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1. 发明申请

US20140070828A1 METHOD AND APPARATUS FOR MASSIVELY PARALLEL MULTI-WAFER TEST 有权
标题翻译：用于大规模并行多波长测试的方法和装置
公开(公告)号：US20140070828A1
公开(公告)日：2014-03-13
申请号：US13609154
申请日：2012-09-10
申请人： John W. Andberg , Ira H. Leventhal , Matthew W. Losey , Yohannes Desta , Lakshmikanth Namburi , Vincent E. Lopopolo , Sanjeev Grover , Erik Volkerink
发明人： John W. Andberg , Ira H. Leventhal , Matthew W. Losey , Yohannes Desta , Lakshmikanth Namburi , Vincent E. Lopopolo , Sanjeev Grover , Erik Volkerink
IPC分类号： G01R1/073 , G01R35/00 , G01R1/04
CPC分类号： G01R1/073 , G01R1/0408 , G01R31/2891 , G01R31/2893 , G01R35/005
摘要： Disclosed herein is a cost effective, efficient, massively parallel multi-wafer test cell. Additionally, this test cell can be used for both single-touchdown and multiple-touchdown applications. The invention uses a novel “split-cartridge” design, combined with a method for aligning wafers when they are separated from the probe card assembly, to create a cost effective, efficient multi-wafer test cell. A “probe-card stops” design may be used within the cartridge to simplify the overall cartridge design and operation.
摘要翻译：本文公开了一种成本有效，高效，大规模并行的多晶圆测试电池。此外，该测试单元可用于单触地板和多触地应用。本发明使用新颖的“分离式墨盒”设计，结合将晶片与探针卡组件分离时对准的方法，以创建成本有效的，高效的多晶圆测试单元。可以在墨盒内使用“探针卡停止”设计，以简化总体墨盒的设计和操作。

2. 发明授权

US07608367B1 Vitreous carbon mask substrate for X-ray lithography 有权
标题翻译：用于X射线光刻的玻璃碳掩模基板
公开(公告)号：US07608367B1
公开(公告)日：2009-10-27
申请号：US11192797
申请日：2005-07-28
申请人： Georg Aigeldinger , Dawn M. Skala , Stewart K. Griffiths , Albert Alec Talin , Matthew W. Losey , Chu-Yeu Peter Yang
发明人： Georg Aigeldinger , Dawn M. Skala , Stewart K. Griffiths , Albert Alec Talin , Matthew W. Losey , Chu-Yeu Peter Yang
IPC分类号： G03F1/00
CPC分类号： G03F1/22
摘要： The present invention is directed to the use of vitreous carbon as a substrate material for providing masks for X-ray lithography. The new substrate also enables a small thickness of the mask absorber used to pattern the resist, and this enables improved mask accuracy. An alternative embodiment comprised the use of vitreous carbon as a LIGA substrate wherein the VC wafer blank is etched in a reactive ion plasma after which an X-ray resist is bonded. This surface treatment provides a surface enabling good adhesion of the X-ray photoresist and subsequent nucleation and adhesion of the electrodeposited metal for LIGA mold-making while the VC substrate practically eliminates secondary radiation effects that lead to delamination of the X-ray resist form the substrate, the loss of isolated resist features, and the formation of a resist layer adjacent to the substrate that is insoluble in the developer.
摘要翻译：本发明涉及玻璃碳作为基片材料用于提供用于X射线光刻的掩模的用途。新的基板还能够使用用于图案化抗蚀剂的掩模吸收体的小的厚度，并且这使得能够改善掩模精度。一个替代实施例包括使用玻璃碳作为LIGA衬底，其中VC晶片坯料在反应离子等离子体中被蚀刻，之后结合X射线抗蚀剂。该表面处理提供了表面，使得能够良好地粘附X射线光致抗蚀剂并且随后的成核和用于LIGA模制的电沉积金属的粘附，而VC衬底实际上消除了导致X射线抗蚀剂分层的二次辐射效应衬底，孤立的抗蚀剂特征的损失以及与基底相邻的抗蚀剂层的形成，其不溶于显影剂。

3. 发明授权

US06811669B2 Methods and apparatus for improved current density and feature fill control in ECD reactors 有权
公开(公告)号：US06811669B2
公开(公告)日：2004-11-02
申请号：US10215411
申请日：2002-08-08
申请人： David Gonzalez, Jr. , Matthew W. Losey
发明人： David Gonzalez, Jr. , Matthew W. Losey
IPC分类号： C25D500
CPC分类号： C25D17/001 , C25D7/123 , H01L21/2885 , H01L21/76877 , Y10S204/07
摘要： Apparatus and methods are disclosed for electroplating conductive films on semiconductor wafers, wherein field adjustment apparatus is located in a reservoir between a cathode and an anode to influence the electric field used in the plating process. Field adjustment apparatus is presented having one or more apertures, which may be selectively plugged to adjust the electrical fields during plating.

