专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20110192909A1 Fine droplet atomizer for liquid precursor vaporization 有权
标题翻译：用于液体前体蒸发的细微雾化器
公开(公告)号：US20110192909A1
公开(公告)日：2011-08-11
申请号：US13018689
申请日：2011-02-01
申请人： Benjamin Y.H. Liu , Thuc M. Dinh , Yamin Ma
发明人： Benjamin Y.H. Liu , Thuc M. Dinh , Yamin Ma
IPC分类号： B05B17/04 , B01F3/04
CPC分类号： B05B17/04 , C23C16/4486
摘要： The present disclosure relates to an apparatus and a method for forming a droplet aerosol for vaporization and subsequent thin film deposition on a substrate. The apparatus includes a mechanism to control the rate of liquid flow through the apparatus, the mechanism including a piezoelectric actuator to adjust the rate of liquid flow and an atomizing mechanism drawing gas from a compressed gas source such that when the gas source conjoins with the liquid, the liquid is atomized to form droplets suspended in the gas thereby forming a droplet aerosol suitable for subsequent thin film deposition on a substrate. The method includes drawing a gas from a compressed gas source and drawing a liquid from a liquid source. The liquid and gas are conjoined in either a coaxial flow relationship or a radial flow relationship or an angular relationship between radial and coaxial flow wherein the gas engages the liquid to faun droplets suitable for vaporization and subsequent thin film deposition on a substrate.
摘要翻译：本公开涉及一种用于形成用于蒸发并随后在基板上的薄膜沉积的液滴气溶胶的装置和方法。该装置包括一个控制流过该装置的液体流速的机构，该机构包括用于调节液体流速的压电致动器和从压缩气体源引出气体的雾化机构，使得当气体源与液体结合时，液体被雾化以形成悬浮在气体中的液滴，从而形成适用于随后的薄膜沉积在基底上的液滴气溶胶。该方法包括从压缩气体源抽取气体并从液体源抽取液体。液体和气体以同轴流动关系或径向流动关系或径向和同轴流动之间的角度关系结合，其中气体将液体接合以适应蒸发和随后的薄膜沉积在基底上的液滴。

2. 发明申请

US20090084315A1 METHOD AND APPARATUS FOR PARTICLE FILTRATION AND ENHANCING TOOL PERFORMANCE IN FILM DEPOSITION 有权
标题翻译：膜沉积过程中颗粒过滤和增强工具性能的方法和装置
公开(公告)号：US20090084315A1
公开(公告)日：2009-04-02
申请号：US12235114
申请日：2008-09-22
申请人： Benjamin Y.H. Liu , Yamin Ma , Thuc M. Dinh
发明人： Benjamin Y.H. Liu , Yamin Ma , Thuc M. Dinh
IPC分类号： C23C16/00 , B23P6/00
CPC分类号： C23C16/4402 , Y10T29/4973
摘要： This disclosure pertains to a method and apparatus to permit changing a filter on the input line to a vacuum deposition chamber without breaking or reducing the vacuum for the deposition chamber and other components in the deposition system. Isolation valves are provided at the inlet and outlet of the filter so the filter can be isolated from the source of vacuum and the deposition chamber for removal and replacement of the filter.
摘要翻译：本公开涉及一种允许将输入管线上的过滤器改变为真空沉积室而不破坏或减少沉积室和沉积系统中的其它部件的真空的方法和装置。在过滤器的入口和出口处提供隔离阀，因此过滤器可以与真空源和沉积室隔离，以移除和更换过滤器。

3. 发明申请

US20050147749A1 High-performance vaporizer for liquid-precursor and multi-liquid-precursor vaporization in semiconductor thin film deposition 审中-公开
标题翻译：用于半导体薄膜沉积的液体前体和多液体前体汽化的高性能蒸发器
公开(公告)号：US20050147749A1
公开(公告)日：2005-07-07
申请号：US10769011
申请日：2004-01-30
申请人： Benjamin Liu , Yamin Ma
发明人： Benjamin Liu , Yamin Ma
IPC分类号： B01B1/00 , B05B7/00 , B05B12/14 , C23C16/448 , C23C16/00
CPC分类号： C23C16/4486 , B01B1/005
摘要： A vaporization system for thin film formation and for introducing vapors into a deposition chamber for depositing films onto a semi-conductor surface has a vaporization chamber that is selectively provided with at least two different, separate, precursor liquids carried in a gas stream that may be a single carrier gas, or a selected one of a plurality of carrier gasses. When the liquids being introduced are likely to be subject to thermal decomposition from contact with high temperature surfaces, an atomizer is used at the inlet of the vaporization chamber to provide an aerosol to the vaporization chamber from one or more individual sources of liquid combined with one or more individual carrier gasses for simultaneous or sequential introduction into the vaporization chamber. The vaporization chamber may be designed to insure complete vaporization by incorporating a recirculating gas flow through heated passageways before the vaporized gas/vapor mixture exits the vaporization chamber.
摘要翻译：用于薄膜形成和用于将蒸气引入用于在半导体表面上沉积膜的沉积室的蒸发系统具有蒸发室，其被选择性地设置有携带在气流中的至少两种不同的，分离的前体液体，其可以是单载体气体或多个载气中的选定的一种。当引入的液体可能经受与高温表面接触的热分解时，在蒸发室的入口处使用雾化器以从一个或多个单独的液体源与一个或多个液体组合提供气溶胶到气化室或更多的单个载体气体，用于同时或顺序地引入蒸发室。蒸发室可以被设计成通过在蒸发的气体/蒸气混合物离开蒸发室之前通过加热通道并入循环气流来确保完全蒸发。

