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    • 3. 发明授权
    • 코팅 면을 가진 진공 척
    • 具有涂层表面的真空泵
    • KR101420091B1
    • 2014-08-13
    • KR1020130007554
    • 2013-01-23
    • (주)뉴젠텍
    • 백상천
    • H01L21/683B23Q3/08
    • H01L21/6838
    • The present invention relates to a vacuum chuck having a coating surface, and, more specifically, to a vacuum chuck having a coating surface for preventing the generation of static electricity by forming the coating surface on a side where a wafer is fixated. The vacuum chuck (10) according to the present invention has a diamond-like carbon (DLC) coating layer for preventing the generation of static electricity on the entire surface for fixating the wafer having a plurality of fixated rims (17) with a vacuum induction hole (18) and a vacuum induction passage (19).
    • 本发明涉及一种具有涂层表面的真空吸盘,更具体地说,涉及具有用于通过在晶片固定的一侧形成涂层表面来防止产生静电的涂层表面的真空卡盘。 根据本发明的真空吸盘(10)具有用于防止在整个表面上产生静电的类金刚石碳(DLC)涂层,用于将具有多个固定边缘(17)的晶片固定在真空感应 孔(18)和真空诱导通道(19)。
    • 5. 发明公开
    • 테이블 전자 메뉴 구조의 주문 시스템 및 그에 의한 주문 처리 방법
    • 表格电子菜单结构的订购系统和订单处理方法
    • KR1020160125023A
    • 2016-10-31
    • KR1020150055617
    • 2015-04-21
    • (주)뉴젠텍
    • 강동원
    • G06Q50/12G06Q30/06
    • 본발명은테이블전자메뉴구조의주문시스템및 그에의한주문처리방법에관한것이고, 구체적으로테이블에설치된전자메뉴로부터메뉴를선택하고이에따라주문이처리되도록하는테이블전자메뉴구조의주문시스템및 그에의한주문처리방법에관한것이다. 테이블전자메뉴구조의주문시스템은테이블(11); 테이블(11)에배치되는적어도하나의전자메뉴(111, 112, 113, 114); 전자메뉴(111, 112, 113, 114)로부터호출되고선택에따른주문이가능한메뉴창(12); 및전자메뉴(111, 112, 113, 114)로부터전송된테이블고유코드(31_1 내지 31_N) 및상기주문에대한정보를수신하는중계모듈(13)을포함하고, 상기전자메뉴(111, 112, 113, 114)는테이블(11)에고정되어상기중계모듈(13)과데이터통신이가능하다.
    • 本发明是一种用于电子菜单结构中的表将关于根据在其上的订购系统和订单处理方法,以选择从使得所述顺序由他处理订购系统和订购过程在表和表E的菜单结构的yiettara特别提供的电子菜单的菜单 < 表格电子菜单结构的订购系统包括表格(11); 至少一个安排在桌子(11)上的电子菜单(111,112,113,114); 菜单窗口12从电子菜单111,112,113,114中调用并且可根据选择进行排序; 以及用于接收从电子菜单(111,112,113和114)发送的表唯一代码(31_1至31_N)和关于订单的信息的中继模块(13)以及电子菜单 并且114被固定到桌子11并且能够与继电器模块13进行数据通信。
    • 7. 发明授权
    • 플라즈마 차폐 기능을 가진 도어 플레이트
    • 阻塞等离子体的门板
    • KR101411490B1
    • 2014-06-24
    • KR1020130007549
    • 2013-01-23
    • (주)뉴젠텍박종진
    • 박종진백상천
    • H01L21/02
    • H01L21/67772H01L21/205H01L21/67207
    • The present invention relates to a door plate having a plasma shielding function and, more specifically, to a door plate having a plasma shielding function which comprises a blocking ring for blocking contact of a plasma to a vacuum forming ring. The door plate comprises a body (11) having a contact surface (12a) formed on a planar-shaped sealing surface (12) of a planar shape and in the periphery of the sealing surface (12); a sealing ring (13) extended while having a semicircular cross section which forms a closed curve on the contact surface (12a); and a blocking ring (15) extended while having a semicircular cross section between the sealing ring (13) and the sealing surface (12), wherein the blocking ring is formed at a lower height with respect to the contact surface (12a) compared to the sealing ring (13).