4. 发明授权

US06090206A Throttle valve providing enhanced cleaning 失效
标题翻译：节流阀提供增强的清洁
公开(公告)号：US06090206A
公开(公告)日：2000-07-18
申请号：US954299
申请日：1997-10-20
申请人： Won B. Bang , Matthew W. Losey , Francimar Campana , Srinivas Nemani , Sundar Pichai
发明人： Won B. Bang , Matthew W. Losey , Francimar Campana , Srinivas Nemani , Sundar Pichai
IPC分类号： F16K3/24 , C23C16/455 , C23C16/511 , F16K5/04 , F16K5/12 , F16K51/00 , H01L21/31 , C23C16/00 , F16K5/10
CPC分类号： F16K5/12
摘要： A throttle valve assembly is provided, including a throttle valve housing having a bore therethrough and a throttle valve plug assembly. The throttle valve plug assembly includes a shaft rotatably mounted on the throttle valve housing and a throttle valve plug having a concave cut-out portion. The throttle valve plug is mounted on the shaft within the throttle valve housing and substantially perpendicular to the bore. The throttle valve plug has at least two fully open positions and a closed position.
摘要翻译：提供了一种节气门组件，其包括具有穿过其中的孔的节流阀壳体和节流阀插塞组件。节流阀塞组件包括可旋转地安装在节流阀壳体上的轴和具有凹形切口部分的节流阀塞。节气门塞被安装在节流阀壳体内的轴上且基本上垂直于孔。节流阀塞具有至少两个完全打开位置和关闭位置。

5. 发明授权

US07608174B1 Apparatus and method for electroforming high aspect ratio micro-parts 有权
标题翻译：用于电铸高纵横比微零件的装置和方法
公开(公告)号：US07608174B1
公开(公告)日：2009-10-27
申请号：US11599766
申请日：2006-11-14
申请人： John T. Hachman , Matthew W. Losey , Dorrance E. McLean
发明人： John T. Hachman , Matthew W. Losey , Dorrance E. McLean
IPC分类号： B23H7/26
CPC分类号： C25D17/008 , C25D1/00 , C25D1/003 , C25D1/02 , C25D1/22 , C25D5/18 , C25D17/06
摘要： A fixture is disclosed to more easily affix a workpiece in the proper orientation and spacing with sealed electrical interconnection within an electrochemical plating bath. The workpiece can be any planar metallic or non-metallic substrate such as a silicon wafer commonly used in LIGA or microsystem fabrication. The fixture described allows the workpiece to be submerged deep within an electrolytic cell, facing upwards, and allows easy transfer from one cell to another. The edges, backside, and electrical connections are sealed and protected from the electrolyte.
摘要翻译：公开了一种固定装置，以更容易地将工件以适当的取向和间隔与电化学电镀浴中的密封电互连相连接。工件可以是任何平面的金属或非金属基底，例如通常用于LIGA或微系统制造的硅晶片。所描述的夹具允许工件深深地浸入电解池中，面向上，并且允许容易地从一个单元转移到另一个单元。边缘，背面和电气连接被密封并保护电解质。

