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1. 发明申请

US20130325395A1 CO-OPTIMIZATION OF SCATTEROMETRY MARK DESIGN AND PROCESS MONITOR MARK DESIGN 审中-公开
标题翻译：数字标注设计与过程监控标志设计的优化
公开(公告)号：US20130325395A1
公开(公告)日：2013-12-05
申请号：US13486262
申请日：2012-06-01
申请人： Wenzhan Zhou , Moshe Preil , Zheng Zou
发明人： Wenzhan Zhou , Moshe Preil , Zheng Zou
IPC分类号： G01B11/02 , G06F15/00
CPC分类号： G01B11/02 , G03F7/70625 , G03F7/70683
摘要： An automated method for co-optimizing a scatterometry mark and a process monitoring mark is provided. Embodiments include generating a series of pattern profiles on a photoresist on a wafer; providing the series of pattern profiles, resist process parameters, and scatterometry critical dimension parameters as inputs for a scatterometry measurement; performing scatterometry measurement to generate spectra from the series of pattern profiles; and optimizing a sensitivity precision correlation for the resist process parameter.
摘要翻译：提供了一种用于共同优化散点测量标记和过程监控标记的自动化方法。实施例包括在晶片上的光致抗蚀剂上产生一系列图案轮廓; 提供一系列图案轮廓，抗蚀剂工艺参数和散射关键尺寸参数作为散射测量的输入; 执行散射测量以从所述一系列图案轮廓生成光谱; 并优化抗蚀剂工艺参数的灵敏度精度相关性。

2. 发明申请

US20110157567A1 LIQUID IMMERSION SCANNING EXPOSURE SYSTEM USING AN IMMERSION LIQUID CONFINED WITHIN A LENS HOOD 有权
标题翻译：液体渗透扫描曝光系统使用在镜头内部配置的液体液体
公开(公告)号：US20110157567A1
公开(公告)日：2011-06-30
申请号：US12649212
申请日：2009-12-29
申请人： Wenzhan Zhou , Sia Kim Tan , Lei Yuan , Meisheng Zhou
发明人： Wenzhan Zhou , Sia Kim Tan , Lei Yuan , Meisheng Zhou
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A liquid immersion scanning exposure system utilizes an immersion liquid confined within a watertight lens hood having a base portion formed from a solid optical element. During operation, a bottom portion of a lens assembly is disposed within the immersion liquid and the solid optical element is placed upon a photoresist material or layer (to be patterned). The lens assembly moves laterally through the immersion liquid parallel to the photoresist material. Because the solid optical element separates the immersion liquid from the photoresist material and does not move relative to the photoresist material, the photoresist material does not contact with the immersion liquid and the solid optical element and is not susceptible to damage or scratching by the solid optical element.
摘要翻译：液浸式扫描曝光系统利用限制在具有由固体光学元件形成的基部的防水透镜罩内的浸液。在操作期间，透镜组件的底部设置在浸没液体内，并且固体光学元件被放置在光致抗蚀剂材料或层（待图案化）上。透镜组件横向移动通过平行于光致抗蚀剂材料的浸没液体。由于固体光学元件将浸没液体与光致抗蚀剂材料分离并且不相对于光致抗蚀剂材料移动，所以光致抗蚀剂材料不与浸没液体和固体光学元件接触，并且不易受固体光学元件的损坏或划伤元件。

3. 发明授权

US08572524B2 Statistical optical proximity correction 有权
标题翻译：统计光学邻近校正
公开(公告)号：US08572524B2
公开(公告)日：2013-10-29
申请号：US11943591
申请日：2007-11-21
申请人： Wenzhan Zhou , Liang Choo Hsia , Meisheng Zhou , Zheng Zou
发明人： Wenzhan Zhou , Liang Choo Hsia , Meisheng Zhou , Zheng Zou
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： An optical proximity correction (OPC) model incorporates inline process variation data. OPC is performed by adjusting an input mask pattern with a mask bias derived from the OPC model to correct errors in the input mask pattern.
摘要翻译：光学邻近校正（OPC）模型包含在线过程变化数据。通过使用从OPC模型导出的掩模偏差调整输入掩模图案来校正输入掩模图案中的错误来执行OPC。

