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    • 1. 发明公开
    • 수소가스 제거수단을 구비한 전기도금장치 및 이를 이용한전기도금방법
    • 使用氢气除去装置的电镀装置及使用其的电镀方法
    • KR1020040024883A
    • 2004-03-24
    • KR1020020055232
    • 2002-09-12
    • 동진피엔아이산업 주식회사
    • 박기태
    • C25D17/00
    • PURPOSE: An electroplating apparatus is provided in which hydrogen gas removing means is installed to physically remove hydrogen gas generated on the surface of an object to be plated during electroplating, and an electroplating method using the same is provided. CONSTITUTION: In an electroplating apparatus(1) comprising a plating pot(3) which is equipped with anode electrodes(11a,11b) and stationary stand(14), and in which electrolyte(2) is contained, wherein the stationary stand stations racks(3) to which objects to be processed(12) are supported; and a power supply part for supplying power source to the plating pot, the electroplating apparatus comprises a hydrogen gas removing means(20) for sending a plurality of fine air bubbles to the object to be processed from a lower part of the plating pot to remove hydrogen gas generated on the plating surface of the object to be processed during electrolysis reaction, and the hydrogen gas removing means comprises a blower(22) installed at an outer side of the plating pot; and a bubble discharge part(24) connected to the blower by pipeline(23) and positioned under the plating pot so that the bubble discharge part discharges air bubbles through a plural pores(24a,24b) formed at the bubble discharge part itself, wherein at least one or more plies of microfiber(25) are surroundingly fixed to the outer circumferential surface of the bubble discharge part to micronize size of bubbles coming out of the plural pores.
    • 目的:提供一种电镀设备,其中安装氢气去除装置以物理去除在电镀过程中待镀物体的表面上产生的氢气,并提供使用其的电镀方法。 构成:在包括装有阳极电极(11a,11b)和固定支架(14)的电镀锅(3)的电镀设备(1)中,其中容纳有电解液(2),其中固定支架架 (3)被支撑物体(12); 以及用于向电镀槽供电的供电部件,电镀设备包括氢气去除装置,用于从电镀锅的下部向被处理物体发送多个细小的气泡以除去 在电解反应期间在待处理物体的电镀面上产生的氢气,氢气除去机构包括安装在电镀锅的外侧的鼓风机(22) 以及气泡排出部分(24),其通过管道(23)连接到鼓风机并且位于电镀锅下方,使得气泡排出部分通过形成在气泡排出部分本身的多个孔(24a,24b)排出气泡,其中 至少一层或多层微纤维(25)周围固定在气泡排出部分的外圆周表面上,从而微细化从多孔中出来的气泡的尺寸。
    • 3. 发明授权
    • 폐기물 건조 시스템
    • 废物干燥系统
    • KR101558459B1
    • 2015-10-12
    • KR1020150031055
    • 2015-03-05
    • 롯데건설 주식회사(주)정석이엔씨지에스네오텍(주)(주) 엠엔이엔티동진피엔아이산업 주식회사
    • 이주호이준서김진우이명교최연풍손재동
    • F26B3/04F26B11/04F26B17/18F26B23/10F26B21/00
    • F26B3/04F26B11/04F26B17/18F26B21/005F26B23/10F26B2200/04
    • 본발명에의한폐기물건조시스템은, 건조실을갖는건조드럼과, 내부에유로가형성된샤프트와샤프트의외측면에결합되는복수의패들을구비하고건조실의폐기물을교반하면서건조드럼의건조폐기물배출부쪽으로이송하기위해건조실에설치되는패들샤프트와, 스팀을만들어패들샤프트의유로에공급하는스팀보일러와, 패들샤프트의유로에생성되는응축수를저장하는응축수탱크와, 패들샤프트와스팀보일러사이에설치되는스팀이젝터와, 응축수탱크와스팀이젝터를연결하는리턴관을포함한다. 스팀이젝터는스팀보일러에서공급되는스팀이분사되는분사부와, 분사부에서분사되는스팀의유동에의해압력이감소될수 있도록분사부와연결되는흡입부와, 분사부에서분사되는스팀과흡입부에서흡입되는유체가혼합된혼합유체를패들샤프트의유로로공급하는확산부를갖는다. 리턴관은스팀이젝터의흡입부에발생하는흡입압력이응축수탱크에전해짐으로써응축수탱크의응축수가재증발하여스팀이젝터의흡입부로리턴될수 있도록응축수탱크와스팀이젝터의흡입부를연결한다.
