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    • 6. 发明授权
    • 광 리소그래피에 기초한 극저밀도 3차원 박막 구조체의 제조방법
    • 基于光刻技术的超低密度三维薄膜结构的织构方法
    • KR101341216B1
    • 2014-01-07
    • KR1020120136917
    • 2012-11-29
    • 전남대학교산학협력단
    • 강기주한승철이민근
    • G03F7/26G03F7/20H01L21/027
    • B29C41/003B22C9/12B22C9/22B22D25/02B28B1/30B28B11/12B29C35/0266B29C35/0805B29C35/0888B29C35/0894B29C41/02B29C2035/0827B29L2031/757B29L2031/772G03F7/0035G03F7/0037G03F7/2051G03F7/20G03F7/26H01L21/0274
    • The present invention relates to a manufacturing method for an ultralow density three-dimensional thin film structure based on an optical lithography. The manufacturing method for an ultralow density three-dimensional thin film structure consisting of solid thin films comprises: a step of hardening a part of a resin bulk by irradiating a liquid phase photosensitive resin bulk with the ultraviolet rays of different patterns in predetermined directions; a step of forming a solid phase photosensitive resin structure by removing the liquid phase photosensitive resin which is not hardened; a step of laminating the surface of the solid phase photosensitive resin structure with a thin film; a step of exposing the solid phase photosensitive resin by removing the thin film formed on the outer surface of the resin bulk; and a step of removing the solid phase photosensitive resin structure. Each of the different patterns has a structure in which predetermined polygonal shapes are alternatively arranged. The solid phase photosensitive resin structure has a structure in which multiple prismatic members are crossed. The ultralow density three-dimensional thin film structure consisting of the solid thin films has a structure, in which porous polyhedral unit cells having a plane element are interconnected and are repeatedly formed, and is characterized by being formed in an intaglio method about the solid phase photosensitive resin structure. [Reference numerals] (AA) Liquid phase photosensitive resin; (BB) Autocatalyst plating; (CC) Plated intaglio kagome; (DD) Hexagonal mask; (EE) 3D exposure; (FF) Liquid phase + Solid phase; (GG) External polishing; (HH) Internal solid phase resin exposure; (II) Liquid phase resin removal; (JJ) Resin etching; (KK) Intaglio kagome; (LL) Very low density metal
    • 本发明涉及一种基于光刻法的超低密度三维薄膜结构的制造方法。 由固体薄膜构成的超低密度立体薄膜结构体的制造方法包括以下步骤:通过用预定方向的不同图案的紫外线照射液相感光性树脂体来硬化部分树脂体; 通过除去未硬化的液相光敏树脂形成固相感光树脂结构的步骤; 用薄膜层叠固相感光性树脂结构体的表面的工序; 通过除去形成在树脂体的外表面上的薄膜来曝光固相感光树脂的步骤; 以及除去固相感光性树脂结构的工序。 每个不同的图案具有交替地布置预定多边形形状的结构。 固相感光树脂结构具有多个棱柱构件交叉的结构。 由固体薄膜组成的超低密度三维薄膜结构具有结构,其中具有平面元件的多孔多面体单元电池互连并重复形成,其特征在于以固相的凹版方式形成 光敏树脂结构。 (标号)(AA)液相光敏树脂; (BB)自动催化剂电镀; (CC)镀铝凹版; (DD)六角面罩; (EE)3D曝光; (FF)液相+固相; (GG)外部抛光; (HH)内固相树脂曝光; (二)液相树脂去除; (JJ)树脂蚀刻; (KK)Intaglio kagome; (LL)极低密度金属