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    • 1. 发明公开
    • Polishing pad having multi property and its manufacturing method
    • 具有多种物业的抛光垫及其制造方法
    • KR20100109161A
    • 2010-10-08
    • KR20090027617
    • 2009-03-31
    • MICRO CHEMICAL KOREA CO LTD
    • MOON DEOG JUCHUN YUN JINBAE JANG HOHAN GEUM SIK
    • B24D7/14B24D7/06B24D11/04
    • B24D7/14B24D18/0009B24D2203/00
    • PURPOSE: A polishing pad having multi properties and a manufacturing method thereof are provided to evenly polish the entire surface of a work piece by reducing the variation of the polishing force in the radial direction. CONSTITUTION: A polishing pad(10) for polishing a surface of a work piece by the rotation thereof comprises two or more polishing members(11a,11b,11c). The polishing members have different properties and are alternately arranged. A method for manufacturing the polishing pad comprises steps of: forming upper and lower molds having spaces for forming polishing pads, successively injecting two or more different kinds of resin between the upper and lower molds, opening the upper and lower molds and removing the polishing pads after solidification of resin, and buffing the polishing surfaces of the polishing pads.
    • 目的:提供具有多种特性的抛光垫及其制造方法,以通过减小径向抛光力的变化来均匀地抛光工件的整个表面。 构成:用于通过旋转抛光工件表面的抛光垫(10)包括两个或更多个抛光构件(11a,11b,11c)。 抛光构件具有不同的特性并且交替布置。 制造抛光垫的方法包括以下步骤:形成具有用于形成抛光垫的间隔的上模具和下模具,在上模和下模之间依次注入两种或多种不同种类的树脂,打开上下模具并移除抛光垫 在树脂固化之后,并抛光抛光垫的抛光表面。