    • 本发明提供一种废料干燥系统。 废料干燥系统包括:干鼓; 桨轴; 蒸汽锅炉 冷凝水箱; 蒸汽喷射器 和回流管。 干鼓有一个干燥的房间。 桨轴包括具有形成在其内部的流动通道的轴和耦合到轴的外表面的多个桨叶,并且安装在干燥室上以将干燥的废料转移到排出部分,同时搅拌废物 干燥的房间。 蒸汽锅炉产生蒸汽并将蒸汽提供给桨轴的流动通道。 冷凝水箱存储在桨叶的流动通道中产生的冷凝水。 蒸汽喷射器安装在桨轴和蒸汽锅炉之间。 回水管将冷凝水箱与蒸汽喷射器相连。 蒸汽喷射器包括:喷射部分; 抽吸部分 和扩散部分。 喷雾部分喷射蒸汽锅炉提供的蒸汽。 抽吸部分连接到喷射部分,以便由于喷射部分喷射的蒸汽的流动而使压力降低。 扩散部分提供混合流体,其中从喷射部分喷射的流与由抽吸部分吸入的流体混合到桨轴的流动通道。 返回管将冷凝水箱连接到蒸汽喷射器的吸入部分,使得在喷射器的吸入部分中产生的吸入压力被转移到冷凝水箱,以使冷凝水箱的冷凝水再蒸发 并返回蒸汽喷射器的吸入部分。
    • 5. 发明授权
    • 수소가스 제거수단을 구비한 전기도금장치 및 이를 이용한전기도금방법
    • 수소가스제거수단을구비한전기도금장치및이를이용한전기도금방
    • KR100462994B1
    • 2004-12-23
    • KR1020020055232
    • 2002-09-12
    • 동진피엔아이산업 주식회사
    • 박기태
    • C25D17/00
    • PURPOSE: An electroplating apparatus is provided in which hydrogen gas removing means is installed to physically remove hydrogen gas generated on the surface of an object to be plated during electroplating, and an electroplating method using the same is provided. CONSTITUTION: In an electroplating apparatus(1) comprising a plating pot(3) which is equipped with anode electrodes(11a,11b) and stationary stand(14), and in which electrolyte(2) is contained, wherein the stationary stand stations racks(3) to which objects to be processed(12) are supported; and a power supply part for supplying power source to the plating pot, the electroplating apparatus comprises a hydrogen gas removing means(20) for sending a plurality of fine air bubbles to the object to be processed from a lower part of the plating pot to remove hydrogen gas generated on the plating surface of the object to be processed during electrolysis reaction, and the hydrogen gas removing means comprises a blower(22) installed at an outer side of the plating pot; and a bubble discharge part(24) connected to the blower by pipeline(23) and positioned under the plating pot so that the bubble discharge part discharges air bubbles through a plural pores(24a,24b) formed at the bubble discharge part itself, wherein at least one or more plies of microfiber(25) are surroundingly fixed to the outer circumferential surface of the bubble discharge part to micronize size of bubbles coming out of the plural pores.
    • 目的:提供一种电镀装置,其中安装氢气去除装置以物理去除在电镀期间在被镀物体的表面上产生的氢气,并提供一种使用该装置的电镀方法。 本发明涉及一种电镀装置(1),该电镀装置(1)包括装配有阳极电极(11a,11b)和固定支架(14)并且包含电解质(2)的电镀槽(3),其中固定支架台 (3)支撑待加工物体(12); 以及用于向电镀锅供应电源的电源部分,电镀装置包括氢气清除装置(20),用于将多个微小气泡从电镀锅的下部送入待处理的物体以去除 在电解反应过程中在待处理物体的电镀表面上产生的氢气,氢气去除装置包括安装在电镀锅外侧的鼓风机(22) 以及通过管道(23)与送风机连接并定位在电镀锅下方的气泡排出部分(24),使得气泡排出部分通过在气泡排出部分自身形成的多个孔(24a,24b)排出气泡,其中 至少一层或多层微纤维(25)环绕地固定在气泡排出部分的外圆周表面上,以使从多个气孔中出来的气泡的尺寸微细化。
    • 6. 发明授权
    • 유전체로 사용한 소재에 전도체 물질을 형성하는 무전해도금방법
    • 电路电路的电镀方法
    • KR100856687B1
    • 2008-09-04
    • KR1020070122725
    • 2007-11-29
    • 동진피엔아이산업 주식회사이상진
    • 이상진
    • C23C18/16C23C18/54
