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    • 42. 发明公开
    • 신규한 페로센 함유 고분자 및 이를 이용한 유기 메모리소자
    • 含有聚合物和含有该聚合物的有机存储装置的新颖的方法
    • KR1020070084855A
    • 2007-08-27
    • KR1020060017155
    • 2006-02-22
    • 삼성전자주식회사
    • 최태림이광희이상균주원제
    • C08G61/12C08F2/00C08F4/26B82Y10/00
    • C08G79/00B82Y10/00C07F17/02C08G61/02C08G61/126G11C13/0014G11C13/0016G11C2213/77H01L51/0038H01L51/004H01L51/0083H01L51/009H01L51/0591H01L51/0595
    • A novel ferrocene-containing polymer is provided to give excellent characteristics when used as an organic active layer of an organic memory device, and thus to embody an organic memory device having short switching time, low operation voltage, low production cost, and good reliance. A novel ferrocene-containing polymer has a structure represented by the following chemical formula 1 or chemical formula 2. In the chemical formula 1, Rs are the same and different from each other and are C1-20 alkyl, C3-20 cycloalkyl, C5-30 heterocycloalkyl, C2-20 alkenyl, C6-20 aryl, C5-30 heteroaryl, C7-20 arylalkyl, or C7-30 heteroarylalkyl, A and A' are a hydrogen atom, C1-20 alkyl, C3-20 cycloalkyl, C5-30 heterocycloalkyl, C2-20 alkenyl, C6-20 aryl, C5-30 heteroaryl, C7-20 arylalkyl, or C7-30 heteroarylalkyl, or OR(wherein, R' is C1-20 alkyl, C3-20 cycloalkyl, C5-30 heterocycloalkyl, C2-20 alkenyl, C6-20 aryl, C5-30 heteroaryl, C7-20 arylalkyl, or C7-30 heteroarylalkyl, and n is 1-1000). In the chemical formula 2, Rs are the same or different from each other and are C1-20 alkyl, C3-20 cycloalkyl, C5-30 heterocycloalkyl, C2-20 alkenyl, C6-20 aryl, C5-30 heteroaryl, C7-20 arylalkyl, or C7-30 heteroarylalkyl, B is a hydrogen atom, C1-20 alkyl group, substituted or unsubstituted C5-20 aromatic group, or substituted or unsubstituted C5-20 heteroaromatic group containing an heteroatom of O, S, or N(wherein, the aromatic group or heteroaromatic group has at least one substituent selected from a C1-12 alkyl group, vinyl group, alkoxy group, ester group, carboxyl group, thiol group, or amine group), D is a substituted or unsubstituted C5-30 aromatic group or substituted or unsubstituted C5-30 heteroaromatic group containing an heteroatom of O, S, or N(wherein, the aromatic group or heteraromatic group has at least one substituent selected from a C1-12 alkyl group, vinyl group, alkoxy group, ester group, carboxyl group, thiol group, or amine group), and n is 1-1000.
    • 提供了一种含有二茂铁的聚合物,当用作有机存储器件的有机活性层时具有优异的特性,从而具有开关时间短,操作电压低,制造成本低,依赖性好的有机存储元件。 新型含二茂铁的聚合物具有由以下化学式1或化学式2表示的结构。在化学式1中,Rs相同且不同,为C1-20烷基,C3-20环烷基,C5- 30个杂环烷基,C2-20烯基,C6-20芳基,C5-30杂芳基,C7-20芳基烷基或C7-30杂芳基烷基,A和A'是氢原子,C1-20烷基,C3-20环烷基, 30个杂环烷基,C2-20烯基,C6-20芳基,C5-30杂芳基,C7-20芳基烷基或C7-30杂芳基烷基,或OR(其中,R'为C1-20烷基,C3-20环烷基,C5-30 杂环烷基,C2-20烯基,C6-20芳基,C5-30杂芳基,C7-20芳基烷基或C7-30杂芳基烷基,n为1-1000)。 在化学式2中,R 5彼此相同或不同,为C 1-20烷基,C 3-20环烷基,C 5-30杂环烷基,C 2-20烯基,C 6-20芳基,C 5-30杂芳基,C 7-20 芳基烷基或C7-30杂芳基烷基,B是氢原子,C1-20烷基,取代或未取代的C5-20芳族基团,或含有O,S或N杂原子的取代或未取代的C5-20杂芳族基团(其中 芳族基或杂芳族基具有至少一个选自C 1-12烷基,乙烯基,烷氧基,酯基,羧基,硫醇基或胺基的取代基),D是取代或未取代的C5-30 芳香基或含有O,S或N的杂原子的取代或未取代的C5-30杂芳基(其中芳族基团或杂芳基具有至少一个选自C 1-12烷基,乙烯基,烷氧基, 酯基,羧基,硫醇基或胺基),n为1-1000。
    • 50. 发明公开
    • 실리콘 수지 하이브리드 조성물 및 그 제조방법
    • 硅氧烷树脂混合组合物及其制备方法
    • KR1020160079417A
    • 2016-07-06
    • KR1020140190738
    • 2014-12-26
    • 코오롱인더스트리 주식회사
    • 권오탁김석기윤경근
    • C08G77/398C08G77/58C08G79/00
    • C08G77/398C08G77/58C08G79/00Y10S528/901
    • 본발명은실리콘수지및 그제조방법에관한것으로, 보다상세하게는고 사양이요구되고있는디스플레이및 반도체용재료에서의유기계수지(아크릴-에폭시)의물성한계(내열/내광특성, 경도및 고온고습상태에서의밀착력)를극복한동시에저온경화및 고온경화시에도높은경도를유지함으로써, 공정비용절감과막 형성후 후속공정에서의스크래치등으로부터소자보호에유리하고, 고온고습환경에서도기재와의높은밀착력을유지하여디스플레이및 반도체소자의보호막등의제조에유용한실리콘수지및 그제조방법을제공한다.
    • 硅树脂及其制造方法技术领域本发明涉及硅树脂及其制造方法。 更具体地说,提供一种有机树脂,其克服了用作显示器和半导体需要高的材料的有机树脂(丙烯酸 - 环氧树脂)中的材料性质(耐热/耐光性,硬度,在高温和高湿度下的粘合性)的缺点 规格。 此外,即使在低温和高温固化过程中,硅树脂仍然具有优异的硬度,从而降低了生产成本,并且在成膜后的后续工艺中为用户提供了具有良好性能的抗划痕特性。 此外,即使在涉及高温和高湿度的条件下,通过保持与基材的高粘合性,硅树脂也可用于制造显示器和半导体器件中的保护膜。 还提供了其制备方法。