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    • 7. 发明公开
    • 유기 TFT 어레이 기판 및 그 제조 방법
    • 有机TFT阵列基板及其制造方法
    • KR1020120131120A
    • 2012-12-04
    • KR1020120055575
    • 2012-05-24
    • 보에 테크놀로지 그룹 컴퍼니 리미티드
    • 장쉬에후이
    • H01L51/05H01L51/40
    • H01L51/0541H01L27/283H01L51/0018H01L51/102H01L51/107
    • PURPOSE: An organic TFT array substrate and a manufacturing method thereof are provided to simplify a manufacturing process of the organic thin film transistor array substrate by forming a pixel electrode, a source electrode, a drain electrode, and a data line in the same patterning process. CONSTITUTION: A first patterning process is performed to form a first pixel electrode, a source electrode, a drain electrode, and a data line. A second patterning process is performed to form an organic semiconductor island and a gate insulation island. A third patterning process is performed to form a data pad region. A fourth patterning process is performed to form a second pixel electrode, a gate electrode, and a gate line. [Reference numerals] (AA) Successively depositing a transparent conductive layer and a source-drain metal layer and performing a first patterning process to form a first pixel electrode, a source electrode, a drain electrode, and a data line; (BB) Performing a second patterning process to form an organic semiconductor island and a gate insulation island; (CC) Depositing a passivation layer and performing a third patterning process to form a data pad region; (DD) Successively depositing a second transparent conductive layer and a gate metal layer and performing a fourth patterning process to form a second pixel electrode, a gate electrode, and a gate line
    • 目的:提供一种有机TFT阵列基板及其制造方法,以通过在相同的图案化工艺中形成像素电极,源电极,漏电极和数据线来简化有机薄膜晶体管阵列基板的制造工艺 。 构成:执行第一图案化处理以形成第一像素电极,源电极,漏电极和数据线。 执行第二图案化处理以形成有机半导体岛和栅绝缘岛。 执行第三图案化处理以形成数据区域。 执行第四图案化处理以形成第二像素电极,栅极电极和栅极线。 (附图标记)(AA)连续地沉积透明导电层和源极 - 漏极金属层,并执行第一图案化工艺以形成第一像素电极,源电极,漏电极和数据线; (BB)执行第二图案化工艺以形成有机半导体岛和栅绝缘岛; (CC)沉积钝化层并执行第三图案化工艺以形成数据焊盘区域; (DD)连续沉积第二透明导电层和栅极金属层,并执行第四图案化工艺以形成第二像素电极,栅电极和栅极线