6. 发明授权

US09335347B2 Method and apparatus for massively parallel multi-wafer test 有权
标题翻译：用于大规模并行多晶片测试的方法和装置
公开(公告)号：US09335347B2
公开(公告)日：2016-05-10
申请号：US13609154
申请日：2012-09-10
申请人： John W. Andberg , Ira H. Leventhal , Matthew W. Losey , Yohannes Desta , Lakshmikanth Namburi , Vincent E. Lopopolo , Sanjeev Grover , Erik Volkerink
发明人： John W. Andberg , Ira H. Leventhal , Matthew W. Losey , Yohannes Desta , Lakshmikanth Namburi , Vincent E. Lopopolo , Sanjeev Grover , Erik Volkerink
IPC分类号： G01R31/28 , G01R1/04 , G01R1/073 , G01R35/00
CPC分类号： G01R1/073 , G01R1/0408 , G01R31/2891 , G01R31/2893 , G01R35/005
摘要： Disclosed herein is a cost effective, efficient, massively parallel multi-wafer test cell. Additionally, this test cell can be used for both single-touchdown and multiple-touchdown applications. The invention uses a novel “split-cartridge” design, combined with a method for aligning wafers when they are separated from the probe card assembly, to create a cost effective, efficient multi-wafer test cell. A “probe-card stops” design may be used within the cartridge to simplify the overall cartridge design and operation.
摘要翻译：本文公开了一种成本有效，高效，大规模并行的多晶圆测试电池。此外，该测试单元可用于单触地板和多触地应用。本发明使用新颖的“分离式墨盒”设计，结合将晶片与探针卡组件分离时对准的方法，以创建成本有效的，高效的多晶圆测试单元。可以在墨盒内使用“探针卡停止”设计，以简化总体墨盒的设计和操作。

7. 发明授权

US06932951B1 Microfabricated chemical reactor 失效
标题翻译：微型化学反应堆
公开(公告)号：US06932951B1
公开(公告)日：2005-08-23
申请号：US09699873
申请日：2000-10-30
申请人： Matthew W. Losey , Klavs F. Jensen , Martin A. Schmidt
发明人： Matthew W. Losey , Klavs F. Jensen , Martin A. Schmidt
IPC分类号： B01J8/02 , B01J19/00 , B01J35/02
CPC分类号： B01J23/42 , B01J19/0093 , B01J35/0006 , B01J2219/00783 , B01J2219/0081 , B01J2219/00828 , B01J2219/00835 , B01J2219/0086 , B01J2219/00862 , B01J2219/00873 , B01J2219/00889 , B01J2219/00891 , B01J2219/00909 , B01J2219/00961 , B01J2219/00963 , B01J2219/00984 , B01J2219/00995
摘要： A microfabricated chemical reactor includes a plurality of lamina, an inlet port formed in at least one of the lamina, and an outlet port formed in at least one of the lamina. A continuous channel is formed in at least one of the lamina and provides fluid communication between the inlet port and the outlet port. In one configuration of the microfabricated chemical reactor, the reactor includes a particle filter disposed in the continuous channel and formed by one of the lamina, wherein the particle filter restricts flow through the continuous channel and retains catalyst or other particles within the continuous channel.
摘要翻译：微加工化学反应器包括多个薄层，形成在薄层中的至少一个中的入口端口和形成在层片中的至少一个中的出口端口。连续通道形成在至少一个层板中，并且在入口和出口之间提供流体连通。在微制造化学反应器的一种构造中，反应器包括设置在连续通道中并由层板之一形成的颗粒过滤器，其中颗粒过滤器限制通过连续通道的流动并将催化剂或其它颗粒保持在连续通道内。

8. 发明授权

US06776688B2 Real-time polishing pad stiffness-control using magnetically controllable fluid 有权
标题翻译：使用磁力控制流体实时抛光垫刚度控制
公开(公告)号：US06776688B2
公开(公告)日：2004-08-17
申请号：US10274082
申请日：2002-10-21
申请人： Andrew T. Kim , Christopher L. Borst , Matthew W. Losey
发明人： Andrew T. Kim , Christopher L. Borst , Matthew W. Losey
IPC分类号： B24B31112
CPC分类号： B24B37/26 , B24B1/005 , H01L21/3212
摘要： A method of CMP polishing of a semiconductor wafer is described that includes using a polishing pad on a platen/table with the polishing pad including a sub-pad containing pockets of magnetorheological fluid. The stiffness of the sub-pad is controlled by selectively applying a magnetic field at selective pockets containing magnetorheological fluid to change the viscosity of the magnetorheological fluid. The changing stiffness increases the polishing rate of the pad in the areas of the magnetic field.
摘要翻译：描述了一种半导体晶片的CMP抛光方法，其包括在抛光垫上使用抛光垫，抛光垫包括含有磁流变流体袋的子垫。通过在包含磁流变流体的选择性袋中选择性地施加磁场来改变磁流变流体的粘度来控制子垫的刚度。改变的刚度增加了焊盘在磁场区域中的抛光速率。

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