会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明公开
    • 내마모성 박막 코팅
    • 耐磨损涂层
    • KR1020060115662A
    • 2006-11-09
    • KR1020060040671
    • 2006-05-04
    • 쎄코 툴스 에이비
    • 라르손토뮈칼손렌나르트
    • C22C27/00
    • C23C30/00C23C14/0641C23C28/042C23C28/044C23C28/048
    • A coating comprising one or more layers containing an h-MeX phase to be coated on a cutting tool for machining by chip removal, and a method for depositing layers containing an h-MeX phase using PVD(physical vapor deposition) technology are provided. In a cutting tool insert, solid end mill, or drill, comprising a substrate and a coating comprising one or more layers of refractory compounds, a cutting tool is characterized in that: the one or more layers comprise crystalline hexagonal phase, h-(Me1,Me2)X, represented by the composition Me1aMe21-aXb, wherein Me1 is one or more of elements selected from V, Cr, Nb and Ta, Me2 is one or more elements selected from Ti, Zr, Hf, Al and Si, a>0.5, and X is one or more elements selected from N, C, O and B, a ratio R=(%X)/(%Me1+%Me2) of Me1aMe21-aXb phase is from 0.5 to 1.0, preferably from 0.75 to 1.0; and X comprises 30% or less of O+B, wherein an X-ray diffraction(XRD) pattern in theta-2theta and/or gracing incidence geometry from the crystalline hexagonal phase, h-(Me1,Me2)X, shows one or more of the following peaks: -h-(Me1,Me2)X (100) peak, -h-(Me1,Me2)X (101) peak, -h-(Me1,Me2)X (102) peak, -h-(Me1,Me2)X (110) peak, -h-(Me1,Me2)X (103) peak, -h-(Me1,Me2)X (112) peak, -h-(Me1,Me2)X (201) peak, and -h-(Me1,Me2)X (202) peak.
    • 提供了包含一层或多层包含要涂覆在用于通过芯片去除进行机械加工的切削工具上的h-MeX相的层,以及使用PVD(物理气相沉积)技术沉积含有h-MeX相的层的方法。 在包括基材和包含一层或多层耐火化合物的涂层的切削工具插入件,固体端铣刀或钻头中,切削工具的特征在于:所述一个或多个层包含结晶六方相h-(Me1 ,Me2)X,由Me1aMe21-aXb组成,其中Me1是选自V,Cr,Nb和Ta中的一种或多种元素,Me2是选自Ti,Zr,Hf,Al和Si中的一种或多种元素, > 0.5,X是选自N,C,O和B中的一种或多种元素,Me1aMe21-aXb相的比例R =(%X)/(%Me1 +%Me2)为0.5〜1.0,优选为0.75〜 1.0; 并且X包含30%或更少的O + B,其中θ-2θ中的X射线衍射(XRD)图案和/或晶状六方相h-(Me1,Me2)X的起球几何形状显示一个或 以下峰:-h-(Me1,Me2)X(100)峰,-h-(Me1,Me2)X(101)峰,-h-(Me1,Me2)X(102)峰,-h - (Me1,Me2)X(110)峰,-h-(Me1,Me2)X(103)峰,-h-(Me1,Me2)X(112)峰,-h-(Me1,Me2) 201)峰,和-h-(Me1,Me2)X(202)峰。