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    • 84. 发明授权
    • 박막 자기헤드의 제조방법
    • 制造薄膜磁头的方法
    • KR1019900007489B1
    • 1990-10-10
    • KR1019870002623
    • 1987-03-21
    • 알프스 덴키 가부시키가이샤
    • 나까시마게이시
    • G11B5/127
    • G11B5/3103Y10T29/49044Y10T29/49064
    • The method involves forming a protection film on a substrate with sets of bonding pads arranged in spaced apart rows coresponding respectively to rows of thin film magnetic head elements. The latter extend depthwise from an upper side of the protection film through the film to the lead terminals of the respective elements. A linear groove is grounded in the upper side of the protection film only along portions corresponding to each one of the rows of bonding pad sets so as to expose the end surfaces of the sets of bonding pads in each row, prior to cutting the layered structure to separate the resulting thin film magnetic head units from it. The upper magnetic layers of the thin film magnetic head elements are formed well below the end surfaces of the bonding pads.
    • 该方法包括在衬底上形成保护膜,该组焊垫布置成分别对应于薄膜磁头元件行的隔开的行。 后者从保护膜的上侧通过膜向相应元件的引线端子的深度方向延伸。 在保护膜的上侧仅沿着与排列的接合焊盘组对应的部分接合直线槽,以便在切割分层结构之前露出每排中的接合焊盘组的端面 以将所得的薄膜磁头单元从其分离。 薄膜磁头元件的上磁层形成在接合焊盘端面的下方。