4. 发明授权

US08554064B1 Method and apparatus for generating vapor at high rates 有权
标题翻译：用于以高速率产生蒸气的方法和装置
公开(公告)号：US08554064B1
公开(公告)日：2013-10-08
申请号：US13333373
申请日：2011-12-21
申请人： Thuc Dinh , Yamin Ma , Benjamin Y. H. Liu
发明人： Thuc Dinh , Yamin Ma , Benjamin Y. H. Liu
IPC分类号： F22B29/06 , F22B1/28 , A01G13/06 , A61M16/00 , A61H33/06 , B01D3/06 , A47J27/00 , A47J31/00 , F24H1/18 , F24H1/10 , B05B1/24
CPC分类号： F24H1/101 , A61H33/065 , A61M16/18 , A61M2205/3368 , A61M2205/50 , B01D1/08 , F22B1/284 , F22B29/06
摘要： The present disclosure relates to an apparatus and a method for vaporizing a liquid to form vapor preferably in a gas stream. The apparatus includes a composite metal structure, the structure comprising a plurality of passageways for providing heat to vaporize the liquid in the gas stream to form a gas/vapor mixture. A non-corrosive interface lies between the metal structure and the gas/vapor mixture, the interface being chemically inert to the gas/vapor mixture and the structure permitting heat to be conducted rapidly therethrough to vaporize the liquid. The apparatus further includes an inlet for the gas and an inlet for the liquid to be vaporized to flow into the plurality of passageways and an exit through which the gas/vapor mixture exits the apparatus.
摘要翻译：本公开涉及一种用于蒸发液体以优选在气流中形成蒸气的装置和方法。该装置包括复合金属结构，该结构包括多个通道，用于提供热量以蒸发气流中的液体以形成气体/蒸气混合物。非腐蚀性界面位于金属结构和气体/蒸汽混合物之间，界面对气体/蒸汽混合物具有化学惰性，并允许热量迅速通过其中进行蒸发。该装置还包括用于气体的入口和用于待蒸发的液体的入口流入多个通道和出口，气体/蒸气混合物通过该出口离开设备。

5. 发明授权

US08783652B2 Liquid flow control for film deposition 有权
标题翻译：用于膜沉积的液体流量控制
公开(公告)号：US08783652B2
公开(公告)日：2014-07-22
申请号：US13785819
申请日：2013-03-05
申请人： Thuc M. Dinh , Benjamin Y. H. Liu , Yamin Ma
发明人： Thuc M. Dinh , Benjamin Y. H. Liu , Yamin Ma
IPC分类号： F16K31/02 , H01L21/02 , F16K31/122 , F16K7/14
CPC分类号： H01L21/02104 , F16K7/14 , F16K31/007 , F16K31/1221 , Y10T137/0357 , Y10T137/7722 , Y10T137/7759
摘要： An apparatus for controlling liquid flow wherein the apparatus comprises an orifice and an adjacent flexible diaphragm separated from each other by a gap through which a liquid flows. The diaphragm is sufficiently flexible to vary the gap thereby controlling the rate of liquid flowing through the orifice or to provide a positive liquid shutoff of liquid flowing through the orifice. A method for controlling liquid flow through the apparatus comprises flexing said diaphragm to vary a size of the gap to control the rate of liquid flowing through the orifice or to provide a positive liquid shutoff of liquid from flowing through the orifice.
摘要翻译：一种用于控制液体流动的装置，其中所述装置包括通过液体流过的间隙彼此分开的孔和相邻的柔性隔膜。隔膜具有足够的柔性以改变间隙，从而控制流过孔的液体的速率或提供流过孔的液体的正液体截止。用于控制通过该设备的液体流动的方法包括弯曲所述隔膜以改变间隙的尺寸以控制流过孔口的液体的速率或者提供流体通过孔口的液体的正液体截止。