    • 具有等离子体屏蔽功能的门板技术领域本发明涉及具有等离子体屏蔽功能的门板,更具体地说,涉及具有等离子体屏蔽功能的门板,该门板包括阻挡等离子体与真空成形环接触的阻挡环。 门板包括主体(11),其具有形成在平面形状的平面形密封表面(12)上并且在密封表面(12)的周边中的接触表面(12a); 密封环(13)延伸,同时具有在接触表面(12a)上形成闭合曲线的半圆形横截面; 和阻塞环(15)在所述密封环(13)和所述密封表面(12)之间具有半圆形横截面的同时延伸,其中所述阻挡环形成在相对于所述接触表面(12a)的较低高度处,与 密封环(13)。
    • 8. 发明授权
    • 원격 플라즈마 소스 블록 가공방법
    • 用于远程等离子体源块的处理方法
    • KR100999131B1
    • 2010-12-07
    • KR1020090126840
    • 2009-12-18
    • (주)뉴젠텍
    • 강동원
    • H01L21/3065H01L21/205H01L21/302H01L21/02
    • PURPOSE: A method for processing a remote plasma source block is provided to improve the performance of a remote plasma source block by processing the block using a ball-end mill coated with titanium and diamond, and buffing tools. CONSTITUTION: An inlet(12) is formed on one side of a first block(10). An injecting pipe(14) is formed in the longitudinal direction of a first block. A first connecting pipe(16) is in connection with the one side of the injecting pipe. The injecting pipe and the first connecting pipe form a right angle. An outlet(22) is formed to one side of a second block(20). An ignition plug is installed to an ignition plug installing part(30) in order to ignite a cleaning gas.
    • 目的:提供一种用于处理远程等离子体源块的方法,以通过使用涂覆有钛和金刚石的球头铣刀和抛光工具处理块来改善远程等离子体源块的性能。 构成:入口(12)形成在第一块(10)的一侧上。 在第一块的长度方向上形成有喷射管(14)。 第一连接管(16)与喷射管的一侧连接。 喷射管和第一连接管形成直角。 出口(22)形成在第二块(20)的一侧。 火花塞安装在火花塞安装部分(30)上以点燃清洁气体。
    • 9. 发明公开
    • 플라즈마 식각용 상부전극 조립체
    • 用于等离子体蚀刻的上电极组件
    • KR1020070097246A
    • 2007-10-04
    • KR1020060028186
    • 2006-03-29
    • (주)뉴젠텍
    • 강동원
    • H01L21/30H01L21/3065
    • H01J37/32532H01J37/32174H01L21/67069
    • An upper electrode assembly for plasma etching is provided to prevent the generation of arc discharge or damage of an electrode by firmly assembling the assembly using only bolts. An upper electrode assembly includes a gas supply unit supplying a gas to generate plasma, an upper plate support applied with high-frequency power, and an intermediate support (20) coupled to the upper plate support and a silicon electrode(40). The silicon electrode is fastened to the intermediate support by a fastening member(70). The intermediate support is made of aluminum, and an inner portion and an outer portion of the intermediate support of the intermediate support are coated with insulating material(21), except for the portion contacting the upper plate support and the silicon electrode. The silicon electrode has a fastening part(42) engaged to the intermediate support by using a bolt.
    • 提供用于等离子体蚀刻的上电极组件,以通过仅使用螺栓牢固地组装组件来防止电弧放电或电极的损坏。 上部电极组件包括供给气体以产生等离子体的气体供应单元,施加高频电力的上部板支撑件,以及耦合到上部支撑件的中间支撑件(20)和硅电极(40)。 硅电极通过紧固构件(70)紧固到中间支撑件。 中间支撑件由铝制成,除了与上板支撑件和硅电极接触的部分之外,绝缘材料(21)还涂覆有中间支撑件的中间支撑件的内部和外部部分。 硅电极具有通过使用螺栓与中间支撑件接合的紧固部分(42)。