid from the pot and a narrower opening on a protuberance inserted into a duct, and a mounting device for mounting the funneled nozzle on the SOG coater. The nozzle pot according to the invention makes the mounting/dismounting operations of the pot more convenient and less time-consuming. The stability of the SOG coater is maintained as well.
摘要翻译： SOG涂布机喷嘴罐包括用于容纳流体并使罐中的流体流出的罐，包括用于从罐接收流体的较宽开口和在插入管道中的突起上的较窄开口的漏斗喷嘴，以及安装装置用于将漏斗喷嘴安装在SOG涂布机上。根据本发明的喷嘴罐使得罐的安装/拆卸操作更方便和更少耗时。也保持SOG涂布机的稳定性。

5. 发明授权

US06334581B1 Nozzle reposition device used in a resist coating process 失效
标题翻译：用于抗蚀涂层工艺的喷嘴重新定位装置
公开(公告)号：US06334581B1
公开(公告)日：2002-01-01
申请号：US09670386
申请日：2000-09-28
申请人： Kuei-Hsi Lai , Hsi-Huang Lee , Hsien-Jung Hsu , Ching-Chih Cheng
发明人： Kuei-Hsi Lai , Hsi-Huang Lee , Hsien-Jung Hsu , Ching-Chih Cheng
IPC分类号： B05B1508
CPC分类号： B05B15/652 , B05C11/08
摘要： A spray nozzle resetting device comprises a spray nozzle for spraying resist onto a midpoint of a wafer, a rotary robotic arm that has a resist-delivering duct connected to the spray nozzle, a covering nut, a resetting ring, and a fixing ring. The covering nut has an opening of diameter D. The resetting ring has a rotary part of a diameter less than or equal to D, which fits in the opening of the covering nut, and at least two protrusions. The fixing ring, having two recesses that correspond to the two protrusions and interact with them, is used to connect the covering nut and the rotary robotic arm.
摘要翻译：喷嘴复位装置包括用于将抗蚀剂喷射到晶片的中点的喷嘴，具有连接到喷嘴的抗蚀剂输送管道的旋转机器人臂，覆盖螺母，复位环和固定环。覆盖螺母具有直径D的开口。复位环具有直径小于或等于D的旋转部分，其适合于覆盖螺母的开口和至少两个突起。固定环具有对应于两个突起并与之相互作用的两个凹槽，用于连接覆盖螺母和旋转机械臂。

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