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61. 发明公开

KR1020140087758A 포토레지스트 박리액 조성물 审中-实审
标题翻译：光电剥离组合物
公开(公告)号：KR1020140087758A
公开(公告)日：2014-07-09
申请号：KR1020120158365
申请日：2012-12-31
申请人： 동우 화인켐 주식회사
发明人： 고경준 , 김성식 , 김정현
IPC分类号： H01L21/027 , G03F7/42
CPC分类号： H01L21/0273 , G03F7/0045 , G03F7/34 , G03F7/422 , G03F7/425
摘要： The present invention relates to a photoresist stripper composition. A photoresist stripper composition according to one embodiment of the present invention includes an amino compound and a water-soluble organic solvent. According to the embodiment of the present invention, the photoresist stripper composition is formed on an organic insulating layer. According to the embodiment of the present invention, the photoresist stripper composition has excellent photoresist removal performance.
摘要翻译：本发明涉及一种光致抗蚀剂剥离剂组合物。根据本发明一个实施方案的光致抗蚀剂剥离剂组合物包括氨基化合物和水溶性有机溶剂。根据本发明的实施方案，在有机绝缘层上形成光致抗蚀剂剥离剂组合物。根据本发明的实施方案，光致抗蚀剂剥离剂组合物具有优异的光致抗蚀剂去除性能。

62. 发明公开

KR1020140060910A 얼룩 발생 방지용 레지스트 박리액 조성물 审中-实审
标题翻译：用于防止无感染的耐腐蚀剥离剂组合物
公开(公告)号：KR1020140060910A
公开(公告)日：2014-05-21
申请号：KR1020120127846
申请日：2012-11-13
申请人： 동우 화인켐 주식회사
发明人： 고경준 , 신혜라 , 이유진
IPC分类号： G02F1/13 , G03F7/42
CPC分类号： G03F7/425 , C09D11/38 , C09K13/02 , C11D11/0047 , G03F7/0045 , G03F7/34 , G03F7/422
摘要： The present invention relates to a resist stripper composition for preventing stain, including (a) glycol ether expressed as a chemical formula 1, R-(OCH_2CH_2)_n-OH, (b) an alkali compound, (c) an aprotic polar solvent and (d) an anticorrosive agent. In chemical formula 1, R is a methyl group or an ethyl group, and n is an integer such as 2 or 3.
摘要翻译：本发明涉及用于防止染色的抗蚀剂剥离剂组合物，其包括（a）以化学式1表示的二醇醚，R-（OCH 2 CH 2）n-OH，（b）碱性化合物，（c）非质子极性溶剂和（d）防腐剂。在化学式1中，R是甲基或乙基，n是2或3的整数。

63. 发明公开

KR1020130139482A 레지스트 박리액 조성물 无效
标题翻译：耐腐蚀组合物
公开(公告)号：KR1020130139482A
公开(公告)日：2013-12-23
申请号：KR1020120062950
申请日：2012-06-13
申请人： 동우 화인켐 주식회사
发明人： 신혜라 , 고경준 , 이유진
IPC分类号： G03F7/42
CPC分类号： G03F7/425 , G03F7/40 , G03F7/422 , G03F7/423 , H01L21/31133 , H01L21/67207
摘要： The present invention relates to a resist stripper composition which includes organic phosphorus acid represented by chemical formula (1), an alkaline compound, and a water soluble polar solvent. Further, the present invention relates to a method for manufacturing a flat panel display substrate, wherein the method includes a step of washing the flat panel display substrate using the resist stripper composition.
摘要翻译：本发明涉及抗蚀剂剥离剂组合物，其包含由化学式（1）表示的有机磷酸，碱性化合物和水溶性极性溶剂。此外，本发明涉及一种用于制造平板显示基板的方法，其中该方法包括使用抗蚀剂剥离剂组合物洗涤平板显示基板的步骤。

64. 发明公开

KR1020130112973A 레지스트 박리액 조성물 및 이를 이용한 레지스트의 박리방법 有权
标题翻译：耐腐蚀剥离剂组合物和使用它的剥离材料的方法
公开(公告)号：KR1020130112973A
公开(公告)日：2013-10-15
申请号：KR1020120032662
申请日：2012-03-29
申请人： 동우 화인켐 주식회사
发明人： 김성식 , 고경준 , 김정현
IPC分类号： G03F7/42 , G03F7/34
CPC分类号： G03F7/425 , C11D7/261 , C11D7/263 , C11D7/3281 , C11D11/0047 , G03F7/0045 , G03F7/027 , G03F7/0382 , G03F7/0397 , G03F7/40 , G03F7/422
摘要： PURPOSE: A resist stripping liquor composition is provided to have an excellent resist pattern, dry and wet etching residue stripping ability and not remain behind after the stripping process and not be volatilized during the stripping process. CONSTITUTION: A resist stripping liquor composition (a) comprises a hydroxy dioxolan compound and an alkali series compound which have the below structural formula of the chemical formula 1 (b). R1 and R2 are hydrogen, C1-5 alkyl group, C2-5 alkenyl group, C1-5 hydroxy alkyl group, or the phenyl respectively. R3 is C1-4 alkylene group, C2-5 alkenylene or C1-5 hydroxyalkylene group. The alkali series compound (B) is the mixture of one or more than two kinds which is selected from KOH, NaOH, tetramethyl ammonium hydroxide, tetraethyl ammonium hydroxide, tetraethyl ammonium hydroxide, carbonate, phosphate, ammonia and amines.
摘要翻译：目的：提供抗蚀剂剥离液组合物以具有优异的抗蚀剂图案，干蚀刻和湿蚀刻残留物剥离能力，并且在剥离过程后不留下，并且在汽提过程中不挥发。构成：抗蚀剂剥离液组合物（a）含有具有化学式1（b）的下述结构式的羟基二氧戊环化合物和碱系列化合物。 R1和R2分别是氢，C1-5烷基，C2-5烯基，C1-5羟基烷基或苯基。 R3是C1-4亚烷基，C2-5亚烯基或C1-5羟基亚烷基。碱系列化合物（B）是选自KOH，NaOH，四甲基氢氧化铵，四乙基氢氧化铵，四乙基氢氧化铵，碳酸盐，磷酸盐，氨和胺中的一种或两种以上的混合物。

