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    • 71. 发明公开
    • 더 높은 플라즈마 에너지 밀도를 갖는 유도 플라즈마 토치
    • 具有更高等离子体能量密度的电感式等离子炬
    • KR20180021369A
    • 2018-03-02
    • KR20177037781
    • 2016-06-27
    • TEKNA PLASMA SYSTEMS INC
    • BOULOS MAHER IJUREWICZ JERZY WDIGNARD NICOLASAUGER ALEXANDRETHELLEND SEBASTIEN
    • H05H1/28H05H1/30
    • H05H1/28H05H1/30
    • 유도플라즈마토치는관형토치바디, 관형인서트, 플라즈마밀폐튜브및 환형채널을포함한다. 관형토치바디는각각의내면을한정하는상류및 하류섹션을갖는다. 관형인서트는관형토치바디의하류섹션의내면에장착된다. 플라즈마밀폐튜브는관형토치바디내에동축으로배치된다. 플라즈마밀폐튜브는플라즈마흐름의축 방향으로테이퍼오프되는두께를갖는관형벽을갖는다. 환형채널은한편으로는관형토치바디의상류섹션의내면과인서트의내면과다른한편으로는플라즈마밀폐튜브의관형벽의외면의사이에형성된다. 냉각채널은플라즈마밀폐튜브를냉각시키기위한유체를운반한다.
    • 感应等离子体炬包括管状炬体,管状插入件,等离子体密封管和环形通道。 管状炬体具有限定相应内表面的上游和下游部分。 管状插入件安装在管状炬体的下游部分的内表面上。 等离子密封管同轴地设置在管状炬体内。 等离子密封管具有管壁,其厚度在等离子流的轴向上逐渐变小。 该环形通道euroneun内表面和其它内表面和在所述管状焊炬本体euroneun的上游部分中的插入件的被密封的等离子管的管状壁的所述外表面之间形成。 冷却通道携带用于冷却等离子密封管的流体。
    • 78. 发明授权
    • 플라즈마를 이용한 냉각수 정화처리 방식의 응축기
    • 具有等离子体冷却水处理装置的冷凝器
    • KR101456464B1
    • 2014-10-31
    • KR1020140067104
    • 2014-06-02
    • 주식회사 경동냉열산업
    • 김선호윤석현황종호
    • F28C1/02H05H1/03H05H1/28C02F1/48
    • F28C1/02C02F1/48F28F2025/005H05H1/03H05H1/24
    • An objective of the present invention is to provide a plasma water treatment device of which speed and efficiency of plasma treatment device-based water treatment can be improved. A condenser for plasma-based coolant purification treatment according to the present invention includes a tube-shaped body that has a fluid inlet, a fluid outlet, and a coolant flow path for connection between the inlet and the outlet; and a plasma treatment device that is disposed in the tube-shaped body to cross the coolant flow path in a transverse direction and discharges plasma-reacting air or gas in a fluid flowing in the coolant flow path. The plasma treatment device includes a transparent dielectric tube that is disposed to cross the coolant flow path in the transverse direction in the fluid flowing in the coolant flow path, air or gas flowing therein and a discharge electrode being disposed therein; an opposing electrode that is disposed to be in electrical contact with the fluid flowing in the coolant flow path; power applying means for applying power to the discharge electrode and the opposing electrode and plasma generation in the dielectric tube; and a bubble generator that is connected to the dielectric tube, the air or gas passing therethrough and the air or gas being converted into multiple bubbles in the fluid flowing in the coolant flow path. One end and the other end of the dielectric tube are supported by wall of the tube-shaped body.
