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    • 2. 发明公开
    • 유전체 세라믹스 후막 및 그 제조방법
    • 电介质陶瓷薄膜及其制造方法
    • KR1020110001688A
    • 2011-01-06
    • KR1020090059343
    • 2009-06-30
    • 한국세라믹기술원
    • 김효태윤영준김종희김지훈이은혜
    • H01B3/12C04B35/00H01G4/018
    • PURPOSE: A dielectric ceramics thick film is provided to improve dielectric constant and dielectric loss property and to ensure stable temperature characteristic by depositing an AgNbO3 composition and/or an AgTaO3 composition by aerosol deposition. CONSTITUTION: A dielectric ceramics thick film comprises a mixture of one or two selected from an AgNbO3 composition and/or an AgTaO3 composition. A method for preparing the dielectric ceramics thick comprises the steps of: preparing each ceramic powder of the AgNbO3 composition and/or AgTaO3 composition; and making one powder or a powder mixture of two selected from two ceramic powders in order to become aerosol and then spraying the resultant on a substrate.
    • 目的:提供介电陶瓷厚膜以提高介电常数和介电损耗特性,并通过气溶胶沉积沉积AgNbO3组合物和/或AgTaO3组合物来确保稳定的温度特性。 构成:介电陶瓷厚膜包含选自AgNbO 3组合物和/或AgTaO 3组合物中的一种或两种的混合物。 制备电介质陶瓷厚的方法包括以下步骤:制备AgNbO 3组合物和/或AgTaO 3组合物的每种陶瓷粉末; 并制备一种粉末或两种选自两种陶瓷粉末的粉末混合物,以便成为气溶胶,然后将所得物料喷涂在基材上。