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1. 发明授权

US07664310B2 Advanced phase shift inspection method 有权
标题翻译：先进的相移检测方法
公开(公告)号：US07664310B2
公开(公告)日：2010-02-16
申请号：US11023136
申请日：2004-12-27
申请人： David G. Emery
发明人： David G. Emery
IPC分类号： G06K9/00 , G01N21/00
CPC分类号： G03F1/26 , G01N21/95607 , G03F1/72 , G03F1/84
摘要： A method and apparatus for inspecting patterned transmissive substrates, such as photomasks, for unwanted particles and features occurring on the transmissive as well as pattern defects. A transmissive substrate is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and reflected light collection optics and detectors collect and generate signals representative of the light transmitted and reflected by the substrate. The defect identification of the substrate is performed using only those transmitted and reflected light signals, and other signals derived from them, such as greyscale representations and image features. Defect identification is performed using a pattern inspection algorithm by comparing image feature representations of the present substrate with an idealized representation thereof, and using an advanced phase shift algorithm that accounts for particular types of expected anomalies.
摘要翻译：用于检查图案化的透射基底（例如光掩模）用于不期望的颗粒和发生在透射以及图案缺陷上的特征的方法和装置。透射式衬底由激光器通过由激光扫描系统，单独透射和反射光收集光学器件组成的光学系统照射，并且检测器收集和产生表示由衬底透射和反射的光的信号。仅使用透射和反射光信号以及从其衍生的其它信号（例如灰度表示和图像特征）来执行衬底的缺陷识别。通过将本底物的图像特征表示与其理想化表示进行比较，并且使用考虑特定类型的预期异常的高级相移算法，使用模式检验算法执行缺陷识别。

2. 发明授权

US06836560B2 Advanced phase shift inspection method 有权
标题翻译：先进的相移检测方法
公开(公告)号：US06836560B2
公开(公告)日：2004-12-28
申请号：US09991327
申请日：2001-11-09
申请人： David G. Emery
发明人： David G. Emery
IPC分类号： G06K900
CPC分类号： G03F1/26 , G01N21/95607 , G03F1/72 , G03F1/84
摘要： A method and apparatus for inspecting patterned transmissive substrates, such as photomasks, for unwanted particles and features occurring on the transmissive as well as pattern defects. A transmissive substrate is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and reflected light collection optics and detectors collect and generate signals representative of the light transmitted and reflected by the substrate. The defect identification of the substrate is performed using only those transmitted and reflected light signals, and other signals derived from them, such as greyscale representations and image features. Defect identification is performed using a pattern inspection algorithm by comparing image feature representations of the present substrate with an idealized representation thereof, and using an advanced phase shift algorithm that accounts for particular types of expected anomalies.
摘要翻译：用于检查图案化的透射基底（例如光掩模）用于不期望的颗粒和发生在透射以及图案缺陷上的特征的方法和装置。透射式衬底由激光器通过由激光扫描系统，单独透射和反射光收集光学器件组成的光学系统照射，并且检测器收集和产生表示由衬底透射和反射的光的信号。仅使用透射和反射光信号以及从其衍生的其它信号（例如灰度表示和图像特征）来执行衬底的缺陷识别。通过将本底物的图像特征表示与其理想化表示进行比较，并且使用考虑特定类型的预期异常的高级相移算法，使用模式检验算法执行缺陷识别。