    • 本发明的目的是提供一种能够提高等离子体处理装置的水处理的速度和效率的等离子体水处理装置。 根据本发明的用于等离子体冷却剂净化处理的冷凝器包括管状体,其具有用于在入口和出口之间连接的流体入口,流体出口和冷却剂流动路径; 以及等离子体处理装置,其设置在所述管状体中以横向穿过所述冷却剂流动路径,并且在流过所述冷却剂流动路径的流体中排出等离子体反应的空气或气体。 等离子体处理装置包括透明电介质管,该透明电介质管设置成在流过冷却剂流路的流体中流过冷却剂流路,在其中流动的空气或气体,放置在其中的放电电极; 设置成与在冷却剂流动路径中流动的流体电接触的相对电极; 用于向放电电极和相对电极施加电力并在电介质管中产生等离子体的功率施加装置; 以及气泡生成器,其连接到电介质管,空气或气体通过其中,并且空气或气体在流过冷却剂流动路径的流体中被转换成多个气泡。 电介质管的一端和另一端由管状体的壁支撑。
    • 79. 发明公开
    • 압력 제어된 열 파이프 온도 제어판
    • 压力控制热管温度控制板
    • KR1020140049492A
    • 2014-04-25
    • KR1020130124246
    • 2013-10-17
    • 램 리써치 코포레이션
    • 켈로그마이클씨.딘드사라진더스티븐슨탐
    • H05H1/28H05H1/34
    • H01J37/32449
    • A shower head electrode assembly for a plasma processing chamber includes: a shower head electrode; a heating substrate which is fixed on the upper surface of the shower head electrode; and at least one pressure controlled heat pipe which is fixed on the upper surface of the heating substrate. The at least one pressure controlled heat pipe includes pressurized gas to generate variable internal pressure inside and a heat transfer liquid inside. A top plate is fixed on the upper surface of the at least one heat pipe. When the shower head electrode is heated by the heating substrate, the heat transfer liquid is drained from a heat path between the top plate and the heating substrate by the variable internal pressure of at least one pressure controlled heat pipe. When the excessive heat is removed from the shower head electrode, the heat transfer liquid is returned to the heat path by the variable internal pressure of at least one pressure controlled heat pipe.
    • 一种用于等离子体处理室的花洒头电极组件,包括:花洒头电极; 固定在喷头电极的上表面上的加热基板; 以及固定在加热基板的上表面上的至少一个压力控制热管。 至少一个受压控制的热管包括加压气体,以在内部产生可变的内部压力和内部的传热液体。 顶板固定在至少一个热管的上表面上。 当喷头电极被加热基板加热时,传热液体通过至少一个受压热管的可变内压从顶板和加热基板之间的热路中排出。 当从喷淋头电极中除去过多的热量时,传热液体通过至少一个受压热管的可变内部压力返回到热路径。
    • 80. 发明授权
    • 비이송식 공동형 플라즈마 토치
    • 非转移和中空类型的等离子体转子
    • KR101383038B1
    • 2014-04-08
    • KR1020130117662
    • 2013-10-02
    • 지에스플라텍 주식회사
    • 황순모유병주
    • H05H1/26H05H1/28
    • H05H1/34H05H1/28H05H1/40H05H1/44H05H1/50H05H2001/3457
    • Disclosed is a non-transferable hollow plasma torch. The non-transferable hollow plasma torch according to one embodiment of the present invention includes an insulation body, a rear torch part which includes a rear electrode housing which is received in one side of the insulation body and a hollow rear electrode body which is fixed in the rear electrode housing, a front torch part which includes a front electrode housing which is received in the other side of the insulation body and a hollow front electrode which is fixed in the front electrode housing, a rear torch cooling unit which cools the rear electrode body outside the rear electrode body, and a front torch cooling unit which cools the front electrode outside the front electrode. The cooling quantity of the front electrode by the front torch cooling unit is larger than the cooling quantity of the rear electrode body by the rear torch cooling unit.
    • 公开了不可转印的中空等离子体焰炬。 根据本发明的一个实施例的不可转移空心等离子体焰炬包括绝缘体,后炬部分,其包括被接纳在绝缘体一侧的后电极壳体和固定在绝缘体中的中空后电极体 后电极壳体,包括容纳在绝缘体的另一侧的前电极壳体和固定在前电极壳体中的中空前电极的前炬部分,后部电极冷却单元,其冷却后电极 背面电极体外部的前部电极冷却单元,前部电极冷却单元。 通过前方手电筒冷却单元的前电极的冷却量大于后方电极主体的冷却量。