65. 发明公开

KR1020130049577A 포토레지스트 박리액 조성물 审中-实审
标题翻译：光电剥离组合物
公开(公告)号：KR1020130049577A
公开(公告)日：2013-05-14
申请号：KR1020110114677
申请日：2011-11-04
申请人： 동우 화인켐 주식회사
发明人： 이유진 , 고경준 , 김성식
IPC分类号： G03F7/42
CPC分类号： G03F7/425 , C07D213/643 , C07D413/04 , G03F7/0395 , G03F7/0397 , G03F7/422 , G03F7/423
摘要： PURPOSE: A photoresist exfoliating solution composition is provided to have an excellent performance of removing residue strip of resist by dry/wet etching in pattern formation, and to have an effect of not leaving anti-corrosive agent on the substrate surface by using an anti-corrosive agent having an excellent solubility to water and a solvent represented by chemical formula 2 in a manufacturing process of a flat panel display substrate. CONSTITUTION: A resist exfoliating solution composition includes 0.01-5 weight% of an anti-corrosive agent of chemical formula 1, 1-40 weight% of an alkali compound, and 55-90 weight% of solvents including a solvent of chemical formula 2 and other organic solvents. A resist exfoliating solution composition further includes deionized water. A resist exfoliating solution composition further includes at least one kind selected from the group consisting of azol compounds, quinone compounds and alkyl gallate compounds as the anti-corrosive agent. A flat panel display device is characterized in including a flat panel display substrate which is manufactured by using the resist exfoliating solution composition.
摘要翻译：目的：提供光致抗蚀剂去角质溶液组合物，以在图案形成中通过干/湿蚀刻去除抗蚀剂残留带的优异性能，并且具有通过使用抗蚀剂剥离剂将抗腐蚀剂留在基材表面上的效果，在平板显示基板的制造工序中，对水具有优异溶解性的腐蚀剂和由化学式2表示的溶剂。构成：抗蚀剂剥离液组合物包含0.01-5重量％的化学式1的防腐剂，1-40重量％的碱性化合物和55-90重量％的溶剂，包括化学式2的溶剂和其他有机溶剂。抗蚀剂去角质溶液组合物还包括去离子水。抗蚀剂去角质溶液组合物还包括选自由唑类化合物，醌化合物和没食子酸没食子酸酯化合物组成的组中的至少一种作为抗腐蚀剂。平板显示装置的特征在于包括通过使用抗蚀剂去角质溶液组合物制造的平板显示基板。

66. 发明授权

KR102223871B1 레지스트 박리액 조성물 및 이를 이용한 레지스트의 박리방법 有权
公开(公告)号：KR102223871B1
公开(公告)日：2021-03-05
申请号：KR1020140111527
申请日：2014-08-26
申请人： 동우 화인켐 주식회사
发明人： 최한영 , 고경준 , 최선미 , 김병묵
IPC分类号： G03F7/42 , H01L21/02
摘要： 본발명은화학식 1 및화학식 2로표시되는화합물중에서선택되는 1종이상의아미드화합물, 화학식 3으로표시되는글리콜아민, 및화학식 4로표시되는글리콜에테르를포함하는레지스트박리액조성물및 이를이용한레지스트의박리방법을제공한다.

67. 发明授权

KR102009545B1 레지스트 박리액 조성물 有权
公开(公告)号：KR102009545B1
公开(公告)日：2019-10-21
申请号：KR1020150131245
申请日：2015-09-16
申请人： 동우 화인켐 주식회사
发明人： 이유진 , 고경준 , 김성식 , 김정현 , 최한영
IPC分类号： G03F7/42

68. 发明授权

KR102032321B1 얼룩 발생 방지용 레지스트 박리액 조성물 有权
公开(公告)号：KR102032321B1
公开(公告)日：2019-10-15
申请号：KR1020120127846
申请日：2012-11-13
申请人： 동우 화인켐 주식회사
发明人： 고경준 , 신혜라 , 이유진
IPC分类号： G03F7/42 , G03F7/004 , C11D11/00 , G03F7/34 , C09D11/38 , C09K13/02

69. 发明授权

KR102028120B1 레지스트 박리액 조성물 有权
公开(公告)号：KR102028120B1
公开(公告)日：2019-10-02
申请号：KR1020160027020
申请日：2016-03-07
申请人： 동우 화인켐 주식회사
发明人： 김정현 , 고경준 , 김성식
IPC分类号： G03F7/42 , H01L21/311 , C11D7/32 , C11D7/50 , C09K105/00

70. 发明授权

KR101880302B1 레지스트 박리액 조성물 및 이를 이용한 레지스트 박리방법 有权
公开(公告)号：KR101880302B1
公开(公告)日：2018-07-20
申请号：KR1020110109422
申请日：2011-10-25
申请人： 동우 화인켐 주식회사
发明人： 김정현 , 고경준 , 김성식
IPC分类号： G03F7/42 , G03F7/004 , G03F7/039 , G03F7/06
摘要： 본발명은플랫패널디스플레이기판의제조공정에있어서패턴형성시 건식/습식식각에의한레지스트의잔사제거능력이우수한레지스트박리액조성물에관한것이다.

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