6. 发明申请

US20130233395A1 Liquid flow control for film deposition 有权
标题翻译：用于膜沉积的液体流量控制
公开(公告)号：US20130233395A1
公开(公告)日：2013-09-12
申请号：US13785819
申请日：2013-03-05
申请人： Thuc M. Dinh , Benjamin Y.H. Liu , Yamin Ma
发明人： Thuc M. Dinh , Benjamin Y.H. Liu , Yamin Ma
IPC分类号： H01L21/02
CPC分类号： H01L21/02104 , F16K7/14 , F16K31/007 , F16K31/1221 , Y10T137/0357 , Y10T137/7722 , Y10T137/7759
摘要： An apparatus for controlling liquid flow wherein the apparatus comprises an orifice and an adjacent flexible diaphragm separated from each other by a gap through which a liquid flows. The diaphragm is sufficiently flexible to vary the gap thereby controlling the rate of liquid flowing through the orifice or to provide a positive liquid shutoff of liquid flowing through the orifice. A method for controlling liquid flow through the apparatus comprises flexing said diaphragm to vary a size of the gap to control the rate of liquid flowing through the orifice or to provide a positive liquid shutoff of liquid from flowing through the orifice.
摘要翻译：一种用于控制液体流动的装置，其中所述装置包括通过液体流过的间隙彼此分开的孔和相邻的柔性隔膜。隔膜具有足够的柔性以改变间隙，从而控制流过孔的液体的速率或提供流过孔的液体的正液体截止。用于控制通过该设备的液体流动的方法包括弯曲所述隔膜以改变间隙的尺寸以控制流过孔口的液体的速率或者提供流体通过孔口的液体的正液体截止。

7. 发明申请

US20090293807A1 Apparatus for filtration and gas-vapor mixing in thin film deposition 审中-公开
标题翻译：薄膜沉积过滤和气 - 气混合装置
公开(公告)号：US20090293807A1
公开(公告)日：2009-12-03
申请号：US12471831
申请日：2009-05-26
申请人： Benjamin Y.H. Liu , Yamin Ma , Thuc Dinh
发明人： Benjamin Y.H. Liu , Yamin Ma , Thuc Dinh
IPC分类号： C23C16/00
CPC分类号： B01D46/0027 , C23C16/4402 , F22B1/28
摘要： An apparatus removes particles from a gas/vapor mixture while at the same time improves the uniformity of gas/vapor mixture to create a more uniformly-mixed mixture stream for thin film deposition and semiconductor device fabrication.
摘要翻译：一种装置从气体/蒸气混合物中除去颗粒，同时改善气体/蒸汽混合物的均匀性，以产生用于薄膜沉积和半导体器件制造的更均匀混合的混合物流。

8. 发明授权

US06293157B1 Compensation of coriolis meter motion induced signal 失效
标题翻译：科里奥利仪表运动感应信号的补偿
公开(公告)号：US06293157B1
公开(公告)日：2001-09-25
申请号：US09219301
申请日：1998-12-21
申请人： Yamin Ma , James D. Adams , Thomas J. Brennan
发明人： Yamin Ma , James D. Adams , Thomas J. Brennan
IPC分类号： G01F184
CPC分类号： G01F1/8436 , B05B12/006 , G01F1/84
摘要： The output of a coriolis flow meter is corrected for motion by subtracting the motion portion of the signal from a lookup table or a second dry meter.
摘要翻译：科里奥利流量计的输出通过从查找表或第二干燥计中减去信号的运动部分来进行运动。

9. 发明授权

US5647543A Electrostatic ionizing system 失效
标题翻译：静电电离系统
公开(公告)号：US5647543A
公开(公告)日：1997-07-15
申请号：US380970
申请日：1995-01-31
申请人： Yamin Ma
发明人： Yamin Ma
IPC分类号： B05B5/06 , B05B5/053 , B05B5/025
CPC分类号： B05B5/0535 , B05B5/0533
摘要： An improved electrostatic ionizing system for use in connection with a spray gun, having a conductive needle positioned near the center of the spray gun spray pattern, the needle having a diameter of less than about 250 micrometers and a needle tip sharpened to have a radius of curvature of less than about 50 micrometers, and a second electrode spaced approximately one centimeter from the needle.
摘要翻译：一种用于与喷枪结合使用的改进的静电电离系统，其具有位于喷枪喷射图案的中心附近的导电针，针具有小于约250微米的直径，并且针尖尖锐化以具有半径小于约50微米的曲率，以及与针距离大约一厘米的第二电极。

10. 发明授权

US08728240B2 Apparatus for vapor condensation and recovery 有权
标题翻译：蒸气冷凝和回收装置
公开(公告)号：US08728240B2
公开(公告)日：2014-05-20
申请号：US13680331
申请日：2012-11-19
申请人： Benjamin Y. H. Liu , Thuc M. Dinh , Yamin Ma
发明人： Benjamin Y. H. Liu , Thuc M. Dinh , Yamin Ma
IPC分类号： C23C16/00 , F25B21/02 , F25J1/00
CPC分类号： H01L21/02617 , B01D5/0042 , C23C16/4412 , F25B21/02 , F25B39/04 , F25J1/00 , H01L21/0228
摘要： Methods and apparatus for recovery of precursor vapor from a gas and precursor vapor mixture used in a deposition process. The gas and precursor vapor mixture is passed through a multitude of heat transfer surfaces in a heat conducting housing causing the precursor vapor to condense. The precursor vapor in liquid form is then collected after condensation.
摘要翻译：用于从沉积过程中使用的气体和前体蒸汽混合物中回收前体蒸气的方法和装置。气体和前体蒸气混合物通过导热壳体中的大量传热表面，导致前体蒸汽冷凝。然后在冷凝后收集液体形式的前体蒸气。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式