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    • 1. 发明授权
    • Fast-dump structure for full-frame image sensors with lod antiblooming structures
    • 快速转储结构用于具有防雷结构的全帧图像传感器
    • US06693671B1
    • 2004-02-17
    • US09533051
    • 2000-03-22
    • Eric G. StevensWilliam F. Desjardin
    • Eric G. StevensWilliam F. Desjardin
    • H04N5335
    • H01L29/76816H01L27/14812H01L27/1485H01L27/14887
    • A structure for a fast-dump gate for charge coupled devices that does not require a separate contact to a drain region instead using the existing drain of a lateral overflow drain (LOD) typically used for antiblooming purposes. LOD structures are typically used on full-frame CCD image sensors. By using the LOD as the drain for a fast-dump gate, a separate opening in the gate electrode for the drain contact is avoided, thereby making the structure more compact. Gate control is provided by etching a hole in the CCD gate electrode over the overflow channel region of the LOD structure, and overlaying this with one of the subsequent gate electrode layers. This subsequent gate electrode is then used to control the fast-dump operation. Timing is shown for a two-phase CCD being operated with accumulation-mode clocking. Other types of CCDs and clocking schemes may be used. Another advantage of this structure is that it does not require any additional masking or processing steps when built, using a double electrode CCD process that employs a typical LOD structure.
    • 用于电荷耦合器件的快速转储栅极的结构,其不需要使用通常用于防护目的的侧向溢流漏极(LOD)的现有漏极而不需要与漏极区分离接触。 LOD结构通常用于全帧CCD图像传感器。 通过使用LOD作为快速转储栅极的漏极,避免了用于漏极接触的栅电极中的单独的开口,从而使结构更紧凑。 栅极控制是通过在LOD结构的溢流沟道区域上蚀刻CCD栅电极中的一个孔,并将其与随后的栅电极层之一重叠来提供的。 然后,随后的栅电极用于控制快速转储操作。 显示了使用累加模式时钟运行的两相CCD的时序。 可以使用其他类型的CCD和时钟方案。 这种结构的另一个优点是当使用采用典型的LOD结构的双电极CCD工艺时,它不需要任何额外的掩蔽或处理步骤。