    • An electroless plating method for forming a conductor substance on a workpiece used as a dielectric is provided to consider RF(Radio Frequency) characteristics of the antenna and uniformly forming a plating layer on a surface of the antenna when plating an antenna for a cellular phone. An electroless plating method for forming a conductor substance on a workpiece used as a dielectric comprises a pre-treatment process, an electroless plating process, a post-treatment process, and a cleaning and drying process, wherein: the pre-treatment process comprises a supersonic degreasing step, an activating step, a first catalyst activating step, and a second catalyst activating step; the supersonic degreasing step is performed by washing the plating object after immersing a plating object obtained by performing an LDS(Laser Direct Structuring) process on a PBT/PET(Polybutylene terephthalate/Polyethylene terephthalate) workpiece into a treatment solution with a temperature of 40 to 50 deg.C as an aqueous supersonic cleanser solution with a concentration of 5 to 30% by weight for 30 seconds to 2 minutes; the activating step is performed by washing the plating object after immersing the plating object into a treatment solution which is prepared by mixing 35 to 40 weight parts of a catalytic reaction promoter with 60 to 65 weight parts of deionized water, and which has a pH of 1 or less and a temperature of 20 to 30 deg.C for 10 to 15 minutes; the first catalyst activating step is performed by washing the plating object after immersing the plating object into a treatment solution with a temperature of 20 to 30 deg.C prepared by mixing 20 to 30 ml/L of a catalyst imparting agent for electroless plating and 5 to 15 ml/L of 37% hydrochloric acidwith 960 to 970 ml/L of deionized water for 1 to 10 minutes; and the second catalyst activating step is performed by washing the plating object after immersing the plating object into a treatment solution with a temperature of 20 to 40 deg.C prepared by mixing 50 to 150 ml/L of a chemical copper reaction promoter with 850 to 950 ml/L of deionized water for 2 to 10 minutes.
    • 提供了一种在用作电介质的工件上形成导体物质的化学镀方法,以考虑天线的射频(射频)特性,并且在铺设用于蜂窝电话的天线时在天线的表面上均匀地形成镀层。 在用作电介质的工件上形成导体物质的化学镀方法包括预处理工艺,化学镀处理,后处理工艺和清洁和干燥工艺,其中:预处理工艺包括 超音速脱脂步骤,活化步骤,第一催化剂活化步骤和第二催化剂活化步骤; 超声波脱脂工序是将浸渍在PBT / PET(聚对苯二甲酸丁二醇酯/聚对苯二甲酸乙二醇酯)工件上的LDS(激光直接结构化)工序得到的电镀对象物浸渍在温度​​为40〜 50℃作为超声波清洗剂水溶液,浓度为5〜30重量%,持续30秒〜2分钟; 通过将电镀对象物浸渍到通过将35〜40重量份的催化反应促进剂与60〜65重量份的去离子水混合而制备的处理溶液中,进行电镀对象的洗涤来进行活化工序,其pH为 1℃以下,温度20〜30℃,10〜15分钟; 第一催化剂活化步骤是通过将电镀对象物浸入20〜30℃的温度为20〜30℃的处理溶液中,通过将20〜30ml / L的化学镀用催化剂赋予剂和5 至15ml / L的37%盐酸和960至970ml / L的去离子水1至10分钟; 并且第二催化剂活化步骤是通过将镀覆物浸入到通过将50-150ml / L的化学铜反应促进剂与850混合制备的温度为20至40℃的处理溶液中进行洗涤来进行的, 950毫升/升去离子水2至10分钟。
    • 8. 实用新型
    • 수소가스 제거수단을 구비한 전기도금장치
    • 一种具有氢气去除装置的电镀装置
    • KR200297059Y1
    • 2002-11-30
    • KR2020020027402
    • 2002-09-12
    • 동진피엔아이산업 주식회사
    • 박기태
    • C25D17/00
    • 본 고안은 양극전극들(11a, 11b)과, 피가공물들(12)이 지지된 래크들(13)을 거치하는 거치대(14)를 자체에 구비한 채, 전해액(2)을 수용하는 도금조(3)와, 상기 도금조(3)에 전원을 공급하는 전원공급부를 포함하는 전기도금장치(1)에 관한 것으로서, 전해반응시 상기 피가공물(12)의 도금표면에 발생한 수소가스(6)를 제거하기 위해, 상기 도금조 하부로부터 피가공물을 향해 다수의 미세 공기기포(5)를 내보내는 수소가스 제거수단(20)을 포함하며, 상기 수소가스 제거수단(20)은, 상기 도금조 외측에 설치된 블로우워(22)와, 상기 블로우워(22)에 관로(23)로써 연결된 채 상기 도금조(3) 하부에 위치되어 그 자체에 형성된 복수의 기공(24ab)을 통해 공기방울을 배출하는 기포 배출부(24)를 포함하며, 여기에서, 상기 기포 배출부(24)의 외주면에는 상기 복수의 기공(24ab)으로 부터 나온 기포의 크기를 극세화시키도록 적어도 한 겹의 극세사(25)가 둘러싸여져 고정되어 있는 것을 특징으로 한다.