4. 发明授权

US08896810B2 Liquid immersion scanning exposure system using an immersion liquid confined within a lens hood 有权
标题翻译：液体浸渍扫描曝光系统使用限制在透镜罩内的浸液
公开(公告)号：US08896810B2
公开(公告)日：2014-11-25
申请号：US12649212
申请日：2009-12-29
申请人： Wenzhan Zhou , Sia Kim Tan , Lei Yuan , Meisheng Zhou
发明人： Wenzhan Zhou , Sia Kim Tan , Lei Yuan , Meisheng Zhou
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A liquid immersion scanning exposure system utilizes an immersion liquid confined within a watertight lens hood having a base portion formed from a solid optical element. During operation, a bottom portion of a lens assembly is disposed within the immersion liquid and the solid optical element is placed upon a photoresist material or layer (to be patterned). The lens assembly moves laterally through the immersion liquid parallel to the photoresist material. Because the solid optical element separates the immersion liquid from the photoresist material and does not move relative to the photoresist material, the photoresist material does not contact with the immersion liquid and the solid optical element and is not susceptible to damage or scratching by the solid optical element.
摘要翻译：液浸式扫描曝光系统利用限制在具有由固体光学元件形成的基部的防水透镜罩内的浸液。在操作期间，透镜组件的底部设置在浸没液体内，并且固体光学元件被放置在光致抗蚀剂材料或层（待图案化）上。透镜组件横向移动通过平行于光致抗蚀剂材料的浸没液体。由于固体光学元件将浸没液体与光致抗蚀剂材料分离并且不相对于光致抗蚀剂材料移动，所以光致抗蚀剂材料不与浸没液体和固体光学元件接触，并且不易受固体光学元件的损坏或划伤元件。

5. 发明申请

US20090179307A1 INTEGRATED CIRCUIT SYSTEM EMPLOYING FEED-FORWARD CONTROL 审中-公开
标题翻译：集成电路系统采用进给控制
公开(公告)号：US20090179307A1
公开(公告)日：2009-07-16
申请号：US12014448
申请日：2008-01-15
申请人： Wenzhan Zhou , Jasper Goh , Hui Peng Koh , Jung Yu Hsieh , Meisheng Zhou
发明人： Wenzhan Zhou , Jasper Goh , Hui Peng Koh , Jung Yu Hsieh , Meisheng Zhou
IPC分类号： H01L23/58 , H01L21/66
CPC分类号： H01L22/12
摘要： An integrated circuit system that includes: providing a substrate and a material layer; measuring a parameter of the material layer; and correlating the thickness of an anti-reflective layer to the measured parameter of the material layer for critical dimension control.
摘要翻译：一种集成电路系统，包括：提供基板和材料层; 测量材料层的参数; 并且将抗反射层的厚度与关键尺寸控制的材料层的测量参数相关联。

6. 发明申请

US20090132992A1 STATISTICAL OPTICAL PROXIMITY CORRECTION 有权
标题翻译：统计光学近似校正
公开(公告)号：US20090132992A1
公开(公告)日：2009-05-21
申请号：US11943591
申请日：2007-11-21
申请人： Wenzhan ZHOU , Liang Choo HSIA , Meisheng ZHOU , Zheng ZOU
发明人： Wenzhan ZHOU , Liang Choo HSIA , Meisheng ZHOU , Zheng ZOU
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： An optical proximity correction (OPC) model incorporates inline process variation data. OPC is performed by adjusting an input mask pattern with a mask bias derived from the OPC model to correct errors in the input mask pattern.
摘要翻译：光学邻近校正（OPC）模型包含在线过程变化数据。通过使用从OPC模型导出的掩模偏差调整输入掩模图案来校正输入掩模图案中的错误来执行OPC。

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