3. 发明授权

US06282309B1 Enhanced sensitivity automated photomask inspection system 失效
标题翻译：增强灵敏度自动光掩模检测系统
公开(公告)号：US06282309B1
公开(公告)日：2001-08-28
申请号：US09087318
申请日：1998-05-29
申请人： David G Emery
发明人： David G Emery
IPC分类号： G06K900
CPC分类号： G06T7/001 , G01N21/95607 , G06T2207/30148
摘要： A method and apparatus for inspecting patterned transmissive substrates, such as photomasks and particularly embedded phase shift photomasks, for unwanted particles and features occurring on the transmissive as well as pattern defects. A transmissive substrate is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and reflected light collection optics and detectors collect and generate signals representative of the light transmitted and reflected by the substrate as the substrate is scanned repeatedly in one axis in a serpentine pattern by a laser beam which is focused on the patterned substrate surface. The defect identification of the substrate is performed using only those transmitted and reflected light signals, and other signals derived from them, such as greyscale representations and image features. Defect identification is performed using a pattern inspection algorithm by comparing image feature representations of the present substrate with an idealized representation thereof.
摘要翻译：一种用于检查图案化的透射基板的方法和装置，例如光掩模和特别是嵌入式相移光掩模，用于在透射以及图案缺陷上出现的不想要的颗粒和特征。透射基板由激光器通过包括激光扫描系统，单独透射和反射光收集光学器件的光学系统照射，并且检测器收集并产生代表由基板传输和反射的光的信号，因为基板被重复扫描通过聚焦在图案化衬底表面上的激光束以蛇形图案。仅使用透射和反射光信号以及从其衍生的其它信号（例如灰度表示和图像特征）来执行衬底的缺陷识别。通过将本基板的图像特征表示与其理想化表示进行比较，使用图案检查算法执行缺陷识别。

4. 发明授权

US5563702A Automated photomask inspection apparatus and method 失效
标题翻译：自动光掩模检查装置及方法
公开(公告)号：US5563702A
公开(公告)日：1996-10-08
申请号：US274310
申请日：1994-07-13
申请人： David G. Emery , Zain K. Saidin , Mark J. Wihl , Tao-Yi Fu , Marek Zywno , Damon F. Kvamme , Michael E. Fein
发明人： David G. Emery , Zain K. Saidin , Mark J. Wihl , Tao-Yi Fu , Marek Zywno , Damon F. Kvamme , Michael E. Fein
IPC分类号： G01B11/30 , G01N21/88 , G01N21/93 , G01N21/94 , G01N21/956 , G03F1/00 , H01L21/027 , H01L21/66
CPC分类号： G03F1/84 , G01N21/95607 , G01N2021/95676
摘要： A method and apparatus for inspecting patterned transmissive substrates, such as photomasks, for unwanted particles and features occurring on the transmissive, opaque portions and at the transition regions of the opaque and transmissive portions of the substrate. A transmissive substrate is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and reflected light collection optics and detectors collect and generate signals representative of the light transmitted and reflected by the substrate as the substrate is scanned repeatedly in one axis in a serpentine pattern by a laser beam which is focused on the patterned substrate surface. The defect identification of the substrate is performed using only those transmitted and reflected light signals, and other signals derived from them, such as the second derivative of each of them. The actual defect identification is then performed by comparing combinations of at least two of those measured and derived signals. Simultaneously, defect and particle inspection using the same measured transmitted and reflected light signals. Additionally, phase shift and line widths on the substrate can also be performed simultaneously using the same transmitted light signal that is collected for defect analysis.
摘要翻译：一种用于检查图案化的透射基底（例如光掩模）用于不期望的颗粒和特征的方法和装置，其出现在基底的不透明部分和透射部分的透射性不透明部分和过渡区域上。透射基板由激光器通过包括激光扫描系统，单独的透射和反射光收集光学器件的光学系统照射，并且检测器收集并产生代表由衬底透射和反射的光的信号，因为衬底被一次扫描通过聚焦在图案化衬底表面上的激光束以蛇形图案。仅使用透射和反射光信号以及从它们得到的其他信号（例如它们的二次导数）来执行衬底的缺陷识别。然后通过比较这些测量和导出的信号中的至少两个的组合来执行实际的缺陷识别。同时，使用相同测量的透射和反射光信号进行缺陷和粒子检测。此外，基板上的相移和线宽也可以使用用于缺陷分析收集的相同的透射光信号同时进行。

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